Inventor · disambiguated record
Shinji Tarutani
Also filed as: TARUTANI SHINJI
33 granted patents·12 pending applications·338 citations·filing 1995–2016
96Inventor score
Top patents by PatentIndex Score
45 records- 0198US8933144B2Curable composition for imprint, pattern-forming method and patternFUJIFILM CORP·Filed 2014·Granted Jan 13, 2015·50 cites·20 claims
- 0298US8017304B2Pattern forming method, and resist composition, developer and rinsing solution used in the pattern forming methodFUJIFILM CORP·Filed 2009·Granted Sep 13, 2011·79 cites·19 claims
- 0397US9897922B2Method of forming pattern and developer for use in the methodFUJIFILM CORP·Filed 2016·Granted Feb 20, 2018·10 cites·12 claims
- 0496US8034547B2Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming methodFUJIFILM CORP·Filed 2008·Granted Oct 11, 2011·70 cites·12 claims
- 0593US8241840B2Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming methodTSUBAKI HIDEAKI·Filed 2010·Granted Aug 14, 2012·50 cites·15 claims
- 0685US9482958B2Method of forming pattern and developer for use in the methodFUJIFILM CORP·Filed 2015·Granted Nov 1, 2016·2 cites·12 claims
- 0784US8999621B2Pattern forming method, chemical amplification resist composition and resist filmENOMOTO YUICHIRO·Filed 2010·Granted Apr 7, 2015·4 cites·58 claims
- 0884US8647812B2Pattern forming method, chemical amplification resist composition and resist filmFUJII KANA·Filed 2011·Granted Feb 11, 2014·5 cites·21 claims
- 0982US9663671B2Curable composition for imprints and method of storing the sameFUJIFILM CORP·Filed 2014·Granted May 30, 2017·3 cites·14 claims
- 1081US8088550B2Positive resist composition and pattern forming methodTARUTANI SHINJI·Filed 2008·Granted Jan 3, 2012·6 cites·19 claims
- 1179US9507263B2Underlay film composition for imprints and method of forming pattern and pattern formation method using the sameFUJIFILM CORP·Filed 2014·Granted Nov 29, 2016·5 cites·11 claims
- 1278US9097973B2Method of forming pattern and developer for use in the methodENOMOTO YUICHIRO·Filed 2011·Granted Aug 4, 2015·2 cites·8 claims
- 1376US7635553B2Pattern forming method and resist composition used thereforFUJIFILM CORP·Filed 2006·Granted Dec 22, 2009·4 cites·12 claims
- 1475US8709704B2Pattern forming method using developer containing organic solvent and rinsing solution for use in the pattern forming methodKAMIMURA SOU·Filed 2009·Granted Apr 29, 2014·4 cites·20 claims
- 1572US9709892B2Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the sameKATAOKA SHOHEI·Filed 2011·Granted Jul 18, 2017·2 cites·9 claims
- 1671US8911930B2Method of forming pattern using actinic-ray or radiation-sensitive resin composition, and patternENOMOTO YUICHIRO·Filed 2010·Granted Dec 16, 2014·2 cites·12 claims
- 1771US7338744B2Positive resist composition and pattern forming method using the sameFUJIFILM CORP·Filed 2006·Granted Mar 4, 2008·1 cites·7 claims
- 1870US5550801ALinear arrayed disc changer with shiftable guide projectionsPIONEER ELECTRONIC CORP·Filed 1995·Granted Aug 27, 1996·27 cites·4 claims
- 1967US7425404B2Chemical amplification resist composition and pattern-forming method using the sameFUJIFILM CORP·Filed 2005·Granted Sep 16, 2008·2 cites·8 claims
- 2065US8603733B2Pattern forming method, and resist composition, developer and rinsing solution used in the pattern forming methodTARUTANI SHINJI·Filed 2011·Granted Dec 10, 2013·1 cites·29 claims
- 2164US9551935B2Pattern forming method and resist compositionKATO KEITA·Filed 2011·Granted Jan 24, 2017·1 cites·34 claims
- 2251US7294450B2Chemical amplification-type resist composition and production process thereofFUJIFILM CORP·Filed 2006·Granted Nov 13, 2007·3 cites·16 claims
- 2349US8753802B2Pattern forming method, chemical amplification resist composition and resist filmFUJIFILM CORP·Filed 2012·Granted Jun 17, 2014·0 cites·16 claims
- 2449US2009280440A1Surface treating agent for resist-pattern, and pattern-forming method using sameFUJIFILM CORP·Filed 2009·Application pending·0 cites
- 2548US8877828B2Method for producing curable composition for imprintsENOMOTO YUICHIRO·Filed 2012·Granted Nov 4, 2014·0 cites·19 claims
- 2648US8871642B2Method of forming pattern and developer for use in the methodENOMOTO YUICHIRO·Filed 2011·Granted Oct 28, 2014·0 cites·29 claims
- 2748US8820541B2Method for producing curable composition for imprintsENOMOTO YUICHIRO·Filed 2011·Granted Sep 2, 2014·0 cites·10 claims
- 2848US2010028803A1Surface treating agent for resist pattern formation, resist composition, method of treating surface of resist pattern therewith and method of forming resist patternFUJIFILM CORP·Filed 2009·Application pending·0 cites
- 2948US2006246380A1Micropattern forming material and method for forming micropatternRENESAS TECH CORP·Filed 2006·Application pending·0 cites
- 3047US2009017400A1Pattern forming methodFUJIFILM CORP·Filed 2008·Application pending·0 cites
- 3147US2009011362A1Pattern forming methodFUJIFILM CORP·Filed 2008·Application pending·0 cites
- 3247US2009023096A1Positive resist composition and pattern forming methodFUJIFILM CORP·Filed 2008·Application pending·0 cites
- 3346US2013052431A1Curable composition for imprints, patterning method and patternENOMOTO YUICHIRO·Filed 2012·Application pending·0 cites
- 3444US9223219B2Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist filmENOMOTO YUICHIRO·Filed 2011·Granted Dec 29, 2015·0 cites·36 claims
- 3543US8808965B2Pattern forming method, pattern, chemical amplification resist composition and resist filmIWATO KAORU·Filed 2011·Granted Aug 19, 2014·0 cites·27 claims
- 3641US2004072096A1Micropattern forming material and fine structure forming methodRENESAS TECH CORP·Filed 2003·Application pending·0 cites
- 3739US9116437B2Pattern forming method, chemical amplification resist composition and resist filmENOMOTO YUICHIRO·Filed 2010·Granted Aug 25, 2015·0 cites·17 claims
- 3838US10126653B2Pattern forming method and resist compositionIWATO KAORU·Filed 2011·Granted Nov 13, 2018·0 cites·20 claims
- 3938US6755579B2Developer having substrate oscillating system and method of developing processRENESAS TECH CORP·Filed 2002·Granted Jun 29, 2004·0 cites·3 claims
- 4038US2004018646A1Resist pattern formation methodMITSUBISHI ELECTRIC CORP·Filed 2003·Application pending·0 cites
- 4137US2012322007A1Pattern forming method, chemical amplification resist composition and resist filmKATO KEITA·Filed 2011·Application pending·0 cites
- 4237US2004029047A1Micropattern forming material, micropattern forming method and method for manufacturing semiconductor deviceRENESAS TECH CORP·Filed 2003·Application pending·0 cites
- 4335US5615202AAutomatic disc changer for a disc reproducing systemPIONEER ELECTRONIC CORP·Filed 1995·Granted Mar 25, 1997·5 cites·6 claims
- 4435US2011311914A1Resist composition for negative-tone development and pattern forming method using the sameKAMIMURA SOU·Filed 2010·Application pending·0 cites
- 4534US8632938B2Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the compositionSUGIYAMA SHINICHI·Filed 2010·Granted Jan 21, 2014·0 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →