Inventor · disambiguated record
Shigemasa Nakasugi
Also filed as: NAKASUGI SHIGEMASA
12 granted patents·3 pending applications·8 citations·filing 2011–2023
82Inventor score
Files withMERCK PATENT GMBH5AZ ELECTRONIC MAT LUXEMBOURG SARL4NAKASUGI SHIGEMASA3AZ ELECTRONIC MAT (LUXEMBOURG) S A R L1AZ ELECTRONIC MATERIALS LUXEMBOURG SARL1
Top patents by PatentIndex Score
15 records- 0181US8900797B2Developable bottom anti-reflective coatingNAKASUGI SHIGEMASA·Filed 2012·Granted Dec 2, 2014·4 cites·15 claims
- 0273US8697336B2Composition for forming a developable bottom antireflective coatingNAKASUGI SHIGEMASA·Filed 2011·Granted Apr 15, 2014·2 cites·14 claims
- 0367US11914296B2Ethynyl derived composite, a composition comprising thereof, a method for manufacturing a coating by it, and a method for manufacturing a device comprising the coatingMERCK PATENT GMBH·Filed 2023·Granted Feb 27, 2024·0 cites·20 claims
- 0465US12242195B2Method for manufacturing cured film and use of the sameMERCK PATENT GMBH·Filed 2020·Granted Mar 4, 2025·0 cites·13 claims
- 0564US9360756B2Composition for forming fine resist pattern and pattern formation method using sameYAMAMOTO KAZUMA·Filed 2013·Granted Jun 7, 2016·2 cites·12 claims
- 0652US2014193753A1Composition for forming a developable bottom antireflective coatingNAKASUGI SHIGEMASA·Filed 2014·Application pending·0 cites
- 0751US11609498B2Ethynyl derived composite, a composition comprising thereof, a method for manufacturing a coating by it, and a method for manufacturing a device comprising the coatingMERCK PATENT GMBH·Filed 2018·Granted Mar 21, 2023·0 cites·20 claims
- 0844US11366389B2Allyloxy derivative, resist underlayer forming composition using the same, and method of manufacturing resist underlayer and semiconductor device using the sameMERCK PATENT GMBH·Filed 2018·Granted Jun 21, 2022·0 cites·20 claims
- 0941US11450805B2Compound, semiconductor material, and methods for manufacturing coating and semiconductor using the sameMERCK PATENT GMBH·Filed 2017·Granted Sep 20, 2022·0 cites·14 claims
- 1041US10451971B2Composition for forming underlayer and method for forming underlayer therewithAZ ELECTRONIC MAT LUXEMBOURG SARL·Filed 2016·Granted Oct 22, 2019·0 cites·14 claims
- 1137US10106428B2Method for producing surface-modified silica nanoparticles, and surface-modified silica nanoparticlesAZ ELECTRONIC MAT LUXEMBOURG SARL·Filed 2015·Granted Oct 23, 2018·0 cites·10 claims
- 1236US9328198B2Composition for forming resist underlayerAZ ELECTRONIC MATERIALS LUXEMBOURG SARL·Filed 2014·Granted May 3, 2016·0 cites·5 claims
- 1333US2019048129A1A polymer, composition, forming sacrificial layer and method for semiconductor device therewithAZ ELECTRONIC MAT LUXEMBOURG SARL·Filed 2017·Application pending·0 cites
- 1431US10435555B2Void forming composition, semiconductor device provided with voids formed using composition, and method for manufacturing semiconductor device using compositionAZ ELECTRONIC MAT LUXEMBOURG SARL·Filed 2015·Granted Oct 8, 2019·0 cites·15 claims
- 1530US2017218227A1Sacrificial film composition, method for preparing same, semiconductor device having voids formed using said composition, and method for manufacturing semiconductor device using said compositionAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →