Inventor · disambiguated record
Stephan Muellender
Also filed as: MUELLENDER STEPHAN · WEISS MARKUS
16 granted patents·2 pending applications·48 citations·filing 2004–2016
90Inventor score
Top patents by PatentIndex Score
18 records- 0190US8382301B2Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contaminationZEISS CARL SMT GMBH·Filed 2009·Granted Feb 26, 2013·18 cites·34 claims
- 0288US9304405B2Microlithography illumination system and microlithography illumination optical unitFIOLKA DAMIAN·Filed 2010·Granted Apr 5, 2016·5 cites·13 claims
- 0387US8585224B2Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contaminationZEISS CARL SMT GMBH·Filed 2013·Granted Nov 19, 2013·11 cites·34 claims
- 0475US9341958B2Deflection mirror and projection exposure apparatus for microlithography comprising such a deflection mirrorZEISS CARL SMT GMBH·Filed 2013·Granted May 17, 2016·2 cites·20 claims
- 0574US9720329B2Projection objective of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Aug 1, 2017·1 cites·19 claims
- 0673US9778576B2Microlithography illumination system and microlithography illumination optical unitZEISS CARL SMT GMBH·Filed 2016·Granted Oct 3, 2017·1 cites·20 claims
- 0770US9996005B2Reflective optical element and optical system for EUV lithographyZEISS CARL SMT GMBH·Filed 2013·Granted Jun 12, 2018·3 cites·17 claims
- 0870US8605255B2Imaging optical system and projection exposure system including the sameMANN HANS-JUERGEN·Filed 2010·Granted Dec 10, 2013·2 cites·25 claims
- 0970US8164077B2Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical elementWEDOWSKI MARCO·Filed 2009·Granted Apr 24, 2012·3 cites·33 claims
- 1063US7763870B2Optical system for radiation in the EUV-wavelength range and method for measuring a contamination status of EUV-reflective elementsZEISS CARL SMT AG·Filed 2007·Granted Jul 27, 2010·1 cites·18 claims
- 1153US2013242278A1Projection objective of a microlithographic projection exposure apparatus designed for EUV and a method of optically adjusting a projection objectiveZEISS CARL SMT GMBH·Filed 2013·Application pending·0 cites
- 1251US9285515B2Imaging optical system and projection exposure system including the sameZEISS CARL SMT GMBH·Filed 2013·Granted Mar 15, 2016·0 cites·29 claims
- 1347US8944615B2Projection objective and method for its manufactureMANN HANS-JUERGEN·Filed 2010·Granted Feb 3, 2015·0 cites·23 claims
- 1447US7429116B2Projection objective and method for its manufactureZEISS CARL SMT AG·Filed 2004·Granted Sep 30, 2008·1 cites·11 claims
- 1542US9606446B2Reflective optical element for EUV lithography and method of manufacturing a reflective optical elementZEISS CARL SMT GMBH·Filed 2015·Granted Mar 28, 2017·0 cites·18 claims
- 1637US9494718B2Mirror for the EUV wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objectiveMUELLENDER STEPHAN·Filed 2012·Granted Nov 15, 2016·0 cites·27 claims
- 1737US2009015951A1Projection objective and method for its manufactureZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 1834US8457281B2Method for producing a multilayer coating, optical element and optical arrangementENKISCH HARTMUT·Filed 2010·Granted Jun 4, 2013·0 cites·16 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →