Inventor · disambiguated record
Shurong Liang
Also filed as: LIANG SHURONG
25 granted patents·5 pending applications·82 citations·filing 2004–2024
94Inventor score
Files withAPPLIED MATERIALS INC12VARIAN SEMICONDUCTOR EQUIPMENT ASS INC12GLOBALFOUNDRIES INC5MCFADDEN ROBERT S1
Top patents by PatentIndex Score
30 records- 0194US9706634B2Apparatus and techniques to treat substrates using directional plasma and reactive gasVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Granted Jul 11, 2017·12 cites·14 claims
- 0294US9123627B1Methods of forming alternative material fins with reduced defect density for a FinFET semiconductor deviceGLOBALFOUNDRIES INC·Filed 2014·Granted Sep 1, 2015·17 cites·25 claims
- 0393US10141161B2Angle control for radicals and reactive neutral ion beamsVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2016·Granted Nov 27, 2018·13 cites·19 claims
- 0492US10840132B1Methods for forming elongated contact hole endsAPPLIED MATERIALS INC·Filed 2019·Granted Nov 17, 2020·6 cites·20 claims
- 0591US11335590B2Methods for forming elongated contact hole endsAPPLIED MATERIALS INC·Filed 2020·Granted May 17, 2022·2 cites·20 claims
- 0689US10004133B2Apparatus and techniques to treat substrates using directional plasma and reactive gasVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted Jun 19, 2018·5 cites·18 claims
- 0789US9997351B2Apparatus and techniques for filling a cavity using angled ion beamVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Granted Jun 12, 2018·6 cites·14 claims
- 0886US9299775B2Methods for the production of integrated circuits comprising epitaxially grown replacement structuresGLOBALFOUNDRIES INC·Filed 2014·Granted Mar 29, 2016·7 cites·19 claims
- 0985US10535522B1Angular control of ion beam for vertical surface treatmentVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2018·Granted Jan 14, 2020·4 cites·20 claims
- 1082US9224605B2Forming alternative material fins with reduced defect density by performing an implantation/anneal defect generation processGLOBALFOUNDRIES INC·Filed 2014·Granted Dec 29, 2015·5 cites·19 claims
- 1179US9865433B1Gas injection system for ion beam deviceVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted Jan 9, 2018·2 cites·20 claims
- 1276US11842923B2Methods for forming elongated contact hole endsAPPLIED MATERIALS INC·Filed 2022·Granted Dec 12, 2023·0 cites·19 claims
- 1374US10699871B2System and method for spatially resolved optical metrology of an ion beamAPPLIED MATERIALS INC·Filed 2018·Granted Jun 30, 2020·1 cites·20 claims
- 1467US10128082B2Apparatus and techniques to treat substrates using directional plasma and point of use chemistryVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Granted Nov 13, 2018·1 cites·11 claims
- 1565US11380517B2System and method for spatially resolved optical metrology of an ion beamAPPLIED MATERIALS INC·Filed 2020·Granted Jul 5, 2022·0 cites·20 claims
- 1664US9275861B2Methods of forming group III-V semiconductor materials on group IV substrates and the resulting substrate structuresGLOBALFOUNDRIES INC·Filed 2013·Granted Mar 1, 2016·1 cites·10 claims
- 1761US2025299964A1Pattern shaping of metal resist layer using reactive angled beam processingAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1860US12387942B2Modifying patterned features using a directional etchAPPLIED MATERIALS INC·Filed 2022·Granted Aug 12, 2025·0 cites·20 claims
- 1960US10600616B2Apparatus and techniques to treat substrates using directional plasma and point of use chemistryVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2018·Granted Mar 24, 2020·0 cites·15 claims
- 2059US12463045B2Selective trench modification using directional etchAPPLIED MATERIALS INC·Filed 2022·Granted Nov 4, 2025·0 cites·19 claims
- 2156US2025157815A1Selective feature modification using directional depositionAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2254US11854818B2Angled etch for surface smoothingAPPLIED MATERIALS INC·Filed 2021·Granted Dec 26, 2023·0 cites·15 claims
- 2350US11984318B2Directional modification of patterning structure to enhance pattern elongation process marginAPPLIED MATERIALS INC·Filed 2020·Granted May 14, 2024·0 cites·19 claims
- 2449US10730082B2Apparatus and method for differential in situ cleaningVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2016·Granted Aug 4, 2020·0 cites·18 claims
- 2543US10312432B2Magnetic memory device and techniques for formingVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2016·Granted Jun 4, 2019·0 cites·13 claims
- 2642US10193066B2Apparatus and techniques for anisotropic substrate etchingVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted Jan 29, 2019·0 cites·17 claims
- 2741US2015093887A1Methods for removing a native oxide layer from germanium susbtrates in the fabrication of integrated circuitsiGLOBALFOUNDRIES INC·Filed 2014·Application pending·0 cites
- 2841US2021159068A1Low volatility material removal from a semiconductor deviceAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 2939US10113229B2Techniques for controlling ion/neutral ratio of a plasma sourceVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Granted Oct 30, 2018·0 cites·20 claims
- 3038US2005284371A1Deposition apparatus for providing uniform low-k dielectricMCFADDEN ROBERT S·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →