Inventor · disambiguated record
Shintaro Higashi
Also filed as: HIGASHI SHINTARO
8 granted patents·3 pending applications·22 citations·filing 2008–2025
79Inventor score
Files withKOJUNDO CHEMICAL LABORATORY CO LTD7KABUSHIKIKAISHA KOJUNDOKAGAKU1KADOKURA HIDEKIMI1MOGI TAKAYUKI1TOKYO ELECTRON LTD1
Top patents by PatentIndex Score
11 records- 0188US7635441B2Raw material for forming a strontium-containing thin film and process for preparing the raw materialKABUSHIKIKAISHA KOJUNDOKAGAKU·Filed 2008·Granted Dec 22, 2009·14 cites·2 claims
- 0279US8747965B2Precursor for formation of europium-containing thin film, and method for forming europium-containing thin filmMOGI TAKAYUKI·Filed 2012·Granted Jun 10, 2014·8 cites·8 claims
- 0378US2025283217A1Vapor deposition source material used in production of film containing indium and one or more of the other metals, and the method of producing film containing indium and one or more of the other metalsKOJUNDO CHEMICAL LABORATORY CO LTD·Filed 2025·Application pending·0 cites
- 0472US12410514B2Vapor deposition source material used in production of film containing indium and one or more of the other metals, and the method of producing film containing indium and one or more of the other metalsKOJUNDO CHEMICAL LABORATORY CO LTD·Filed 2021·Granted Sep 9, 2025·0 cites·3 claims
- 0568US2024060180A1Atomic layer deposition method for metal thin filmsKOJUNDO CHEMICAL LABORATORY CO LTD·Filed 2023·Application pending·0 cites
- 0657US10752992B2Atomic layer deposition method of metal-containing thin filmKOJUNDO CHEMICAL LABORATORY CO LTD·Filed 2018·Granted Aug 25, 2020·0 cites·3 claims
- 0753US11807939B2Atomic layer deposition method for metal thin filmsKOJUNDO CHEMICAL LABORATORY CO LTD·Filed 2018·Granted Nov 7, 2023·0 cites·1 claims
- 0849US11655538B2Precursor for chemical vapor deposition, and light-blocking container containing precursor for chemical vapor deposition and method for producing the sameKOJUNDO CHEMICAL LABORATORY CO LTD·Filed 2018·Granted May 23, 2023·0 cites·8 claims
- 0948US8293327B2Process for forming the strontium-containing thin filmKADOKURA HIDEKIMI·Filed 2008·Granted Oct 23, 2012·0 cites·9 claims
- 1046US2023160051A1Method for manufacturing crystalline gallium nitride thin filmKOJUNDO CHEMICAL LABORATORY CO LTD·Filed 2021·Application pending·0 cites
- 1145US7816282B2Method for forming SrTiO3 filmTOKYO ELECTRON LTD·Filed 2008·Granted Oct 19, 2010·0 cites·15 claims
Join the waitlist — get patent alerts
Get an alert when Shintaro Higashi files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →