Inventor · disambiguated record
Stilian Ivanov Pandev
Also filed as: PANDEV STILIAN · PANDEV STILIAN IVANOV
63 granted patents·8 pending applications·406 citations·filing 2011–2025
98Inventor score
Top patents by PatentIndex Score
71 records- 0198US11520321B2Measurement recipe optimization based on probabilistic domain knowledge and physical realizationKLA CORP·Filed 2020·Granted Dec 6, 2022·9 cites·20 claims
- 0298US9518916B1Compressive sensing for metrologyKLA TENCOR CORP·Filed 2014·Granted Dec 13, 2016·38 cites·29 claims
- 0397US10101676B2Spectroscopic beam profile overlay metrologyKLA TENCOR CORP·Filed 2016·Granted Oct 16, 2018·15 cites·20 claims
- 0497US10072921B2Methods and systems for spectroscopic beam profile metrology having a first two dimensional detector to detect collected light transmitted by a first wavelength dispersive elementKLA TENCOR CORP·Filed 2015·Granted Sep 11, 2018·17 cites·19 claims
- 0597US9784690B2Apparatus, techniques, and target designs for measuring semiconductor parametersKLA TENCOR CORP·Filed 2015·Granted Oct 10, 2017·14 cites·20 claims
- 0696US10365225B1Multi-location metrologyKLA TENCOR CORP·Filed 2016·Granted Jul 30, 2019·20 cites·19 claims
- 0795US10101670B2Statistical model-based metrologyKLA TENCOR CORP·Filed 2014·Granted Oct 16, 2018·34 cites·19 claims
- 0895US9816810B2Measurement of multiple patterning parametersKLA TENCOR CORP·Filed 2016·Granted Nov 14, 2017·11 cites·14 claims
- 0994US10490462B2Metrology systems and methods for process controlKLA TENCOR CORP·Filed 2017·Granted Nov 26, 2019·10 cites·25 claims
- 1094US10345095B1Model based measurement systems with improved electromagnetic solver performanceKLA TENCOR CORP·Filed 2015·Granted Jul 9, 2019·11 cites·20 claims
- 1194US10152678B2System, method and computer program product for combining raw data from multiple metrology toolsKLA TENCOR CORP·Filed 2015·Granted Dec 11, 2018·21 cites·21 claims
- 1294US9490182B2Measurement of multiple patterning parametersKLA TENCOR CORP·Filed 2014·Granted Nov 8, 2016·12 cites·19 claims
- 1393US11604420B2Self-calibrating overlay metrologyKLA CORP·Filed 2021·Granted Mar 14, 2023·2 cites·44 claims
- 1493US10769320B2Integrated use of model-based metrology and a process modelKLA TENCOR CORP·Filed 2013·Granted Sep 8, 2020·23 cites·30 claims
- 1593US10352876B2Signal response metrology for scatterometry based overlay measurementsKLA—TENCOR CORP·Filed 2015·Granted Jul 16, 2019·7 cites·20 claims
- 1693US8843875B2Measurement model optimization based on parameter variations across a waferKLA TENCOR CORP·Filed 2013·Granted Sep 23, 2014·13 cites·20 claims
- 1792US10210606B2Signal response metrology for image based and scatterometry overlay measurementsKLA TENCOR CORP·Filed 2015·Granted Feb 19, 2019·11 cites·18 claims
- 1892US9383661B2Methods and apparatus for determining focusKLA TENCOR CORP·Filed 2014·Granted Jul 5, 2016·7 cites·12 claims
- 1990US12181271B2Estimating in-die overlay with tool induced shift correctionKLA CORP·Filed 2022·Granted Dec 31, 2024·2 cites·22 claims
- 2090US10801953B2Semiconductor metrology based on hyperspectral imagingKLA TENCOR CORP·Filed 2019·Granted Oct 13, 2020·7 cites·23 claims
- 2190US10107765B2Apparatus, techniques, and target designs for measuring semiconductor parametersKLA TENCOR CORP·Filed 2017·Granted Oct 23, 2018·3 cites·40 claims
- 2289US10943838B2Measurement of overlay error using device inspection systemKLA TENCOR CORP·Filed 2018·Granted Mar 9, 2021·6 cites·20 claims
- 2389US10935893B2Differential methods and apparatus for metrology of semiconductor targetsKLA TENCOR CORP·Filed 2014·Granted Mar 2, 2021·9 cites·22 claims
- 2489US10612916B2Measurement of multiple patterning parametersKLA TENCOR CORP·Filed 2017·Granted Apr 7, 2020·4 cites·5 claims
- 2589US10502694B2Methods and apparatus for patterned wafer characterizationKLA TENCOR CORP·Filed 2014·Granted Dec 10, 2019·7 cites·27 claims
- 2689US10151986B2Signal response metrology based on measurements of proxy structuresKLA TENCOR CORP·Filed 2015·Granted Dec 11, 2018·6 cites·22 claims
- 2789US9934353B2Focus measurements using scatterometry metrologyKLA TENCOR CORP·Filed 2015·Granted Apr 3, 2018·5 cites·22 claims
- 2889US9710728B2Image based signal response metrologyKLA TENCOR CORP·Filed 2015·Granted Jul 18, 2017·10 cites·20 claims
- 2988US10380728B2Model-based metrology using imagesKLA TENCOR CORP·Filed 2016·Granted Aug 13, 2019·5 cites·19 claims
- 3088US10101674B2Methods and apparatus for determining focusKLA TENCOR CORP·Filed 2016·Granted Oct 16, 2018·3 cites·21 claims
- 3187US11313809B1Process control metrologyKLA TENCOR CORP·Filed 2017·Granted Apr 26, 2022·5 cites·19 claims
- 3287US10295342B2System, method and computer program product for calibration of metrology toolsKLA TENCOR CORP·Filed 2016·Granted May 21, 2019·5 cites·12 claims
- 3386US11378451B2Bandgap measurements of patterned film stacks using spectroscopic metrologyKLA TENCOR CORP·Filed 2017·Granted Jul 5, 2022·3 cites·44 claims
- 3486US10139352B2Measurement of small box size targetsKLA TENCOR CORP·Filed 2015·Granted Nov 27, 2018·3 cites·20 claims
- 3586US9875946B2On-device metrologyKLA TENCOR CORP·Filed 2014·Granted Jan 23, 2018·8 cites·16 claims
- 3685US11530913B2Methods and systems for determining quality of semiconductor measurementsKLA CORP·Filed 2020·Granted Dec 20, 2022·2 cites·20 claims
- 3784US10502549B2Model-based single parameter measurementKLA TENCOR CORP·Filed 2016·Granted Dec 10, 2019·4 cites·19 claims
- 3884US10386729B2Dynamic removal of correlation of highly correlated parameters for optical metrologyKLA TENCOR CORP·Filed 2014·Granted Aug 20, 2019·4 cites·22 claims
- 3983US11415898B2Signal-domain adaptation for metrologyKLA CORP·Filed 2019·Granted Aug 16, 2022·3 cites·25 claims
- 4083US9255877B2Metrology system optimization for parameter trackingKLA TENCOR CORP·Filed 2014·Granted Feb 9, 2016·6 cites·20 claims
- 4181US11604063B2Self-calibrated overlay metrology using a skew training sampleKLA CORP·Filed 2021·Granted Mar 14, 2023·1 cites·26 claims
- 4280US11610297B2Tomography based semiconductor measurements using simplified modelsKLA CORP·Filed 2020·Granted Mar 21, 2023·1 cites·24 claims
- 4378US10216096B2Process-sensitive metrology systems and methodsKLA TENCOR CORP·Filed 2016·Granted Feb 26, 2019·2 cites·19 claims
- 4476US11880142B2Self-calibrating overlay metrologyKLA CORP·Filed 2023·Granted Jan 23, 2024·0 cites·34 claims
- 4574US10732516B2Process robust overlay metrology based on optical scatterometryKLA TENCOR CORP·Filed 2018·Granted Aug 4, 2020·2 cites·32 claims
- 4674US10354929B2Measurement recipe optimization based on spectral sensitivity and process variationKLA TENCOR CORP·Filed 2013·Granted Jul 16, 2019·3 cites·20 claims
- 4774US10215559B2Metrology of multiple patterning processesKLA TENCOR CORP·Filed 2015·Granted Feb 26, 2019·2 cites·20 claims
- 4874US10030965B2Model-based hot spot monitoringKLA TENCOR CORP·Filed 2016·Granted Jul 24, 2018·2 cites·20 claims
- 4973US9721055B2Measurement model optimization based on parameter variations across a waferKLA TENCOR CORP·Filed 2014·Granted Aug 1, 2017·2 cites·20 claims
- 5071US11796390B2Bandgap measurements of patterned film stacks using spectroscopic metrologyKLA CORP·Filed 2022·Granted Oct 24, 2023·0 cites·14 claims
Showing the top 50 of 71 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Stilian Ivanov Pandev files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →