Inventor · disambiguated record
Stefan Eyring
Also filed as: EYRING STEFAN
15 granted patents·3 pending applications·44 citations·filing 2014–2025
89Inventor score
Top patents by PatentIndex Score
18 records- 0194US11209737B1Performance optimized scanning sequence for eBeam metrology and inspectionKLA CORP·Filed 2020·Granted Dec 28, 2021·5 cites·24 claims
- 0294US10473460B2Overlay measurements of overlapping target structures based on symmetry of scanning electron beam signalsKLA TENCOR CORP·Filed 2018·Granted Nov 12, 2019·20 cites·35 claims
- 0392US11862524B2Overlay mark design for electron beam overlayKLA CORP·Filed 2021·Granted Jan 2, 2024·2 cites·20 claims
- 0490US10474040B2Systems and methods for device-correlated overlay metrologyKLA TENCOR CORP·Filed 2018·Granted Nov 12, 2019·4 cites·36 claims
- 0590US9704238B2Method for correcting position measurements for optical errors and method for determining mask writer errorsKLA TENCOR CORP·Filed 2015·Granted Jul 11, 2017·5 cites·25 claims
- 0680US12055859B2Overlay mark design for electron beam overlayKLA CORP·Filed 2023·Granted Aug 6, 2024·0 cites·15 claims
- 0780US10185800B2Apparatus and method for the measurement of pattern placement and size of pattern and computer program thereforKLA TENCOR CORP·Filed 2016·Granted Jan 22, 2019·3 cites·19 claims
- 0880US9201312B2Method for correcting position measurements for optical errors and method for determining mask writer errorsKLA TENCOR CORP·Filed 2014·Granted Dec 1, 2015·3 cites·26 claims
- 0978US11508551B2Detection and correction of system responses in real-timeKLA CORP·Filed 2019·Granted Nov 22, 2022·2 cites·20 claims
- 1070US11894214B2Detection and correction of system responses in real-timeKLA CORP·Filed 2022·Granted Feb 6, 2024·0 cites·20 claims
- 1170US11703767B2Overlay mark design for electron beam overlayKLA CORP·Filed 2021·Granted Jul 18, 2023·0 cites·10 claims
- 1266US2025271776A1Image modeling-assisted metrologyKLA CORP·Filed 2025·Application pending·0 cites
- 1363US12085385B2Design-assisted large field of view metrologyKLA CORP·Filed 2021·Granted Sep 10, 2024·0 cites·41 claims
- 1456US11720031B2Overlay design for electron beam and scatterometry overlay measurementsKLA CORP·Filed 2021·Granted Aug 8, 2023·0 cites·12 claims
- 1554US2023326710A1Screening edge placement uniformity wafer stochasticsKLA CORP·Filed 2022·Application pending·0 cites
- 1653US12444628B2Image modeling-assisted contour extractionKLA CORP·Filed 2022·Granted Oct 14, 2025·0 cites·14 claims
- 1753US11481922B2Online navigational drift correction for metrology measurementsKLA CORP·Filed 2020·Granted Oct 25, 2022·0 cites·20 claims
- 1850US2024093985A1System and method for acquiring alignment measurements of structures of a bonded sampleKLA CORP·Filed 2022·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →