Inventor · disambiguated record
Shuhei Shigaki
Also filed as: SHIGAKI SHUHEI
22 granted patents·23 pending applications·9 citations·filing 2012–2024
90Inventor score
Files withNISSAN CHEMICAL CORP25NISSAN CHEMICAL IND LTD14SHIONOGI & CO3MEDIMMUNE LLC1NAKAJIMA MAKOTO1
Top patents by PatentIndex Score
45 records- 0176US10082735B2Silicon-containing resist underlayer film-forming composition having organic group having aliphatic polycyclic structureNISSAN CHEMICAL IND LTD·Filed 2015·Granted Sep 25, 2018·1 cites·11 claims
- 0275US2024385521A1Primer for semiconductor substrate and method for forming a patternNISSAN CHEMICAL CORP·Filed 2024·Application pending·0 cites
- 0373US11215927B2Substrate treating composition and method for fabricating a semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Jan 4, 2022·0 cites·9 claims
- 0472US9695462B2Method for evaluation of drug efficacy of a medicine having a therapeutic or preventive effect against a disease related to EL activity and a method for screening an inhibitor of EL activitySHIONOGI & CO·Filed 2013·Granted Jul 4, 2017·1 cites·2 claims
- 0570US9627217B2Silicon-containing EUV resist underlayer film-forming composition including additiveNISSAN CHEMICAL IND LTD·Filed 2013·Granted Apr 18, 2017·2 cites·14 claims
- 0670US2020109433A1Method for evaluation of drug efficacy of a medicine having a therapeutic or preventive effect against a disease related to el activity and a method for screening an inhibitor of el activitySHIONOGI & CO·Filed 2019·Application pending·0 cites
- 0768US9337052B2Silicon-containing EUV resist underlayer film forming compositionNISSAN CHEMICAL IND LTD·Filed 2012·Granted May 10, 2016·2 cites·13 claims
- 0866US10558119B2Composition for coating resist patternNISSAN CHEMICAL IND LTD·Filed 2016·Granted Feb 11, 2020·1 cites·15 claims
- 0965US2024295819A1Composition for forming silicon-containing resist underlayer filmNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 1063US10613440B2Silicon-containing EUV resist underlayer film-forming composition containing onium sulfonateNISSAN CHEMICAL IND LTD·Filed 2013·Granted Apr 7, 2020·1 cites·7 claims
- 1161US9093279B2Thin film forming composition for lithography containing titanium and siliconNAKAJIMA MAKOTO·Filed 2012·Granted Jul 28, 2015·1 cites·18 claims
- 1261US2017268034A1Method for evaluation of drug efficacy of a medicine having a therapeutic or preventive effect against a disease related to el activity and a method for screening an inhibitor of el activitySHIONOGI & CO·Filed 2017·Application pending·0 cites
- 1360US11459414B2Film forming composition containing fluorine-containing surfactantNISSAN CHEMICAL IND LTD·Filed 2020·Granted Oct 4, 2022·0 cites·9 claims
- 1457US2025348001A1Method for producing laminate and method for producing semiconductor elementNISSAN CHEMICAL CORP·Filed 2023·Application pending·0 cites
- 1555US2021124266A1Primer for semiconductor substrate and method for forming a patternNISSAN CHEMICAL CORP·Filed 2019·Application pending·0 cites
- 1654US2024419073A1Additive-containing silicon-containing resist underlayer film forming compositionNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 1754US2024377745A1Silicon-containing resist underlayer film-forming composition and silicon-containing resist underlayer filmNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 1854US2025110402A1Silicon-containing resist underlayer film-forming composition having unsaturated bond and cyclic structureNISSAN CHEMICAL CORP·Filed 2023·Application pending·0 cites
- 1953US2022177653A1Film-forming compositionNISSAN CHEMICAL CORP·Filed 2020·Application pending·0 cites
- 2052US12372875B2Composition for resist pattern metallization processNISSAN CHEMICAL CORP·Filed 2020·Granted Jul 29, 2025·0 cites·10 claims
- 2152US2023176481A1Film-forming compositionNISSAN CHEMICAL CORP·Filed 2021·Application pending·0 cites
- 2251US2024302744A1Composition for forming silicon-containing underlayer film for induced self-organizationNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 2351US2024201593A1Composition for forming silicon-containing resist underlayer filmNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 2451US2024295815A1Silicon-containing resist underlayer film-forming compositionNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 2551US2024231230A1Composition for forming silicon-containing resist underlayer filmNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 2650US9632414B2Coating liquid to be applied to resist pattern and method for forming reverse patternNISSAN CHEMICAL IND LTD·Filed 2014·Granted Apr 25, 2017·0 cites·11 claims
- 2750US2024162086A1Substrate with thin film, and semiconductor substrateNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 2848US12493243B2Film-forming compositionNISSAN CHEMICAL CORP·Filed 2021·Granted Dec 9, 2025·0 cites·17 claims
- 2948US10508174B2Silicon-containing coating agent for reversing planarization patternNISSAN CHEMICAL IND LTD·Filed 2016·Granted Dec 17, 2019·0 cites·19 claims
- 3048US2024069441A1Composition for resist underlying film formationNISSAN CHEMICAL CORP·Filed 2021·Application pending·0 cites
- 3148US2025044692A1Silicon-containing resist underlayer film forming compositionNISSAN CHEMICAL CORP·Filed 2021·Application pending·0 cites
- 3247US11531269B2Method for producing resist pattern coating composition with use of solvent replacement methodNISSAN CHEMICAL CORP·Filed 2017·Granted Dec 20, 2022·0 cites·12 claims
- 3346US2023152700A1Film-forming compositionNISSAN CHEMICAL CORP·Filed 2021·Application pending·0 cites
- 3445US11479627B2Film forming composition containing fluorine-containing surfactantNISSAN CHEMICAL IND LTD·Filed 2015·Granted Oct 25, 2022·0 cites·6 claims
- 3544US2022100092A1Film forming compositionNISSAN CHEMICAL CORP·Filed 2019·Application pending·0 cites
- 3642US9290623B2Composition for forming silicon-containing resist underlayer film having cyclic diester groupNISSAN CHEMICAL IND LTD·Filed 2013·Granted Mar 22, 2016·0 cites·15 claims
- 3742US2022187709A1Film-forming compositionNISSAN CHEMICAL CORP·Filed 2020·Application pending·0 cites
- 3841US9834745B2Cleaning fluid for semiconductor, and cleaning method using the sameNISSAN CHEMICAL IND LTD·Filed 2013·Granted Dec 5, 2017·0 cites·19 claims
- 3940US12084592B2Coating composition for pattern inversionNISSAN CHEMICAL CORP·Filed 2017·Granted Sep 10, 2024·0 cites·11 claims
- 4039US11609499B2Silicon-containing coating agent for pattern reversalNISSAN CHEMICAL CORP·Filed 2017·Granted Mar 21, 2023·0 cites·16 claims
- 4138US10910220B2Planarization method for a semiconductor substrate using a silicon-containing compositionNISSAN CHEMICAL CORP·Filed 2017·Granted Feb 2, 2021·0 cites·7 claims
- 4238US10025191B2Polymer-containing coating liquid applied to resist patternNISSAN CHEMICAL IND LTD·Filed 2015·Granted Jul 17, 2018·0 cites·13 claims
- 4336US2018197731A1Resist pattern coating composition including vinyl group- or (meth) acryloxy group-containing polysiloxaneNISSAN CHEMICAL IND LTD·Filed 2016·Application pending·0 cites
- 4436US2018306821A1Diagnostic marker for coronary artery diseaseMEDIMMUNE LLC·Filed 2016·Application pending·0 cites
- 4535US10133178B2Coating liquid for resist pattern coatingNISSAN CHEMICAL IND LTD·Filed 2015·Granted Nov 20, 2018·0 cites·14 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →