Inventor · disambiguated record
Shigeru Mizuno
Also filed as: MIZUNO SHIGERU
58 granted patents·8 pending applications·2,152 citations·filing 1981–2019
99Inventor score
Files withANELVA CORP22TOKYO ELECTRON LTD13SHINKO ELECTRIC IND CO11BROTHER IND LTD5CANON ANELVA CORP4
Top patents by PatentIndex Score
66 records- 0199US5494494AIntegrated module multi-chamber CVD processing system and its method for processing substratesANELVA CORP·Filed 1994·Granted Feb 27, 1996·666 cites·25 claims
- 0295US6774467B2Semiconductor device and process of production of sameSHINKO ELECTRIC IND CO·Filed 2001·Granted Aug 10, 2004·178 cites·4 claims
- 0395US5676758ACVD apparatusANELVA CORP·Filed 1996·Granted Oct 14, 1997·209 cites·12 claims
- 0492US5505779AIntegrated module multi-chamber CVD processing system and its method for processing substratesANELVA CORP·Filed 1994·Granted Apr 9, 1996·73 cites·11 claims
- 0590US7848077B2Electrostatic chuck deviceCANON ANELVA CORP·Filed 2009·Granted Dec 7, 2010·10 cites·3 claims
- 0690US5033407ALow pressure vapor phase growth apparatusANELVA CORP·Filed 1990·Granted Jul 23, 1991·94 cites·6 claims
- 0789US9688502B2Sheet processing apparatus and image forming system for forming a folding line on a sheetSAWADA KEN·Filed 2015·Granted Jun 27, 2017·4 cites·19 claims
- 0888US10124981B2Sheet processing apparatus and image forming system including multiple folding membersSAWADA KEN·Filed 2017·Granted Nov 13, 2018·3 cites·21 claims
- 0987US8956512B2Magnetron sputtering apparatus and film forming methodTOKYO ELECTRON LTD·Filed 2013·Granted Feb 17, 2015·7 cites·12 claims
- 1087US6872289B2Thin film fabrication method and thin film fabrication apparatusANELVA CORP·Filed 2001·Granted Mar 29, 2005·42 cites·14 claims
- 1187US5534072AIntegrated module multi-chamber CVD processing system and its method for processing subtratesANELVA CORP·Filed 1993·Granted Jul 9, 1996·58 cites·59 claims
- 1286US8242019B2Selective deposition of metal-containing cap layers for semiconductor devicesISHIZAKA TADAHIRO·Filed 2009·Granted Aug 14, 2012·12 cites·9 claims
- 1386US7791857B2Electrostatic chuck deviceCANON ANELVA CORP·Filed 2008·Granted Sep 7, 2010·7 cites·6 claims
- 1486US7623334B2Electrostatic chuck deviceCANON ANELVA CORP·Filed 2003·Granted Nov 24, 2009·25 cites·10 claims
- 1586US6663714B2CVD apparatusANELVA CORP·Filed 2001·Granted Dec 16, 2003·63 cites·44 claims
- 1685US8058728B2Diffusion barrier and adhesion layer for an interconnect structureISHIZAKA TADAHIRO·Filed 2008·Granted Nov 15, 2011·13 cites·13 claims
- 1784US7846841B2Method for forming cobalt nitride cap layersTOKYO ELECTRON LTD·Filed 2008·Granted Dec 7, 2010·9 cites·20 claims
- 1884US7731187B2Sheet medium adjustment apparatus and image formation system capable of sorting sheet mediaRICOH KK·Filed 2007·Granted Jun 8, 2010·13 cites·3 claims
- 1984US6849945B2Multi-layered semiconductor device and method for producing the sameSHINKO ELECTRIC IND CO·Filed 2001·Granted Feb 1, 2005·38 cites·8 claims
- 2084US5624499ACVD apparatusANELVA CORP·Filed 1996·Granted Apr 29, 1997·70 cites·27 claims
- 2182US7724493B2Electrostatic chuck deviceCANON ANELVA CORP·Filed 2008·Granted May 25, 2010·5 cites·17 claims
- 2282US5766363AHeater for CVD apparatusANELVA CORP·Filed 1996·Granted Jun 16, 1998·56 cites·9 claims
- 2381US6199505B1Plasma processing apparatusANELVA CORP·Filed 1999·Granted Mar 13, 2001·38 cites·8 claims
- 2480US7727883B2Method of forming a diffusion barrier and adhesion layer for an interconnect structureTOKYO ELECTRON LTD·Filed 2008·Granted Jun 1, 2010·8 cites·22 claims
- 2580US6129046ASubstrate processing apparatusANELVA CORP·Filed 1997·Granted Oct 10, 2000·46 cites·11 claims
- 2678US5728629AProcess for preventing deposition on inner surfaces of CVD reactorANELVA CORP·Filed 1994·Granted Mar 17, 1998·46 cites·10 claims
- 2777US6348238B1Thin film fabrication method and thin film fabrication apparatusANELVA CORP·Filed 2000·Granted Feb 19, 2002·20 cites·14 claims
- 2876US8617363B2Magnetron sputtering apparatusTOKYO ELECTRON LTD·Filed 2012·Granted Dec 31, 2013·3 cites·17 claims
- 2976US7935393B2Method and system for improving sidewall coverage in a deposition systemTOKYO ELECTRON LTD·Filed 2007·Granted May 3, 2011·3 cites·20 claims
- 3075US8372739B2Diffusion barrier for integrated circuits formed from a layer of reactive metal and method of fabricationTOKYO ELECTRON LTD·Filed 2007·Granted Feb 12, 2013·8 cites·27 claims
- 3175US7777349B2Semiconductor apparatus having side surface wiringSHINKO ELECTRIC IND CO·Filed 2008·Granted Aug 17, 2010·6 cites·5 claims
- 3274US7799681B2Method for forming a ruthenium metal cap layerTOKYO ELECTRON LTD·Filed 2008·Granted Sep 21, 2010·4 cites·24 claims
- 3373US6974721B2Method for manufacturing thin semiconductor chipSHINKO ELECTRIC IND CO·Filed 2003·Granted Dec 13, 2005·19 cites·2 claims
- 3473US6070552ASubstrate processing apparatusANELVA CORP·Filed 1998·Granted Jun 6, 2000·26 cites·5 claims
- 3572US8076241B2Methods for multi-step copper plating on a continuous ruthenium film in recessed featuresCERIO JR FRANK M·Filed 2009·Granted Dec 13, 2011·5 cites·30 claims
- 3671US6103304AChemical vapor deposition apparatusANELVA CORP·Filed 1999·Granted Aug 15, 2000·27 cites·4 claims
- 3771US6085690AChemical vapor deposition apparatusANELVA CORP·Filed 1999·Granted Jul 11, 2000·29 cites·8 claims
- 3869US7642201B2Sequential tantalum-nitride depositionTOKYO ELECTRON LTD·Filed 2008·Granted Jan 5, 2010·4 cites·20 claims
- 3969US6059985AMethod of processing a substrate and apparatus for the methodANELVA CORP·Filed 1997·Granted May 9, 2000·37 cites·12 claims
- 4066US8026168B2Semiconductor device containing an aluminum tantalum carbonitride barrier film and method of formingTOKYO ELECTRON LTD·Filed 2007·Granted Sep 27, 2011·2 cites·8 claims
- 4166US7718527B2Method for forming cobalt tungsten cap layersTOKYO ELECTRON LTD·Filed 2008·Granted May 18, 2010·2 cites·27 claims
- 4266US4508567APress-molding process for preparing a powder compactBROTHER IND LTD·Filed 1982·Granted Apr 2, 1985·23 cites·9 claims
- 4365US5270250AMethod of fabricating semiconductor substrate having very shallow impurity diffusion layerSETEK M KK·Filed 1991·Granted Dec 14, 1993·44 cites·1 claims
- 4465US2020071118A1Sheet processing apparatus and image forming system including multiple folding membersSAWADA KEN·Filed 2019·Application pending·0 cites
- 4562US10519000B2Sheet processing apparatus and image forming system including multiple folding membersSAWADA KEN·Filed 2018·Granted Dec 31, 2019·0 cites·22 claims
- 4661US4411538APrint-head of a dot-printerBROTHER IND LTD·Filed 1981·Granted Oct 25, 1983·11 cites·10 claims
- 4760US6455786B1Wiring board and manufacturing method thereof and semiconductor deviceSHINKO ELECTRIC IND CO·Filed 2000·Granted Sep 24, 2002·9 cites·12 claims
- 4860US5893962AElectrode unit for in-situ cleaning in thermal CVD apparatusANELVA CORP·Filed 1996·Granted Apr 13, 1999·28 cites·18 claims
- 4959US7750484B2Semiconductor device with flip-chip connection that uses gallium or indium as bonding materialSHINKO ELECTRIC IND CO·Filed 2008·Granted Jul 6, 2010·1 cites·5 claims
- 5057US6844661B2Piezoelectric ceramic composition and piezoelectric actuator for ink-jet head based on use of the sameBROTHER IND LTD·Filed 2003·Granted Jan 18, 2005·3 cites·8 claims
Showing the top 50 of 66 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →