Inventor · disambiguated record
Si-Hyeung Lee
Also filed as: LEE SI-HYEUNG
20 granted patents·5 pending applications·210 citations·filing 1999–2014
94Inventor score
Top patents by PatentIndex Score
25 records- 0197US7221031B2Semiconductor device having sufficient process margin and method of forming sameSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted May 22, 2007·115 cites·15 claims
- 0282US6537727B2Resist composition comprising photosensitive polymer having loctone in its backboneSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Mar 25, 2003·16 cites·18 claims
- 0381US6472120B1Photosensitive polymer and chemically amplified photoresist composition containing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted Oct 29, 2002·16 cites·6 claims
- 0472US7381508B2Integrated circuit semiconductor device with overlay key and alignment key and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Jun 3, 2008·16 cites·13 claims
- 0569US8169012B2Semiconductor device and method of fabricating the semiconductor deviceBAE YONG-KUG·Filed 2008·Granted May 1, 2012·6 cites·14 claims
- 0667US9673195B2Semiconductor device having sufficient process margin and method of forming sameSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Jun 6, 2017·1 cites·9 claims
- 0767US8193047B2Semiconductor device having sufficient process margin and method of forming sameRYOO MAN-HYOUNG·Filed 2010·Granted Jun 5, 2012·2 cites·20 claims
- 0865US7259065B2Method of forming trench in semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Aug 21, 2007·2 cites·17 claims
- 0962US6642336B1Photosensitive polymerSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted Nov 4, 2003·6 cites·21 claims
- 1061US7457058B2Optical element holder and projection exposure apparatus having the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Nov 25, 2008·1 cites·17 claims
- 1156US6596459B1Photosensitive polymer and resist composition containing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted Jul 22, 2003·4 cites·16 claims
- 1253US8080886B2Integrated circuit semiconductor device with overlay key and alignment key and method of fabricating the sameKANG CHANG-JIN·Filed 2008·Granted Dec 20, 2011·1 cites·9 claims
- 1353US6613492B2Photosensitive polymer having phenyl ring and lactone group and resist composition comprising the sameSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Sep 2, 2003·3 cites·22 claims
- 1451US6284438B1Method for manufacturing a photoresist pattern defining a small opening and method for manufacturing semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 1999·Granted Sep 4, 2001·16 cites·21 claims
- 1551US2007190812A1Semiconductor device having sufficient process margin and method of forming sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 1648US6593441B2Photosensitive polymer and chemically amplified photoresist composition containing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Jul 15, 2003·1 cites·11 claims
- 1745US2011156159A1Semiconductor device having sufficient process margin and method of forming sameRYOO MAN-HYOUNG·Filed 2011·Application pending·0 cites
- 1844US7241552B2Resist composition comprising photosensitive polymer having lactone in its backboneSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Jul 10, 2007·0 cites·8 claims
- 1942US7045267B2Resist composition comprising photosensitive polymer having lactone in its backboneSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted May 16, 2006·0 cites·24 claims
- 2041US6893793B2Photosensitive polymer and chemically amplified photoresist composition containing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted May 17, 2005·0 cites·8 claims
- 2139US2006284259A1Semiconductor device and method of manufacturing the sameLEE JUNG-HYEON·Filed 2006·Application pending·0 cites
- 2238US7084227B2Photosensitive polymer and chemically amplified photoresist composition containing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Aug 1, 2006·0 cites·4 claims
- 2338US2004189971A1Wafer edge exposing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2004·Application pending·0 cites
- 2437US6287747B1Photosensitive polymer having cyclic backbone and resist composition comprising the sameSAMSUNG ELECTRONICS CO LTD·Filed 1999·Granted Sep 11, 2001·4 cites·19 claims
- 2537US2004009436A1Methods for forming resist pattern and fabricating semiconductor device using Si-containing water-soluble polymerSAMSUNG ELECTRONICS CO LTD·Filed 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →