Inventor · disambiguated record
Sebastien Raoux
Also filed as: RAOUX SEBASTIEN
23 granted patents·7 pending applications·2,761 citations·filing 1992–2009
98Inventor score
Top patents by PatentIndex Score
30 records- 0199US6863019B2Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gasAPPLIED MATERIALS INC·Filed 2002·Granted Mar 8, 2005·608 cites·6 claims
- 0298US7736600B2Apparatus for manufacturing a process abatement reactorAPPLIED MATERIALS INC·Filed 2006·Granted Jun 15, 2010·387 cites·25 claims
- 0398US6162709AUse of an asymmetric waveform to control ion bombardment during substrate processingAPPLIED MATERIALS INC·Filed 2000·Granted Dec 19, 2000·167 cites·7 claims
- 0497US6358573B1Mixed frequency CVD processAPPLIED MATERIALS INC·Filed 2000·Granted Mar 19, 2002·130 cites·20 claims
- 0596US6193802B1Parallel plate apparatus for in-situ vacuum line cleaning for substrate processing equipmentAPPLIED MATERIALS INC·Filed 1996·Granted Feb 27, 2001·191 cites·34 claims
- 0696US6194628B1Method and apparatus for cleaning a vacuum line in a CVD systemAPPLIED MATERIALS INC·Filed 1995·Granted Feb 27, 2001·170 cites·40 claims
- 0796US6187072B1Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissionsAPPLIED MATERIALS INC·Filed 1996·Granted Feb 13, 2001·154 cites·29 claims
- 0896US6041734AUse of an asymmetric waveform to control ion bombardment during substrate processingAPPLIED MATERIALS INC·Filed 1997·Granted Mar 28, 2000·110 cites·6 claims
- 0995US6098568AMixed frequency CVD apparatusAPPLIED MATERIALS INC·Filed 1997·Granted Aug 8, 2000·106 cites·5 claims
- 1094US7700049B2Methods and apparatus for sensing characteristics of the contents of a process abatement reactorAPPLIED MATERIALS INC·Filed 2006·Granted Apr 20, 2010·24 cites·13 claims
- 1193US6680420B2Apparatus for cleaning an exhaust line in a semiconductor processing systemAPPLIED MATERIALS INC·Filed 2000·Granted Jan 20, 2004·45 cites·13 claims
- 1292US7004107B1Method and apparatus for monitoring and adjusting chamber impedanceAPPLIED MATERIALS INC·Filed 1997·Granted Feb 28, 2006·114 cites·18 claims
- 1391US6045618AMicrowave apparatus for in-situ vacuum line cleaning for substrate processing equipmentAPPLIED MATERIALS INC·Filed 1996·Granted Apr 4, 2000·130 cites·21 claims
- 1490US6517913B1Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissionsAPPLIED MATERIALS INC·Filed 2000·Granted Feb 11, 2003·65 cites·22 claims
- 1590US6366346B1Method and apparatus for optical detection of effluent compositionAPPLIED MATERIALS INC·Filed 1998·Granted Apr 2, 2002·89 cites·34 claims
- 1687US7160521B2Treatment of effluent from a substrate processing chamberAPPLIED MATERIALS INC·Filed 2003·Granted Jan 9, 2007·52 cites·13 claims
- 1786US6432256B1Implanatation process for improving ceramic resistance to corrosionAPPLIED MATERIALS INC·Filed 1999·Granted Aug 13, 2002·63 cites·25 claims
- 1884US7970483B2Methods and apparatus for improving operation of an electronic device manufacturing systemAPPLIED MATERIALS INC·Filed 2007·Granted Jun 28, 2011·8 cites·16 claims
- 1984US6136388ASubstrate processing chamber with tunable impedanceAPPLIED MATERIALS INC·Filed 1997·Granted Oct 24, 2000·63 cites·3 claims
- 2079US6888639B2In-situ film thickness measurement using spectral interference at grazing incidenceAPPLIED MATERIALS INC·Filed 2001·Granted May 3, 2005·21 cites·24 claims
- 2178US6354241B1Heated electrostatic particle trap for in-situ vacuum line cleaning of a substrated processingAPPLIED MATERIALS INC·Filed 1999·Granted Mar 12, 2002·48 cites·25 claims
- 2261US7532952B2Methods and apparatus for pressure control in electronic device manufacturing systemsAPPLIED MATERIALS INC·Filed 2007·Granted May 12, 2009·3 cites·12 claims
- 2354US2008003157A1Methods and apparatus for pfc abatement using a cdo chamberAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 2454US2008003151A1Methods and apparatus for pfc abatement using a cdo chamberAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 2552US2008003158A1Methods and apparatus for pfc abatement using a cdo chamberAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 2649US2008003150A1Methods and apparatus for pfc abatement using a cdo chamberAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 2747US2009175771A1Abatement of effluent gasAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 2846US2008014134A1Methods and apparatus for pfc abatement using a cdo chamberAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 2943US5319653AIntegrated optical component structureFRANCE TELECOM·Filed 1992·Granted Jun 7, 1994·13 cites·21 claims
- 3043US2007086931A1Methods and apparatus for process abatementAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →