Inventor · disambiguated record
Seiichiro Tachibana
Also filed as: TACHIBANA SEIICHIRO
100 granted patents·20 pending applications·743 citations·filing 2000–2025
99Inventor score
Top patents by PatentIndex Score
120 records- 0198US7569326B2Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Aug 4, 2009·129 cites·11 claims
- 0297US8057985B2Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning processOHASHI MASAKI·Filed 2009·Granted Nov 15, 2011·52 cites·11 claims
- 0396US11485824B2Thermosetting silicon-containing compound, composition for forming a silicon-containing film, and patterning processSHINETSU CHEMICAL CO·Filed 2020·Granted Nov 1, 2022·4 cites·8 claims
- 0496US8785105B2Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making methodOHSAWA YOUICHI·Filed 2011·Granted Jul 22, 2014·17 cites·16 claims
- 0596US8105748B2Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning processOHASHI MASAKI·Filed 2009·Granted Jan 31, 2012·81 cites·11 claims
- 0696US8048610B2Sulfonium salt-containing polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2009·Granted Nov 1, 2011·32 cites·11 claims
- 0795US9671694B1Wet strippable gap fill materialsIBM·Filed 2016·Granted Jun 6, 2017·12 cites·17 claims
- 0895US8759220B1Patterning processSHINETSU CHEMICAL CO·Filed 2013·Granted Jun 24, 2014·13 cites·46 claims
- 0995US7531289B2Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning processSHINETSU CHEMICAL CO·Filed 2005·Granted May 12, 2009·16 cites·13 claims
- 1095US7459261B2Resist composition and patterning process using the sameSHINETSU CHEMICAL CO·Filed 2005·Granted Dec 2, 2008·28 cites·12 claims
- 1193US9017918B2Monomer, polymer, chemically amplified positive resist composition, and patterning processHATAKEYAMA JUN·Filed 2011·Granted Apr 28, 2015·8 cites·9 claims
- 1292US8999625B2Silicon-containing antireflective coatings including non-polymeric silsesquioxanesIBM·Filed 2013·Granted Apr 7, 2015·8 cites·17 claims
- 1391US9805943B2Polymer for resist under layer film composition, resist under layer film composition, and patterning processSHINETSU CHEMICAL CO·Filed 2016·Granted Oct 31, 2017·7 cites·32 claims
- 1490US8039198B2Sulfonium salt-containing polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2009·Granted Oct 18, 2011·12 cites·13 claims
- 1589US9522979B2Fluorine-containing silicon compound, method for producing same, and method for producing fluorine-containing silicon resinSHINETSU CHEMICAL CO·Filed 2015·Granted Dec 20, 2016·2 cites·8 claims
- 1689US9233919B2Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making methodSHINETSU CHEMICAL CO·Filed 2014·Granted Jan 12, 2016·4 cites·2 claims
- 1789US8062828B2Positive resist composition and patterning processOHSAWA YOUICHI·Filed 2009·Granted Nov 22, 2011·11 cites·7 claims
- 1889US7871752B2Lactone-containing compound, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Jan 18, 2011·11 cites·5 claims
- 1988US9372404B2Organic film composition, method for forming organic film and patterning process using this, and heat-decomposable polymerSHINETSU CHEMICAL CO·Filed 2013·Granted Jun 21, 2016·8 cites·27 claims
- 2088US7678530B2Lactone-containing compound, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Mar 16, 2010·9 cites·20 claims
- 2186US6492090B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Dec 10, 2002·25 cites·5 claims
- 2284US9977330B2Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning processSHINETSU CHEMICAL CO·Filed 2015·Granted May 22, 2018·3 cites·24 claims
- 2384US8501384B2Positive resist composition and patterning processHATAKEYAMA JUN·Filed 2011·Granted Aug 6, 2013·4 cites·12 claims
- 2484US7629106B2Resist composition and patterning process using the sameSHINETSU CHEMICAL CO·Filed 2006·Granted Dec 8, 2009·7 cites·25 claims
- 2583US9312127B2Method for producing semiconductor apparatus substrateSHINETSU CHEMICAL CO·Filed 2015·Granted Apr 12, 2016·4 cites·20 claims
- 2683US8450042B2Positive resist composition and patterning processHATAKEYAMA JUN·Filed 2010·Granted May 28, 2013·4 cites·20 claims
- 2782US8129086B2Polymerizable compound, polymer, positive resist composition, and patterning process using the sameHATAKEYAMA JUN·Filed 2009·Granted Mar 6, 2012·6 cites·20 claims
- 2882US6673515B2Polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Jan 6, 2004·20 cites·20 claims
- 2981US8211618B2Positive resist composition and patterning processHATAKEYAMA JUN·Filed 2010·Granted Jul 3, 2012·3 cites·12 claims
- 3080US9230827B2Method for forming a resist under layer film and patterning processSHINETSU CHEMICAL CO·Filed 2014·Granted Jan 5, 2016·4 cites·20 claims
- 3180US8062831B2Carboxyl-containing lactone compound, polymer, resist composition, and patterning processSHINACHI SATOSHI·Filed 2009·Granted Nov 22, 2011·7 cites·6 claims
- 3279US9274425B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2014·Granted Mar 1, 2016·4 cites·6 claims
- 3379US6794111B2Polymers, resist compositions and patterning process, novel tetrahydrofuran compounds and their preparationSHINETSU CHEMICAL CO·Filed 2002·Granted Sep 21, 2004·16 cites·26 claims
- 3478US7687228B2Antireflection film composition and patterning process using the sameSHINETSU CHEMICAL CO·Filed 2008·Granted Mar 30, 2010·4 cites·24 claims
- 3578US6586157B2Ester compounds, polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Jul 1, 2003·12 cites·16 claims
- 3678US6472543B2Lactone compounds having alicyclic structure and their manufacturing methodSHINETSU CHEMICAL CO·Filed 2001·Granted Oct 29, 2002·7 cites·4 claims
- 3777US8288072B2Resist lower layer film-formed substrateHATAKEYAMA JUN·Filed 2008·Granted Oct 16, 2012·4 cites·8 claims
- 3877US7666571B2Polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2006·Granted Feb 23, 2010·4 cites·6 claims
- 3977US7202318B2Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning processSHINETSU CHEMICAL CO·Filed 2005·Granted Apr 10, 2007·4 cites·5 claims
- 4076US9091933B2Negative pattern forming processSHINETSU CHEMICAL CO·Filed 2012·Granted Jul 28, 2015·2 cites·15 claims
- 4176US7687222B2Polymerizable ester compounds, polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Mar 30, 2010·3 cites·9 claims
- 4276US7618765B2Positive resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2008·Granted Nov 17, 2009·14 cites·4 claims
- 4376US7541133B2Positive resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Jun 2, 2009·4 cites·7 claims
- 4476US6962767B2Acetal compound, polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Nov 8, 2005·10 cites·21 claims
- 4575US9261788B2Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning processSHINETSU CHEMICAL CO·Filed 2013·Granted Feb 16, 2016·2 cites·1 claims
- 4675US6524765B1Polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2000·Granted Feb 25, 2003·14 cites·13 claims
- 4775US6500961B2Lactone compounds having alicyclic structure and their manufacturing methodSHINETSU CHEMICAL CO·Filed 2001·Granted Dec 31, 2002·6 cites·3 claims
- 4874US10604618B2Compound, method for manufacturing the compound, and composition for forming organic filmSHINETSU CHEMICAL CO·Filed 2018·Granted Mar 31, 2020·1 cites·13 claims
- 4974US9046764B2Resist underlayer film composition, method for producing polymer for resist underlayer film, and patterning process using the resist underlayer film compositionSHINETSU CHEMICAL CO·Filed 2012·Granted Jun 2, 2015·2 cites·24 claims
- 5074US7879530B2Antireflective coating composition, antireflective coating, and patterning processSHINETSU CHEMICAL CO·Filed 2008·Granted Feb 1, 2011·2 cites·6 claims
Showing the top 50 of 120 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →