Inventor · disambiguated record
Simon Reinald Huisman
Also filed as: HUISMAN SIMON REINALD
27 granted patents·12 pending applications·67 citations·filing 2016–2024
94Inventor score
Top patents by PatentIndex Score
39 records- 0195US12025925B2Metrology method and lithographic apparatusesASML NETHERLANDS BV·Filed 2020·Granted Jul 2, 2024·6 cites·33 claims
- 0293US11360399B2Metrology sensor for position metrologyASML NETHERLANDS BV·Filed 2019·Granted Jun 14, 2022·10 cites·37 claims
- 0392US10682777B2Blade set and hair cutting applianceKONINKLIJKE PHILIPS NV·Filed 2016·Granted Jun 16, 2020·16 cites·18 claims
- 0490US12124177B2Overlay measurement system using lock-in amplifier techniqueASML HOLDING NV·Filed 2020·Granted Oct 22, 2024·2 cites·21 claims
- 0590US11906906B2Metrology method and associated metrology and lithographic apparatusesASML NETHERLANDS BV·Filed 2021·Granted Feb 20, 2024·2 cites·19 claims
- 0690US10690995B2Radiation sourceASML NETHERLANDS BV·Filed 2017·Granted Jun 23, 2020·6 cites·14 claims
- 0789US10788766B2Metrology sensor, lithographic apparatus and method for manufacturing devicesASML NETHERLANDS BV·Filed 2018·Granted Sep 29, 2020·4 cites·19 claims
- 0887US11175593B2Alignment sensor apparatus for process sensitivity compensationASML NETHERLANDS BV·Filed 2019·Granted Nov 16, 2021·4 cites·38 claims
- 0987US10788765B2Method and apparatus for measuring a structure on a substrateASML NETHERLANDS BV·Filed 2018·Granted Sep 29, 2020·4 cites·20 claims
- 1087US10585363B2Alignment systemASML NETHERLANDS BV·Filed 2016·Granted Mar 10, 2020·4 cites·15 claims
- 1186US10508906B2Method of measuring a parameter and apparatusASML NETHERLANDS BV·Filed 2018·Granted Dec 17, 2019·4 cites·11 claims
- 1280US10317808B2Position sensing arrangement and lithographic apparatus including such an arrangement, position sensing method and device manufacturing methodASML NETHERLANDS BV·Filed 2017·Granted Jun 11, 2019·3 cites·18 claims
- 1379US11042096B2Alignment measurement systemASML NETHERLANDS BV·Filed 2018·Granted Jun 22, 2021·2 cites·21 claims
- 1467US12282263B2Metrology system and lithographic systemASML NETHERLANDS BV·Filed 2021·Granted Apr 22, 2025·0 cites·15 claims
- 1565US2024241454A1Metrology method and system and lithographic systemASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 1664US12326669B2Illumination apparatus and associated metrology and lithographic apparatusesASML NETHERLANDS BV·Filed 2023·Granted Jun 10, 2025·0 cites·19 claims
- 1763US2025341479A1Metrology system using multiple radiation spotsASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 1862US11815675B2Metrology device and phase modulator apparatus therefor comprising a first moving grating and a first compensatory grating elementASML NETHERLANDS BV·Filed 2020·Granted Nov 14, 2023·0 cites·15 claims
- 1962US2025060684A1An optical system implemented in a system for fast optical inspection of targetsASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 2061US11762305B2Alignment methodASML NETHERLANDS BV·Filed 2020·Granted Sep 19, 2023·0 cites·15 claims
- 2160US2025147429A1Determining a measurement recipe in a metrology methodASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 2260US2025036031A1Target asymmetry measurement for substrate alignment in lithography systemsASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 2356US11300892B2Sensor apparatus and method for lithographic measurementsASML NETHERLANDS BV·Filed 2019·Granted Apr 12, 2022·0 cites·15 claims
- 2456US2025341787A1Configurable printed optical routing for parallel optical detectionASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 2556US2024353761A1Metrology system, lithographic apparatus, and methodASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 2655US11556068B2Detection system for an alignment sensorASML NETHERLANDS BV·Filed 2019·Granted Jan 17, 2023·0 cites·18 claims
- 2755US11474435B2Metrology sensor, illumination system and method of generating measurement illumination with a configurable illumination spot diameterASML NETHERLANDS BV·Filed 2019·Granted Oct 18, 2022·0 cites·18 claims
- 2855US2024027913A1Metrology system and coherence adjustersASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 2955US2024094643A1Metrology method and system and lithographic systemASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 3054US11409206B2Alignment method and apparatusASML NETHERLANDS BV·Filed 2019·Granted Aug 9, 2022·0 cites·13 claims
- 3154US11333985B2Position sensorASML NETHERLANDS BV·Filed 2019·Granted May 17, 2022·0 cites·22 claims
- 3253US11803130B2Phase modulators in alignment to decrease mark sizeASML NETHERLANDS BV·Filed 2020·Granted Oct 31, 2023·0 cites·20 claims
- 3353US11221565B2Level sensor and lithographic apparatusASML NETHERLANDS BV·Filed 2019·Granted Jan 11, 2022·0 cites·14 claims
- 3452US10942461B2Alignment measurement systemASML NETHERLANDS BV·Filed 2018·Granted Mar 9, 2021·0 cites·18 claims
- 3551US11181835B2Metrology sensor, lithographic apparatus and method for manufacturing devicesASML NETHERLANDS BV·Filed 2018·Granted Nov 23, 2021·0 cites·16 claims
- 3651US2022283515A1Metrology system and methodASML HOLDING NV·Filed 2020·Application pending·0 cites
- 3749US2023341785A1Lithographic apparatus, metrology systems, and methods thereofASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 3845US2022100109A1Apparatus for and method of simultaneously acquiring parallel alignment marksASML HOLDING NV·Filed 2019·Application pending·0 cites
- 3944US10527959B2Position sensor, lithographic apparatus and method for manufacturing devicesASML NETHERLANDS BV·Filed 2017·Granted Jan 7, 2020·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →