Inventor · disambiguated record
Shane Lavan
Also filed as: LAVAN SHANE
15 granted patents·16 citations·filing 2020–2023
88Inventor score
Files withAPPLIED MATERIALS INC15
Top patents by PatentIndex Score
15 records- 0197US11915918B2Cleaning of sin with CCP plasma or RPS cleanAPPLIED MATERIALS INC·Filed 2021·Granted Feb 27, 2024·4 cites·8 claims
- 0296US11600761B2High critical temperature metal nitride layer with oxide or oxynitride seed layerAPPLIED MATERIALS INC·Filed 2021·Granted Mar 7, 2023·4 cites·20 claims
- 0389US11600477B2Gas injection process kit to eliminate arcing and improve uniform gas distribution for a PVD processAPPLIED MATERIALS INC·Filed 2020·Granted Mar 7, 2023·2 cites·19 claims
- 0489US11469096B2Method and chamber for backside physical vapor depositionAPPLIED MATERIALS INC·Filed 2020·Granted Oct 11, 2022·2 cites·20 claims
- 0588US11678589B2Method of making high critical temperature metal nitride layerAPPLIED MATERIALS INC·Filed 2021·Granted Jun 13, 2023·1 cites·17 claims
- 0688US11572618B2Method and chamber for backside physical vapor depositionAPPLIED MATERIALS INC·Filed 2020·Granted Feb 7, 2023·2 cites·18 claims
- 0783US12096701B2Method of making high critical temperature metal nitride layerAPPLIED MATERIALS INC·Filed 2023·Granted Sep 17, 2024·0 cites·16 claims
- 0881US12183560B2Gas injection process kit to eliminate arcing and improve uniform gas distribution for a PVD processAPPLIED MATERIALS INC·Filed 2023·Granted Dec 31, 2024·0 cites·20 claims
- 0978US12176205B2Method and chamber for backside physical vapor depositionAPPLIED MATERIALS INC·Filed 2023·Granted Dec 24, 2024·0 cites·20 claims
- 1076US12185643B2High critical temperature metal nitride layer with oxide or oxynitride seed layerAPPLIED MATERIALS INC·Filed 2023·Granted Dec 31, 2024·0 cites·20 claims
- 1175US12142478B2Method and chamber for backside physical vapor depositionAPPLIED MATERIALS INC·Filed 2022·Granted Nov 12, 2024·0 cites·20 claims
- 1274US12052935B2Method of making high critical temperature metal nitride layerAPPLIED MATERIALS INC·Filed 2021·Granted Jul 30, 2024·0 cites·20 claims
- 1369US12027354B2Cleaning of SIN with CCP plasma or RPS cleanAPPLIED MATERIALS INC·Filed 2022·Granted Jul 2, 2024·0 cites·10 claims
- 1458US11450514B1Methods of reducing particles in a physical vapor deposition (PVD) chamberAPPLIED MATERIALS INC·Filed 2021·Granted Sep 20, 2022·0 cites·20 claims
- 1543USD1072774STarget profile for a physical vapor deposition chamber targetAPPLIED MATERIALS INC·Filed 2021·Granted Apr 29, 2025·1 cites·1 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →