Inventor · disambiguated record
Shigeki Tozawa
Also filed as: TOZAWA SHIGEKI
13 granted patents·7 pending applications·589 citations·filing 1993–2014
93Inventor score
Top patents by PatentIndex Score
20 records- 0192US5779803APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1996·Granted Jul 14, 1998·83 cites·13 claims
- 0291US5423936APlasma etching systemHITACHI LTD·Filed 1993·Granted Jun 13, 1995·177 cites·5 claims
- 0387US5593540APlasma etching system and plasma etching methodHITACHI LTD·Filed 1995·Granted Jan 14, 1997·92 cites·13 claims
- 0485US6190495B1Magnetron plasma processing apparatusTOKYO ELECTRON LTD·Filed 1999·Granted Feb 20, 2001·81 cites·23 claims
- 0584US5445709AAnisotropic etching method and apparatusHITACHI LTD·Filed 1993·Granted Aug 29, 1995·84 cites·15 claims
- 0679US8991333B2Substrate processing method and systemTOZAWA SHIGEKI·Filed 2011·Granted Mar 31, 2015·5 cites·19 claims
- 0778US5578164APlasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 1994·Granted Nov 26, 1996·30 cites·10 claims
- 0867US5766498AAnisotropic etching method and apparatusHITACHI LTD·Filed 1996·Granted Jun 16, 1998·31 cites·23 claims
- 0965US8968475B2Substrate processing apparatusODAGIRI MASAYA·Filed 2012·Granted Mar 3, 2015·2 cites·7 claims
- 1052US7922865B2Magnetic field generator for magnetron plasma, and plasma etching apparatus and method comprising the magnetic field generatorSHINETSU CHEMICAL CO·Filed 2001·Granted Apr 12, 2011·4 cites·11 claims
- 1151US2009191340A1Substrate processing method and systemTOZAWA SHIGEKI·Filed 2008·Application pending·0 cites
- 1248US2009242129A1Thermal processing apparatus and processing systemTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 1347US2010163179A1Substrate Processing ApparatusTOZAWA SHIGEKI·Filed 2006·Application pending·0 cites
- 1445US2016247690A1Etching device, etching method, and substrate-mounting mechanismTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 1545US2012178263A1Substrate processing apparatusTOZAWA SHIGEKI·Filed 2012·Application pending·0 cites
- 1645US2011035957A1Gas processing apparatus, gas processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 1743US2010216296A1Processing Method and Recording MediumMURAKI YUSUKE·Filed 2006·Application pending·0 cites
- 1842US9105586B2Etching of silicon oxide filmTOZAWA SHIGEKI·Filed 2008·Granted Aug 11, 2015·0 cites·6 claims
- 1941US9466507B2Etching method, and recording mediumTOKYO ELECTRON LTD·Filed 2014·Granted Oct 11, 2016·0 cites·11 claims
- 2039US8956546B2Substrate processing method and substrate processing apparatusUGAJIN HAJIME·Filed 2011·Granted Feb 17, 2015·0 cites·18 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →