Inventor · disambiguated record
Shingo Hishiya
Also filed as: HISHIYA SHINGO
24 granted patents·5 pending applications·84 citations·filing 2001–2023
93Inventor score
Top patents by PatentIndex Score
29 records- 0193US8896097B2Method of manufacturing capacitor, capacitor and method of forming dielectric film for use in capacitorTOKYO ELECTRON LTD·Filed 2013·Granted Nov 25, 2014·16 cites·13 claims
- 0291US8288241B2Semiconductor device, method of manufacturing the same and adsorption site blocking atomic layer deposition methodHIROTA TOSHIYUKI·Filed 2011·Granted Oct 16, 2012·14 cites·20 claims
- 0384US11786946B2Cleaning method and film forming apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Oct 17, 2023·4 cites·16 claims
- 0482US8122850B2Method and apparatus for processing polysilazane filmHISHIYA SHINGO·Filed 2009·Granted Feb 28, 2012·10 cites·12 claims
- 0573US7208428B2Method and apparatus for treating article to be treatedTOKYO ELECTRON LTD·Filed 2001·Granted Apr 24, 2007·17 cites·7 claims
- 0673US6821566B2Method and apparatus for forming insulating film containing silicon oxy-nitrideTOKYO ELECTRON LTD·Filed 2002·Granted Nov 23, 2004·15 cites·20 claims
- 0770US10964530B2Method of forming blocking silicon oxide film, and storage mediumTOKYO ELECTRON LTD·Filed 2018·Granted Mar 30, 2021·1 cites·10 claims
- 0869US10553686B2Method and apparatus for forming silicon oxide film, and storage mediumTOKYO ELECTRON LTD·Filed 2018·Granted Feb 4, 2020·1 cites·16 claims
- 0956US12438055B2Abnormality detection method and processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Oct 7, 2025·0 cites·9 claims
- 1055US2023422348A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1154US12334380B2Boat transfer method and heat treatment apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Jun 17, 2025·0 cites·8 claims
- 1253US7064084B2Oxide film forming methodTOKYO ELECTRON LTD·Filed 2002·Granted Jun 20, 2006·4 cites·6 claims
- 1352US12018366B2Substrate processing apparatus and cleaning methodTOKYO ELECTRON LTD·Filed 2021·Granted Jun 25, 2024·0 cites·6 claims
- 1449US7563481B2Method and apparatus for processing polysilazane filmTOKYO ELECTRON LTD·Filed 2004·Granted Jul 21, 2009·2 cites·15 claims
- 1545US11725281B2Gas introduction structure, thermal processing apparatus and gas supply methodTOKYO ELECTRON LTD·Filed 2020·Granted Aug 15, 2023·0 cites·12 claims
- 1645US8216378B2Reaction tube and heat processing apparatus for a semiconductor processKANEKO HIROFUMI·Filed 2009·Granted Jul 10, 2012·0 cites·20 claims
- 1743US9776202B2Driving method of vertical heat treatment apparatus, storage medium and vertical heat treatment apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Oct 3, 2017·0 cites·2 claims
- 1843US9562285B2Film forming method, film forming apparatus and storage mediumTOKYO ELECTRON LTD·Filed 2015·Granted Feb 7, 2017·0 cites·3 claims
- 1942US10968515B2Vertical heat treatment apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Apr 6, 2021·0 cites·8 claims
- 2041US8642127B2Method of forming titanium nitride filmMOROZUMI YUICHIRO·Filed 2012·Granted Feb 4, 2014·0 cites·7 claims
- 2140US8735304B2Film forming method, film forming apparatus, and storage mediumMOROZUMI YUICHIRO·Filed 2012·Granted May 27, 2014·0 cites·4 claims
- 2239US7465682B2Method and apparatus for processing organosiloxane filmTOKYO ELECTRON LTD·Filed 2004·Granted Dec 16, 2008·0 cites·3 claims
- 2339US7259026B2Method and apparatus for processing organosiloxane filmTOKYO ELECTRON LTD·Filed 2004·Granted Aug 21, 2007·0 cites·15 claims
- 2439US2012309163A1Method of forming titanium oxide film having rutile crystalline structureKIYOMURA TAKAKAZU·Filed 2012·Application pending·0 cites
- 2536US2005153533A1Semiconductor manufacturing method and semiconductor manufacturing apparatusTOKYO ELECTRON LTD·Filed 2003·Application pending·0 cites
- 2635US8389421B2Film formation method and film formation apparatusHARADA KATSUSHIGE·Filed 2011·Granted Mar 5, 2013·0 cites·8 claims
- 2734US2007026642A1Surface modification method and surface modification apparatus for interlayer insulating filmHISHIYA SHINGO·Filed 2004·Application pending·0 cites
- 2833US8815112B2Liquid processing method, recording medium having recorded program for executing liquid processing method therein and liquid processing apparatusMIZUNO TSUYOSHI·Filed 2011·Granted Aug 26, 2014·0 cites·9 claims
- 2931US2004231777A1Method and apparatus for treating organosiloxane coatingFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →