Inventor · disambiguated record
Stephen Roux
Also filed as: ROUX STEPHEN · ROUX STEPHEN S
46 granted patents·8 pending applications·703 citations·filing 1996–2024
98Inventor score
Top patents by PatentIndex Score
54 records- 0196US6332569B1Etched glass solder bump transfer for flip chip integrated circuit devicesIBM·Filed 2000·Granted Dec 25, 2001·97 cites·12 claims
- 0294US10558129B2Mask assemblyASML NETHERLANDS BV·Filed 2015·Granted Feb 11, 2020·7 cites·44 claims
- 0392US5775569AMethod for building interconnect structures by injection molded solder and structures builtIBM·Filed 1996·Granted Jul 7, 1998·120 cites·16 claims
- 0491US6105852AEtched glass solder bump transfer for flip chip integrated circuit devicesIBM·Filed 1998·Granted Aug 22, 2000·73 cites·7 claims
- 0589US6778258B2Wafer handling system for use in lithography patterningASML HOLDING NV·Filed 2001·Granted Aug 17, 2004·35 cites·28 claims
- 0687US7135693B2Method and apparatus for recycling gases used in a lithography toolASML HOLDING NV·Filed 2005·Granted Nov 14, 2006·12 cites·20 claims
- 0787US6906789B2Magnetically levitated and driven reticle-masking blade stage mechanism having six degrees freedom of motionASML HOLDING NV·Filed 2003·Granted Jun 14, 2005·24 cites·61 claims
- 0887US6239863B1Removable cover for protecting a reticle, system including and method of using the sameSILICON VALLEY GROUP·Filed 1999·Granted May 29, 2001·103 cites·38 claims
- 0986US11500298B2Reticle sub-field thermal controlASML HOLDING NV·Filed 2019·Granted Nov 15, 2022·4 cites·20 claims
- 1085US6149122AMethod for building interconnect structures by injection molded solder and structures builtIBM·Filed 1998·Granted Nov 21, 2000·61 cites·5 claims
- 1184US12298257B2Monolithic particle inspection deviceASML NETHERLANDS BV·Filed 2021·Granted May 13, 2025·1 cites·13 claims
- 1283US7359037B2Drive for reticle-masking blade stageASML HODING N V·Filed 2005·Granted Apr 15, 2008·8 cites·14 claims
- 1382US11994808B2Lithographic apparatus, metrology systems, phased array illumination sources and methods thereofASML HOLDING NV·Filed 2020·Granted May 28, 2024·1 cites·24 claims
- 1482US7372548B2Levitated reticle-masking blade stageASML HOLDING NV·Filed 2005·Granted May 13, 2008·5 cites·19 claims
- 1580US12066762B2On chip sensor for wafer overlay measurementASML HOLDING NV·Filed 2020·Granted Aug 20, 2024·1 cites·20 claims
- 1678US6133633AMethod for building interconnect structures by injection molded solder and structures builtIBM·Filed 1998·Granted Oct 17, 2000·40 cites·4 claims
- 1776US6770895B2Method and apparatus for isolating light source gas from main chamber gas in a lithography toolASML HOLDING NV·Filed 2002·Granted Aug 3, 2004·14 cites·26 claims
- 1876US2024361703A1On chip sensor for wafer overlay measurementASML HOLDING NV·Filed 2024·Application pending·0 cites
- 1975US11415893B2Assembly for use in semiconductor photolithography and method of manufacturing sameASML HOLDING NV·Filed 2018·Granted Aug 16, 2022·1 cites·20 claims
- 2075US6919573B2Method and apparatus for recycling gases used in a lithography toolASML HOLDING NV·Filed 2003·Granted Jul 19, 2005·11 cites·24 claims
- 2172US9740112B2Patterning device support and lithographic apparatusASML HOLDING NV·Filed 2013·Granted Aug 22, 2017·2 cites·27 claims
- 2271US7751130B2Optical element damping systemsASML HOLDING NV·Filed 2006·Granted Jul 6, 2010·5 cites·25 claims
- 2370US8553205B2Method for controlling the position of a movable object, a control system for controlling a positioning device, and a lithographic apparatusROUX STEPHEN·Filed 2010·Granted Oct 8, 2013·5 cites·17 claims
- 2469US7692766B2Lithographic apparatusASML HOLDING NV·Filed 2007·Granted Apr 6, 2010·2 cites·35 claims
- 2569US6934005B2Reticle focus measurement method using multiple interferometric beamsASML HOLDING NV·Filed 2002·Granted Aug 23, 2005·9 cites·19 claims
- 2668US11009803B2Mask assemblyASML NETHERLANDS BV·Filed 2019·Granted May 18, 2021·0 cites·18 claims
- 2767US12287591B2Lithographic apparatus, metrology systems, and methods thereofASML NETHERLANDS BV·Filed 2021·Granted Apr 29, 2025·0 cites·20 claims
- 2866US7105836B2Method and apparatus for cooling a reticle during lithographic exposureASML HOLDING NV·Filed 2002·Granted Sep 12, 2006·10 cites·8 claims
- 2965US7136214B2Active faceted mirror system for lithographyASML HOLDING NV·Filed 2004·Granted Nov 14, 2006·8 cites·21 claims
- 3065US6984474B2Reticle barrier system for extreme ultra-violet lithographyASML HOLDING NV·Filed 2003·Granted Jan 10, 2006·8 cites·13 claims
- 3164US2025296128A1Method and apparatus for particle removalASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 3263US7853067B2Systems and methods for lithographic reticle inspectionASML HOLDING NV·Filed 2006·Granted Dec 14, 2010·1 cites·19 claims
- 3363US7119883B2Correcting variations in the intensity of light within an illumination field without distorting the telecentricity of the lightASML HOLDING NV·Filed 2004·Granted Oct 10, 2006·6 cites·43 claims
- 3463US6894293B2System for recycling gases used in a lithography toolASML HOLDING NV·Filed 2004·Granted May 17, 2005·6 cites·16 claims
- 3562US12135505B2Spectrometric metrology systems based on multimode interference and lithographic apparatusASML HOLDING NV·Filed 2021·Granted Nov 5, 2024·0 cites·20 claims
- 3662US7474384B2Lithographic apparatus, device manufacturing method, and a projection element for use in the lithographic apparatusASML HOLDING NV·Filed 2004·Granted Jan 6, 2009·6 cites·25 claims
- 3762US6927842B2Wafer handling method for use in lithography patterningASML HOLDING NV·Filed 2004·Granted Aug 9, 2005·5 cites·14 claims
- 3862US2025060684A1An optical system implemented in a system for fast optical inspection of targetsASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 3961US12216414B2Self-referencing integrated alignment sensorASML HOLDING NV·Filed 2021·Granted Feb 4, 2025·0 cites·20 claims
- 4061US12140872B2Optical designs of miniaturized overlay measurement systemASML HOLDING NV·Filed 2021·Granted Nov 12, 2024·0 cites·15 claims
- 4160US12399000B2Systems and methods for measuring intensity in a lithographic alignment apparatusASML HOLDING NV·Filed 2022·Granted Aug 26, 2025·0 cites·20 claims
- 4259US2021027320A1Method and system for generating return forecasts and portfolio constructionSCHWENKLER GUSTAVO·Filed 2020·Application pending·0 cites
- 4358US7136151B2Reticle gripper barrier system for lithography useASML HOLDING NV·Filed 2004·Granted Nov 14, 2006·5 cites·19 claims
- 4458US2024319617A1Metrology systems with phased arrays for contaminant detection and microscopyASML HOLDING NV·Filed 2022·Application pending·0 cites
- 4557US6950175B2System, method, and apparatus for a magnetically levitated and driven reticle-masking blade stage mechanismASML HOLDING NV·Filed 2003·Granted Sep 27, 2005·5 cites·40 claims
- 4655US2025130512A1Intensity measurements using off-axis illuminationASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 4752US7298459B2Wafer handling method for use in lithography patterningASML HOLDING NV·Filed 2005·Granted Nov 20, 2007·0 cites·11 claims
- 4851US7633599B2Apparatuses and methods for changing an intensity distribution of light within an illumination field without distorting the telecentricity of the lightASML HOLDING NV·Filed 2006·Granted Dec 15, 2009·0 cites·20 claims
- 4951US7087911B2Method for recycling gases used in a lithography toolASML HOLDING NV·Filed 2005·Granted Aug 8, 2006·0 cites·7 claims
- 5050US6850330B2Reticle focus measurement system using multiple interferometric beamsASML HOLDING NV·Filed 2003·Granted Feb 1, 2005·2 cites·7 claims
Showing the top 50 of 54 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →