Inventor · disambiguated record
Shinsuke Oka
Also filed as: OKA SHINSUKE
21 granted patents·7 pending applications·27 citations·filing 1997–2025
91Inventor score
Files withTOKYO ELECTRON LTD27
Top patents by PatentIndex Score
28 records- 0196US11546970B2Plasma processing apparatus and temperature control methodTOKYO ELECTRON LTD·Filed 2020·Granted Jan 3, 2023·4 cites·9 claims
- 0295US11862438B2Plasma processing apparatus, calculation method, and calculation programTOKYO ELECTRON LTD·Filed 2022·Granted Jan 2, 2024·2 cites·19 claims
- 0388US11557468B2Plasma processing apparatus, temperature control method, and temperature control programTOKYO ELECTRON LTD·Filed 2018·Granted Jan 17, 2023·4 cites·11 claims
- 0487US11488808B2Plasma processing apparatus, calculation method, and calculation programTOKYO ELECTRON LTD·Filed 2019·Granted Nov 1, 2022·3 cites·18 claims
- 0582US7432468B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2007·Granted Oct 7, 2008·8 cites·14 claims
- 0680US12300469B2Plasma processing apparatus, calculation method, and calculation programTOKYO ELECTRON LTD·Filed 2023·Granted May 13, 2025·0 cites·17 claims
- 0780US10892144B2Plasma processing apparatus, monitoring method, and monitoring programTOKYO ELECTRON LTD·Filed 2019·Granted Jan 12, 2021·2 cites·18 claims
- 0870US12087559B2Plasma processing apparatus, temperature control method, and temperature control programTOKYO ELECTRON LTD·Filed 2022·Granted Sep 10, 2024·0 cites·14 claims
- 0970US12063717B2Plasma processing apparatus, and temperature control methodTOKYO ELECTRON LTD·Filed 2022·Granted Aug 13, 2024·0 cites·9 claims
- 1070US11049743B2Substrate processing apparatus, flow rate control method, and storage medium storing flow rate control programTOKYO ELECTRON LTD·Filed 2019·Granted Jun 29, 2021·1 cites·14 claims
- 1167US12142462B2Method of reducing leakage of heat transfer gas and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2024·Granted Nov 12, 2024·0 cites·9 claims
- 1266US12243728B2Substrate holding method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2024·Granted Mar 4, 2025·0 cites·10 claims
- 1363US2025336653A1Substrate processing apparatus and electrostatic chuckTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1460US2024186125A1Plasma processing apparatus, plasma state detection method, and plasma state detection programTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1558US12027349B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Jul 2, 2024·0 cites·20 claims
- 1654US2023099398A1Substrate support, substrate processing apparatus, and electrostatic attraction methodTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1752US11621177B2Plasma processing apparatus and calculation methodTOKYO ELECTRON LTD·Filed 2020·Granted Apr 4, 2023·0 cites·9 claims
- 1851US12278126B2Plasma processing apparatus, thermal resistance acquisition method, and thermal resistance acquisition programTOKYO ELECTRON LTD·Filed 2021·Granted Apr 15, 2025·0 cites·7 claims
- 1951US11594399B2Cleaning method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Feb 28, 2023·0 cites·15 claims
- 2050US7833826B2Film formation method, thin-film transistor and solar batteryTOKYO ELECTRON LTD·Filed 2008·Granted Nov 16, 2010·0 cites·16 claims
- 2150US2022068615A1Stage and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 2247US11935731B2Plasma processing apparatus, plasma state detection method, and plasma state detection programTOKYO ELECTRON LTD·Filed 2019·Granted Mar 19, 2024·0 cites·12 claims
- 2345US2021143044A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 2444US11424102B2Model generation apparatus, model generation program, and model generation methodTOKYO ELECTRON LTD·Filed 2019·Granted Aug 23, 2022·0 cites·20 claims
- 2543US2009152243A1Plasma processing apparatus and method thereofTOKYO ELECTRON LTD·Filed 2006·Application pending·0 cites
- 2642US11069545B2Substrate processing apparatus, temperature control method, and temperature control programTOKYO ELECTRON LTD·Filed 2018·Granted Jul 20, 2021·0 cites·13 claims
- 2738US2004065344A1Processing apparatus and cleaning methodFiled 2001·Application pending·0 cites
- 2832US6320154B1Plasma processing methodTOKYO ELECTRON LTD·Filed 1997·Granted Nov 20, 2001·3 cites·5 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →