Inventor · disambiguated record
Shinichi Okita
Also filed as: OKITA SHINICHI
17 granted patents·6 pending applications·371 citations·filing 1992–2012
94Inventor score
Top patents by PatentIndex Score
23 records- 0198US6992751B2Scanning exposure apparatusNIKON CORP·Filed 2003·Granted Jan 31, 2006·175 cites·32 claims
- 0293US7941232B2Control method, control system, and programNIKON CORP·Filed 2006·Granted May 10, 2011·19 cites·30 claims
- 0391US7593100B2Measuring method, measuring system, inspecting method, inspecting system, exposure method and exposure system, in which information as to the degree of the flatness of an object is pre-obtainedNIKON CORP·Filed 2006·Granted Sep 22, 2009·15 cites·32 claims
- 0488US8566756B2Processing condition determining method and apparatus, display method and apparatus, processing apparatus, measurement apparatus and exposure apparatus, substrate processing system, and program and information recording mediumOKITA SHINICHI·Filed 2008·Granted Oct 22, 2013·14 cites·36 claims
- 0588US7838858B2Evaluation system and method of a search operation that detects a detection subject on an objectNIKON CORP·Filed 2006·Granted Nov 23, 2010·21 cites·34 claims
- 0687US7746446B2Alignment condition determination method and apparatus of the same, and exposure method and apparatus of the sameNIKON CORP·Filed 2005·Granted Jun 29, 2010·10 cites·14 claims
- 0787US7718327B2Overlay management method and apparatus, processing apparatus, measurement apparatus and exposure apparatus, device manufacturing system and device manufacturing method, and program and information recording mediumNIKON CORP·Filed 2008·Granted May 18, 2010·9 cites·46 claims
- 0886US6538721B2Scanning exposure apparatusNIKON CORP·Filed 2002·Granted Mar 25, 2003·23 cites·27 claims
- 0983US8982320B2Alignment information display method and its program, alignment method, exposure method, device production process, display system, display device, and program and measurement/inspection systemOKITA SHINICHI·Filed 2005·Granted Mar 17, 2015·10 cites·30 claims
- 1083US8134681B2Adjustment method, substrate processing method, substrate processing apparatus, exposure apparatus, inspection apparatus, measurement and/or inspection system, processing apparatus, computer system, program and information recording mediumOKITA SHINICHI·Filed 2007·Granted Mar 13, 2012·6 cites·37 claims
- 1182US7688436B2Measuring and/or inspecting method, measuring and/or inspecting apparatus, exposure method, device manufacturing method, and device manufacturing apparatusNIKON CORP·Filed 2007·Granted Mar 30, 2010·6 cites·19 claims
- 1281US8159650B2Device manufacturing method, device manufacturing system, and measurement/inspection apparatusOKITA SHINICHI·Filed 2008·Granted Apr 17, 2012·8 cites·24 claims
- 1374US7855784B2Substrate processing method, substrate processing system, program, and recording mediumNIKON CORP·Filed 2008·Granted Dec 21, 2010·4 cites·69 claims
- 1469US8996422B2Substrate processing system, method of confirmation of its state of use, and method of prevention of illicit useSUZUKI HIROYUKI·Filed 2005·Granted Mar 31, 2015·3 cites·21 claims
- 1565US5479537AImage processing method and apparatusNIKON CORP·Filed 1992·Granted Dec 26, 1995·48 cites·18 claims
- 1651US2012133913A1Adjustment method, substrate processing method, substrate processing apparatus, exposure apparatus, inspection apparatus, measurement and/or inspection system, processing apparatus, computer system, program and information recording mediumOKITA SHINICHI·Filed 2012·Application pending·0 cites
- 1748US8355113B2Exposure apparatus, exposure method and device manufacturing methodNIKON CORP·Filed 2008·Granted Jan 15, 2013·0 cites·20 claims
- 1847US2009073407A1Exposure apparatus and exposure methodNIKON CORP·Filed 2008·Application pending·0 cites
- 1943US8090875B2Device and method for connecting device manufacturing processing apparatuses, program, device manufacturing processing system, exposure apparatus and method, and measurement and inspection apparatus and methodOKITA SHINICHI·Filed 2006·Granted Jan 3, 2012·0 cites·43 claims
- 2043US2007105244A1Analytical apparatus, processing apparatus, measuring and/or inspecting apparatus, exposure apparatus, substrate processing system, analytical method, and programNIKON CORP·Filed 2006·Application pending·0 cites
- 2143US2008013089A1Positioning method, processing system, measurement method of substrate loading repeatability, position measurement method, exposure method, substrate processing apparatus, measurement method, and measurement apparatusNIKON CORP·Filed 2006·Application pending·0 cites
- 2241US2006040191A1Detection method for optimum position detection formula, alignment method, exposure method, device production method, device, and measurement and/or inspection apparatusNIKON CORP·Filed 2005·Application pending·0 cites
- 2335US2002021433A1scanning exposure apparatusFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →