Inventor · disambiguated record
Steven Lane
Also filed as: LANE STEVEN
27 granted patents·13 pending applications·158 citations·filing 2009–2023
95Inventor score
Top patents by PatentIndex Score
40 records- 0198US11651966B2Methods and apparatus for processing a substrateAPPLIED MATERIALS INC·Filed 2021·Granted May 16, 2023·6 cites·9 claims
- 0297US10957518B2Chamber with individually controllable plasma generation regions for a reactor for processing a workpieceAPPLIED MATERIALS INC·Filed 2020·Granted Mar 23, 2021·4 cites·13 claims
- 0397US10707086B2Etching methodsAPPLIED MATERIALS INC·Filed 2019·Granted Jul 7, 2020·40 cites·20 claims
- 0496US10544505B2Deposition or treatment of diamond-like carbon in a plasma reactorAPPLIED MATERIALS INC·Filed 2017·Granted Jan 28, 2020·12 cites·15 claims
- 0596US10249495B2Diamond like carbon layer formed by an electron beam plasma processAPPLIED MATERIALS INC·Filed 2016·Granted Apr 2, 2019·17 cites·16 claims
- 0696US8734664B2Method of differential counter electrode tuning in an RF plasma reactorAPPLIED MATERIALS INC·Filed 2013·Granted May 27, 2014·28 cites·19 claims
- 0789US9613783B2Method and apparatus for controlling a magnetic field in a plasma chamberAPPLIED MATERIALS INC·Filed 2014·Granted Apr 4, 2017·7 cites·20 claims
- 0888US10115566B2Method and apparatus for controlling a magnetic field in a plasma chamberAPPLIED MATERIALS INC·Filed 2017·Granted Oct 30, 2018·4 cites·12 claims
- 0986US11043375B2Plasma deposition of carbon hardmaskAPPLIED MATERIALS INC·Filed 2018·Granted Jun 22, 2021·4 cites·19 claims
- 1085US10017857B2Method and apparatus for controlling plasma near the edge of a substrateAPPLIED MATERIALS INC·Filed 2016·Granted Jul 10, 2018·4 cites·19 claims
- 1185US9564297B2Electron beam plasma source with remote radical sourceAPPLIED MATERIALS INC·Filed 2014·Granted Feb 7, 2017·6 cites·20 claims
- 1285US9443700B2Electron beam plasma source with segmented suppression electrode for uniform plasma generationAPPLIED MATERIALS INC·Filed 2014·Granted Sep 13, 2016·6 cites·14 claims
- 1384US11043387B2Methods and apparatus for processing a substrateAPPLIED MATERIALS INC·Filed 2019·Granted Jun 22, 2021·2 cites·11 claims
- 1484US9111722B2Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generatorAPPLIED MATERIALS INC·Filed 2013·Granted Aug 18, 2015·6 cites·20 claims
- 1583US9449794B2Symmetrical inductively coupled plasma source with side RF feeds and spiral coil antennaAPPLIED MATERIALS INC·Filed 2014·Granted Sep 20, 2016·5 cites·15 claims
- 1680US9082591B2Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generatorAPPLIED MATERIALS INC·Filed 2013·Granted Jul 14, 2015·4 cites·20 claims
- 1779US10153139B2Multiple electrode substrate support assembly and phase control systemAPPLIED MATERIALS INC·Filed 2015·Granted Dec 11, 2018·2 cites·19 claims
- 1869US2023162996A1Etching apparatusAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1967US10784085B2Plasma processing reactor with a magnetic electron-blocking filter external of the chamber and uniform field within the chamberAPPLIED MATERIALS INC·Filed 2015·Granted Sep 22, 2020·1 cites·14 claims
- 2066US2021296131A1Methods and apparatus for processing a substrateAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 2158US10395904B2Method of real time in-situ chamber condition monitoring using sensors and RF communicationAPPLIED MATERIALS INC·Filed 2018·Granted Aug 27, 2019·0 cites·15 claims
- 2258US9472379B2Method of multiple zone symmetric gas injection for inductively coupled plasmaAPPLIED MATERIALS INC·Filed 2014·Granted Oct 18, 2016·0 cites·20 claims
- 2358US2018366306A1Multiple electrode substrate support assembly and phase control systemAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 2457US10141166B2Method of real time in-situ chamber condition monitoring using sensors and RF communicationAPPLIED MATERIALS INC·Filed 2014·Granted Nov 27, 2018·0 cites·13 claims
- 2555US2019393053A1Etching apparatusAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 2655US2019228970A1Diamond like carbon layer formed by an electron beam plasma processAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 2752US10790153B2Methods and apparatus for electron beam etching processAPPLIED MATERIALS INC·Filed 2019·Granted Sep 29, 2020·0 cites·15 claims
- 2852US9412563B2Spatially discrete multi-loop RF-driven plasma source having plural independent zonesAPPLIED MATERIALS INC·Filed 2013·Granted Aug 9, 2016·0 cites·20 claims
- 2951US2017092470A1Plasma reactor for processing a workpiece with an array of plasma point sourcesAPPLIED MATERIALS INC·Filed 2015·Application pending·0 cites
- 3050US9659751B2System and method for selective coil excitation in inductively coupled plasma processing reactorsAPPLIED MATERIALS INC·Filed 2014·Granted May 23, 2017·0 cites·19 claims
- 3148US10170278B2Inductively coupled plasma sourceAPPLIED MATERIALS INC·Filed 2013·Granted Jan 1, 2019·0 cites·14 claims
- 3246US10249479B2Magnet configurations for radial uniformity tuning of ICP plasmasAPPLIED MATERIALS INC·Filed 2015·Granted Apr 2, 2019·0 cites·17 claims
- 3346US2014202634A1Radial transmission line based plasma sourceAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
- 3445US9721760B2Electron beam plasma source with reduced metal contaminationAPPLIED MATERIALS INC·Filed 2013·Granted Aug 1, 2017·0 cites·7 claims
- 3545US2015075717A1Inductively coupled spatially discrete multi-loop rf-driven plasma sourceAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 3643US2014069584A1Differential counter electrode tuning in a plasma reactor with an rf-driven ceiling electrodeAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 3743US2014034239A1Differential counter electrode tuning in a plasma reactor with an rf-driven workpiece support electrodeAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 3841US2009257927A1Folded coaxial resonatorsAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 3939US2018277340A1Plasma reactor with electron beam of secondary electronsYANG YANG·Filed 2018·Application pending·0 cites
- 4039US2013292057A1Capacitively coupled plasma source with rf coupled grounded electrodeAPPLIED MATERIALS INC·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →