Inventor · disambiguated record
Sanjeev Tandon
Also filed as: TANDON SANJEEV
8 granted patents·3 pending applications·1,037 citations·filing 2004–2022
89Inventor score
Top patents by PatentIndex Score
11 records- 0198US7473655B2Method for silicon based dielectric chemical vapor depositionAPPLIED MATERIALS INC·Filed 2005·Granted Jan 6, 2009·430 cites·23 claims
- 0297US7294581B2Method for fabricating silicon nitride spacer structuresAPPLIED MATERIALS INC·Filed 2005·Granted Nov 13, 2007·535 cites·21 claims
- 0391US7465669B2Method of fabricating a silicon nitride stackAPPLIED MATERIALS INC·Filed 2005·Granted Dec 16, 2008·33 cites·20 claims
- 0490US7416995B2Method for fabricating controlled stress silicon nitride filmsAPPLIED MATERIALS INC·Filed 2005·Granted Aug 26, 2008·19 cites·18 claims
- 0580US9929215B2Method of optimizing an interface for processing of an organic semiconductorDPIX LLC·Filed 2017·Granted Mar 27, 2018·3 cites·20 claims
- 0679US7365029B2Method for silicon nitride chemical vapor depositionAPPLIED MATERIALS INC·Filed 2005·Granted Apr 29, 2008·6 cites·11 claims
- 0765US7488690B2Silicon nitride film with stress controlAPPLIED MATERIALS INC·Filed 2004·Granted Feb 10, 2009·11 cites·30 claims
- 0856US12342646B2Architecture for and method of operating a metal oxide based sensorDPIX LLC·Filed 2022·Granted Jun 24, 2025·0 cites·20 claims
- 0949US2008063798A1Precursors and hardware for cvd and aldKHER SHREYAS S·Filed 2007·Application pending·0 cites
- 1048US2005109276A1Thermal chemical vapor deposition of silicon nitride using BTBAS bis(tertiary-butylamino silane) in a single wafer chamberAPPLIED MATERIALS INC·Filed 2004·Application pending·0 cites
- 1148US2009111284A1Method for silicon based dielectric chemical vapor depositionWANG YAXIN·Filed 2009·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →