Inventor · disambiguated record
Steven P. Caliendo
Also filed as: CALIENDO STEVEN · CALIENDO STEVEN P
12 granted patents·182 citations·filing 2000–2016
90Inventor score
Top patents by PatentIndex Score
12 records- 0193US6455414B1Method for improving the adhesion of sputtered copper films to CVD transition metal based underlayersTOKYO ELECTRON LTD·Filed 2000·Granted Sep 24, 2002·65 cites·26 claims
- 0288US7521089B2Method and apparatus for controlling the movement of CVD reaction byproduct gases to adjacent process chambersTOKYO ELECTRON LTD·Filed 2002·Granted Apr 21, 2009·48 cites·10 claims
- 0380US6626186B1Method for stabilizing the internal surface of a PECVD process chamberTOKYO ELECTRON LTD·Filed 2000·Granted Sep 30, 2003·19 cites·5 claims
- 0477US7564024B2Methods and apparatus for assigning a beam intensity profile to a gas cluster ion beam used to process workpiecesTEL EPION INC·Filed 2007·Granted Jul 21, 2009·11 cites·23 claims
- 0576US6482477B1Method for pretreating dielectric layers to enhance the adhesion of CVD metal layers theretoTOKYO ELECTRON LTD·Filed 2000·Granted Nov 19, 2002·20 cites·17 claims
- 0675US8293126B2Method and system for multi-pass correction of substrate defectsMACCRIMMON RUAIRIDH·Filed 2007·Granted Oct 23, 2012·6 cites·18 claims
- 0774US7917241B2Method and system for increasing throughput during location specific processing of a plurality of substratesTEL EPION INC·Filed 2007·Granted Mar 29, 2011·4 cites·20 claims
- 0867US9502209B2Multi-step location specific process for substrate edge profile correction for GCIB systemTEL EPION INC·Filed 2015·Granted Nov 22, 2016·1 cites·9 claims
- 0960US8298432B2Method and system for adjusting beam dimension for high-gradient location specific processingMACCRIMMON RUAIRIDH·Filed 2007·Granted Oct 30, 2012·1 cites·18 claims
- 1060US6562708B1Method for incorporating silicon into CVD metal filmsTOKYO ELECTRON LTD·Filed 2000·Granted May 13, 2003·7 cites·24 claims
- 1158US9105443B2Multi-step location specific process for substrate edge profile correction for GCIB systemTEL EPION INC·Filed 2014·Granted Aug 11, 2015·0 cites·11 claims
- 1239US10256095B2Method for high throughput using beam scan size and beam position in gas cluster ion beam processing systemTEL EPION INC·Filed 2016·Granted Apr 9, 2019·0 cites·11 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →