Inventor · disambiguated record
Sebastianus Adrianus Goorden
Also filed as: GOORDEN SEBASTIANUS ADRIANUS
33 granted patents·11 pending applications·52 citations·filing 2013–2024
95Inventor score
Top patents by PatentIndex Score
44 records- 0195US12025925B2Metrology method and lithographic apparatusesASML NETHERLANDS BV·Filed 2020·Granted Jul 2, 2024·6 cites·33 claims
- 0293US11360399B2Metrology sensor for position metrologyASML NETHERLANDS BV·Filed 2019·Granted Jun 14, 2022·10 cites·37 claims
- 0392US11650513B2Apparatus and method for measuring a position of a markASML NETHERLANDS BV·Filed 2019·Granted May 16, 2023·5 cites·14 claims
- 0490US11906906B2Metrology method and associated metrology and lithographic apparatusesASML NETHERLANDS BV·Filed 2021·Granted Feb 20, 2024·2 cites·19 claims
- 0589US12276921B2Substrate comprising a target arrangement, and associated at least one patterning device, lithographic method and metrology methodASML NETHERLANDS BV·Filed 2021·Granted Apr 15, 2025·2 cites·17 claims
- 0689US11940608B2Dark field microscopeASML NETHERLANDS BV·Filed 2020·Granted Mar 26, 2024·2 cites·20 claims
- 0789US10788766B2Metrology sensor, lithographic apparatus and method for manufacturing devicesASML NETHERLANDS BV·Filed 2018·Granted Sep 29, 2020·4 cites·19 claims
- 0887US11175593B2Alignment sensor apparatus for process sensitivity compensationASML NETHERLANDS BV·Filed 2019·Granted Nov 16, 2021·4 cites·38 claims
- 0987US10788765B2Method and apparatus for measuring a structure on a substrateASML NETHERLANDS BV·Filed 2018·Granted Sep 29, 2020·4 cites·20 claims
- 1084US10599047B2Metrology apparatus, lithographic system, and method of measuring a structureASML NETHERLANDS BV·Filed 2018·Granted Mar 24, 2020·2 cites·15 claims
- 1182US12287470B2Dark field microscopeASML NETHERLANDS BV·Filed 2024·Granted Apr 29, 2025·0 cites·20 claims
- 1280US10317808B2Position sensing arrangement and lithographic apparatus including such an arrangement, position sensing method and device manufacturing methodASML NETHERLANDS BV·Filed 2017·Granted Jun 11, 2019·3 cites·18 claims
- 1379US11042096B2Alignment measurement systemASML NETHERLANDS BV·Filed 2018·Granted Jun 22, 2021·2 cites·21 claims
- 1479US10649345B2Methods and apparatuses for measurement of a parameter of a feature fabricated on a substrateASML NETHERLANDS BV·Filed 2018·Granted May 12, 2020·1 cites·20 claims
- 1579US10303064B2Radiation conditioning system, illumination system and metrology apparatus, device manufacturing methodASML NETHERLANDS BV·Filed 2017·Granted May 28, 2019·2 cites·20 claims
- 1678US11086240B2Metrology sensor, lithographic apparatus and method for manufacturing devicesASML NETHERLANDS BV·Filed 2017·Granted Aug 10, 2021·2 cites·15 claims
- 1778US10234767B2Device and method for processing a radiation beam with coherenceASML NETHERLANDS BV·Filed 2017·Granted Mar 19, 2019·1 cites·19 claims
- 1867US12287591B2Lithographic apparatus, metrology systems, and methods thereofASML NETHERLANDS BV·Filed 2021·Granted Apr 29, 2025·0 cites·20 claims
- 1967US12282263B2Metrology system and lithographic systemASML NETHERLANDS BV·Filed 2021·Granted Apr 22, 2025·0 cites·15 claims
- 2065US2024241454A1Metrology method and system and lithographic systemASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 2164US12326669B2Illumination apparatus and associated metrology and lithographic apparatusesASML NETHERLANDS BV·Filed 2023·Granted Jun 10, 2025·0 cites·19 claims
- 2262US2025060684A1An optical system implemented in a system for fast optical inspection of targetsASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 2361US12276784B2Micromirror arraysASML NETHERLANDS BV·Filed 2020·Granted Apr 15, 2025·0 cites·30 claims
- 2461US12259546B2Micromirror arraysASML NETHERLANDS BV·Filed 2020·Granted Mar 25, 2025·0 cites·23 claims
- 2561US11762305B2Alignment methodASML NETHERLANDS BV·Filed 2020·Granted Sep 19, 2023·0 cites·15 claims
- 2660US12189314B2Metrology method and associated metrology and lithographic apparatusesASML NETHERLANDS BV·Filed 2021·Granted Jan 7, 2025·0 cites·20 claims
- 2760US2025147429A1Determining a measurement recipe in a metrology methodASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 2860US2025036031A1Target asymmetry measurement for substrate alignment in lithography systemsASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 2956US2024353761A1Metrology system, lithographic apparatus, and methodASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 3056US2024036484A1Method of metrology and associated apparatusesASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 3155US11474435B2Metrology sensor, illumination system and method of generating measurement illumination with a configurable illumination spot diameterASML NETHERLANDS BV·Filed 2019·Granted Oct 18, 2022·0 cites·18 claims
- 3255US2024027913A1Metrology system and coherence adjustersASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 3354US11409206B2Alignment method and apparatusASML NETHERLANDS BV·Filed 2019·Granted Aug 9, 2022·0 cites·13 claims
- 3454US11333985B2Position sensorASML NETHERLANDS BV·Filed 2019·Granted May 17, 2022·0 cites·22 claims
- 3554US11022902B2Sensor, lithographic apparatus, and device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Jun 1, 2021·0 cites·14 claims
- 3654US2024184215A1Metrology tool calibration method and associated metrology toolASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 3753US11927891B2Apparatus and methods for determining the position of a target structure on a substrateASML NETHERLANDS BV·Filed 2018·Granted Mar 12, 2024·0 cites·13 claims
- 3852US10942461B2Alignment measurement systemASML NETHERLANDS BV·Filed 2018·Granted Mar 9, 2021·0 cites·18 claims
- 3951US12339588B2High force low voltage piezoelectric micromirror actuatorASML NETHERLANDS BV·Filed 2021·Granted Jun 24, 2025·0 cites·13 claims
- 4051US11181835B2Metrology sensor, lithographic apparatus and method for manufacturing devicesASML NETHERLANDS BV·Filed 2018·Granted Nov 23, 2021·0 cites·16 claims
- 4151US2022283515A1Metrology system and methodASML HOLDING NV·Filed 2020·Application pending·0 cites
- 4245US2024004184A1High accuracy temperature-compensated piezoresistive position sensing systemASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 4344US10527959B2Position sensor, lithographic apparatus and method for manufacturing devicesASML NETHERLANDS BV·Filed 2017·Granted Jan 7, 2020·0 cites·20 claims
- 4444US2015003103A1Method, optical system and lighting arrangement for homogenizing lightKONINKL PHILIPS NV·Filed 2013·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →