Inventor · disambiguated record
Shumin Wang
Also filed as: WANG SHUMIN
51 granted patents·9 pending applications·2,257 citations·filing 1996–2024
99Inventor score
Files withCABOT MICROELECTRONICS CORP35CABOT CORP4UNIV CHINA AGRICULTURAL4WANG SHUMIN4ANJI MICROELECTRONICS SHANGHAI2
Top patents by PatentIndex Score
60 records- 0197US9952297B2Parallel plate transmission line for broadband nuclear magnetic resonance imagingUNIV AUBURN·Filed 2015·Granted Apr 24, 2018·27 cites·18 claims
- 0297US6582623B1CMP composition containing silane modified abrasive particlesCABOT MICROELECTRONICS CORP·Filed 2000·Granted Jun 24, 2003·143 cites·21 claims
- 0397US6063306AChemical mechanical polishing slurry useful for copper/tantalum substrateCABOT CORP·Filed 1998·Granted May 16, 2000·372 cites·34 claims
- 0497US5783489AMulti-oxidizer slurry for chemical mechanical polishingCABOT CORP·Filed 1996·Granted Jul 21, 1998·263 cites·38 claims
- 0596US6217416B1Chemical mechanical polishing slurry useful for copper/tantalum substratesCABOT MICROELECTRONICS CORP·Filed 1998·Granted Apr 17, 2001·202 cites·11 claims
- 0693US6126853AChemical mechanical polishing slurry useful for copper substratesCABOT MICROELECTRONICS CORP·Filed 1997·Granted Oct 3, 2000·116 cites·20 claims
- 0792US6316366B1Method of polishing using multi-oxidizer slurryCABOT MICROELECTRONICS CORP·Filed 2000·Granted Nov 13, 2001·36 cites·7 claims
- 0892US6177026B1CMP slurry containing a solid catalystCABOT MICROELECTRONICS CORP·Filed 1998·Granted Jan 23, 2001·111 cites·21 claims
- 0991US6646348B1Silane containing polishing composition for CMPCABOT MICROELECTRONICS CORP·Filed 2000·Granted Nov 11, 2003·48 cites·26 claims
- 1091US6435947B2CMP polishing pad including a solid catalystCABOT MICROELECTRONICS CORP·Filed 2001·Granted Aug 20, 2002·55 cites·44 claims
- 1190US6976905B1Method for polishing a memory or rigid disk with a phosphate ion-containing polishing systemCABOT MICROELECTRONICS CORP·Filed 2000·Granted Dec 20, 2005·34 cites·23 claims
- 1290US6852632B2Method of polishing a multi-layer substrateCABOT MICROELECTRONICS CORP·Filed 2003·Granted Feb 8, 2005·33 cites·34 claims
- 1390US6447371B2Chemical mechanical polishing slurry useful for copper/tantalum substratesCABOT MICROELECTRONICS CORP·Filed 2001·Granted Sep 10, 2002·58 cites·25 claims
- 1490US6039891AMulti-oxidizer precursor for chemical mechanical polishingCABOT CORP·Filed 1997·Granted Mar 21, 2000·57 cites·2 claims
- 1589US6362104B1Method for polishing a substrate using a CMP slurryCABOT MICROELECTRONICS CORP·Filed 2000·Granted Mar 26, 2002·42 cites·11 claims
- 1686US7044836B2Coated metal oxide particles for CMPCABOT MICROELECTRONICS CORP·Filed 2003·Granted May 16, 2006·51 cites·44 claims
- 1786US6840971B2Chemical mechanical polishing systems and methods for their useCABOT MICROELECTRONICS CORP·Filed 2002·Granted Jan 11, 2005·30 cites·12 claims
- 1886US6468137B1Method for polishing a memory or rigid disk with an oxidized halide-containing polishing systemCABOT MICROELECTRONICS CORP·Filed 2000·Granted Oct 22, 2002·21 cites·20 claims
- 1986US6033596AMulti-oxidizer slurry for chemical mechanical polishingCABOT CORP·Filed 1997·Granted Mar 7, 2000·52 cites·3 claims
- 2085US6592776B1Polishing composition for metal CMPCABOT MICROELECTRONICS CORP·Filed 2000·Granted Jul 15, 2003·30 cites·20 claims
- 2185US6432828B2Chemical mechanical polishing slurry useful for copper substratesCABOT MICROELECTRONICS CORP·Filed 1998·Granted Aug 13, 2002·58 cites·19 claims
- 2285US6362106B1Chemical mechanical polishing method useful for copper substratesCABOT MICROELECTRONICS CORP·Filed 2000·Granted Mar 26, 2002·25 cites·12 claims
- 2384US12002546B2Methods of determining sensitivity to photoperiod in cannabisAURORA CANNABIS ENTPR INC·Filed 2022·Granted Jun 4, 2024·3 cites·9 claims
- 2484US8125225B2Transmit profile control in MRIKORETSKY ALAN P·Filed 2008·Granted Feb 28, 2012·11 cites·23 claims
- 2584US6855266B1Polishing system with stopping compound and method of its useCABOT MICROELECTRONICS CORP·Filed 2000·Granted Feb 15, 2005·26 cites·25 claims
- 2684US6569350B2Chemical mechanical polishing slurry useful for copper substratesCABOT MICROELECTRONICS CORP·Filed 2002·Granted May 27, 2003·23 cites·41 claims
- 2784US6541434B2Cleaning solution for semiconductor surfaces following chemical-mechanical polishingCABOT MICROELECTRONICS CORP·Filed 2002·Granted Apr 1, 2003·26 cites·16 claims
- 2884US6316365B1Chemical-mechanical polishing methodCABOT MICROELECTRONICS CORP·Filed 2000·Granted Nov 13, 2001·32 cites·24 claims
- 2983US6689692B1Composition for oxide CMPCABOT MICROELECTRONICS CORP·Filed 1997·Granted Feb 10, 2004·56 cites·29 claims
- 3081US6984588B2Compositions for oxide CMPCABOT MICROELECTRONICS CORP·Filed 2003·Granted Jan 10, 2006·21 cites·8 claims
- 3180US6867140B2Method of polishing a multi-layer substrateCABOT MICROELECTRONICS CORP·Filed 2003·Granted Mar 15, 2005·20 cites·21 claims
- 3279US6471884B1Method for polishing a memory or rigid disk with an amino acid-containing compositionCABOT MICROELECTRONICS CORP·Filed 2000·Granted Oct 29, 2002·22 cites·25 claims
- 3377US6395693B1Cleaning solution for semiconductor surfaces following chemical-mechanical polishingCABOT MICROELECTRONICS CORP·Filed 1999·Granted May 28, 2002·43 cites·16 claims
- 3476US6811474B2Polishing composition containing conducting polymerCABOT MICROELECTRONICS CORP·Filed 2002·Granted Nov 2, 2004·20 cites·21 claims
- 3574US6793559B2Composition and method for polishing rigid disksCABOT MICROELECTRONICS CORP·Filed 2002·Granted Sep 21, 2004·8 cites·9 claims
- 3673US6309560B1Chemical mechanical polishing slurry useful for copper substratesCABOT MICROELECTRONICS CORP·Filed 1997·Granted Oct 30, 2001·41 cites·19 claims
- 3770US7354530B2Chemical mechanical polishing systems and methods for their useWANG SHUMIN·Filed 2005·Granted Apr 8, 2008·3 cites·9 claims
- 3868US9890472B2Monolithic integrated lattice mismatched crystal template and preparation method thereofWANG SHUMIN·Filed 2012·Granted Feb 13, 2018·2 cites·9 claims
- 3966US12343321B1Method for ameliorating or avoiding the adverse effects of exogenous gonadotropins on reproductive performanceUNIV CHINA AGRICULTURAL·Filed 2024·Granted Jul 1, 2025·0 cites·6 claims
- 4066US6767476B2Polishing composition for metal CMPCABOT MICROELECTRONICS CORP·Filed 2003·Granted Jul 27, 2004·9 cites·21 claims
- 4166US2025332222A1Batch management method for improving farrowing rate or number of piglets born alive in swineUNIV CHINA AGRICULTURAL·Filed 2024·Application pending·0 cites
- 4265US7381648B2Chemical mechanical polishing slurry useful for copper substratesCABOT MICROELECTRONICS CORP·Filed 2003·Granted Jun 3, 2008·7 cites·18 claims
- 4360US12364671B1Methods of administering vitamin A and lactic acid to giltsUNIV CHINA AGRICULTURAL·Filed 2024·Granted Jul 22, 2025·0 cites·19 claims
- 4458US6347978B1Composition and method for polishing rigid disksCABOT MICROELECTRONICS CORP·Filed 1999·Granted Feb 19, 2002·10 cites·8 claims
- 4556US7021993B2Method of polishing a substrate with a polishing system containing conducting polymerCABOT MICROELECTRONICS CORP·Filed 2002·Granted Apr 4, 2006·5 cites·27 claims
- 4654US12190495B2Microscopic non-destructive measurement method of microstructure linewidth based on translation differenceUNIV NANJING SCI & TECH·Filed 2023·Granted Jan 7, 2025·0 cites·5 claims
- 4754US2015040477A1Aquaponic growth bucketWANG SHUMIN·Filed 2013·Application pending·0 cites
- 4852US6952100B1Phase controlled surface coil magnetic resonance imagingGE MED SYS GLOBAL TECH CO LLC·Filed 2004·Granted Oct 4, 2005·5 cites·20 claims
- 4948US9850571B2Method for preparing grapheneWANG SHUMIN·Filed 2012·Granted Dec 26, 2017·0 cites·8 claims
- 5047US9463220B2Method for inducing twin calvingUNIV CHINA AGRICULTURAL·Filed 2014·Granted Oct 11, 2016·0 cites·10 claims
Showing the top 50 of 60 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →