Inventor · disambiguated record
Shinji Himori
Also filed as: HIMORI SHINJI
54 granted patents·30 pending applications·1,392 citations·filing 1994–2025
98Inventor score
Top patents by PatentIndex Score
84 records- 0198US5888907APlasma processing methodTOKYO ELECTRON LTD·Filed 1997·Granted Mar 30, 1999·427 cites·5 claims
- 0297US10553407B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Feb 4, 2020·47 cites·14 claims
- 0397US10388544B2Substrate processing apparatus and substrate processing methodTOSHIBA KK·Filed 2015·Granted Aug 20, 2019·45 cites·4 claims
- 0497US9564287B2Substrate processing apparatus and substrate processing method using sameTOKYO ELECTRON LTD·Filed 2013·Granted Feb 7, 2017·41 cites·20 claims
- 0597US8703002B2Plasma processing apparatus, plasma processing method and storage mediumTOKYO ELECTRON LTD·Filed 2013·Granted Apr 22, 2014·343 cites·8 claims
- 0696US11387077B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Jul 12, 2022·3 cites·13 claims
- 0795US8821684B2Substrate plasma processing apparatus and plasma processing methodUI AKIO·Filed 2009·Granted Sep 2, 2014·52 cites·5 claims
- 0895US7585386B2Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing methodOCTEC INC·Filed 2005·Granted Sep 8, 2009·33 cites·12 claims
- 0994US8568606B2Substrate processing apparatus and substrate processing method using sameOHSE TAKESHI·Filed 2010·Granted Oct 29, 2013·37 cites·18 claims
- 1093US8070911B2Capacitive coupling plasma processing apparatusHIMORI SHINJI·Filed 2006·Granted Dec 6, 2011·16 cites·20 claims
- 1193US6733624B2Apparatus for holding an object to be processedTOKYO ELECTRON LTD·Filed 2003·Granted May 11, 2004·66 cites·13 claims
- 1292US7619870B2Electrostatic chuckTOKYO ELECTRON LTD·Filed 2007·Granted Nov 17, 2009·24 cites·15 claims
- 1392US7104217B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2002·Granted Sep 12, 2006·67 cites·21 claims
- 1490US8293068B2Plasma processing apparatusKOSHIMIZU CHISHIO·Filed 2009·Granted Oct 23, 2012·17 cites·12 claims
- 1589US11170979B2Plasma etching method and plasma etching apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Nov 9, 2021·4 cites·17 claims
- 1688US9245776B2Plasma processing apparatusHIMORI SHINJI·Filed 2010·Granted Jan 26, 2016·9 cites·18 claims
- 1788US8741098B2Table for use in plasma processing system and plasma processing systemKOSHIISHI AKIRA·Filed 2007·Granted Jun 3, 2014·11 cites·13 claims
- 1886US8114247B2Plasma processing apparatus and focus ringENDOH SHOSUKE·Filed 2010·Granted Feb 14, 2012·8 cites·5 claims
- 1986US7922862B2Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing methodOCTEC INC·Filed 2009·Granted Apr 12, 2011·9 cites·18 claims
- 2084US10651012B2Substrate processing methodTOKYO ELECTRON LTD·Filed 2016·Granted May 12, 2020·3 cites·8 claims
- 2181US9412562B2Capacitive coupling plasma processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Aug 9, 2016·2 cites·14 claims
- 2279US12437970B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2023·Granted Oct 7, 2025·0 cites·15 claims
- 2378US9390943B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Jul 12, 2016·4 cites·10 claims
- 2476US8512511B2Mounting table and plasma processing apparatusHIMORI SHINJI·Filed 2009·Granted Aug 20, 2013·5 cites·21 claims
- 2576US7767055B2Capacitive coupling plasma processing apparatusTOKYO ELECTRON LTD·Filed 2005·Granted Aug 3, 2010·5 cites·17 claims
- 2676US2025191877A1Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 2775US12033832B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Jul 9, 2024·0 cites·19 claims
- 2875US9978566B2Plasma etching methodTOKYO ELECTRON LTD·Filed 2016·Granted May 22, 2018·2 cites·6 claims
- 2975US9859146B2Semiconductor manufacturing device and processing methodHIMORI SHINJI·Filed 2012·Granted Jan 2, 2018·3 cites·3 claims
- 3075US8284538B2Electrostatic chuck deviceHIMORI SHINJI·Filed 2007·Granted Oct 9, 2012·5 cites·15 claims
- 3175US7230202B2Plasma processing apparatus, electrode unit, feeder member and radio frequency feeder rodTOKYO ELECTRON LTD·Filed 2004·Granted Jun 12, 2007·9 cites·25 claims
- 3274US11133157B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Sep 28, 2021·1 cites·14 claims
- 3374US9038566B2Capacitive coupling plasma processing apparatusHIMORI SHINJI·Filed 2011·Granted May 26, 2015·2 cites·17 claims
- 3474US7112926B2Matching unit and plasma processing systemTOKYO HY POWER LABS INC·Filed 2002·Granted Sep 26, 2006·22 cites·21 claims
- 3573US9275836B2Plasma processing apparatus and plasma processing methodHIMORI SHINJI·Filed 2010·Granted Mar 1, 2016·3 cites·1 claims
- 3673US7186315B2Plasma treatment apparatusTOSHIBA KK·Filed 2003·Granted Mar 6, 2007·10 cites·6 claims
- 3772US10699935B2Semiconductor manufacturing device and processing methodTOKYO ELECTRON LTD·Filed 2017·Granted Jun 30, 2020·1 cites·3 claims
- 3871US10032611B2Connection control methodTOKYO ELECTRON LTD·Filed 2016·Granted Jul 24, 2018·1 cites·3 claims
- 3970US8178444B2Substrate processing method and substrate processing apparatusKOSHIMIZU CHISHIO·Filed 2009·Granted May 15, 2012·3 cites·13 claims
- 4068US9202675B2Plasma processing apparatus and electrode for sameHIMORI SHINJI·Filed 2010·Granted Dec 1, 2015·2 cites·22 claims
- 4167US12424424B2Plasma monitoring system, plasma monitoring method, and monitoring deviceTOKYO ELECTRON LTD·Filed 2023·Granted Sep 23, 2025·0 cites·18 claims
- 4266US8651049B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2012·Granted Feb 18, 2014·1 cites·12 claims
- 4365US11764034B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Sep 19, 2023·0 cites·11 claims
- 4465US5514425AMethod of forming a thin filmTOSHIBA KK·Filed 1994·Granted May 7, 1996·34 cites·22 claims
- 4565US2024068921A1Particle monitoring system, particle monitoring method, and monitoring deviceTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 4664US2025069851A1Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 4763US12255049B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2019·Granted Mar 18, 2025·0 cites·22 claims
- 4863US2014346040A1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 4962US7850174B2Plasma processing apparatus and focus ringTOKYO ELECTRON LTD·Filed 2004·Granted Dec 14, 2010·7 cites·23 claims
- 5061US11450515B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Sep 20, 2022·0 cites·7 claims
Showing the top 50 of 84 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →