Inventor · disambiguated record
Steven Scheer
Also filed as: SCHEER STEVEN · SCHEER STEVEN A
25 granted patents·7 pending applications·184 citations·filing 2004–2018
95Inventor score
Top patents by PatentIndex Score
32 records- 0196US7829269B1Dual tone development with plural photo-acid generators in lithographic applicationsTOKYO ELECTRON LTD·Filed 2009·Granted Nov 9, 2010·32 cites·13 claims
- 0294US8795952B2Line pattern collapse mitigation through gap-fill material applicationSOMERVELL MARK H·Filed 2011·Granted Aug 5, 2014·13 cites·20 claims
- 0393US7588879B2Graded spin-on organic antireflective coating for photolithographyIBM·Filed 2008·Granted Sep 15, 2009·15 cites·24 claims
- 0492US10020195B2Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resistsTOKYO ELECTRON LTD·Filed 2015·Granted Jul 10, 2018·8 cites·18 claims
- 0592US7673278B2Enhanced process yield using a hot-spot libraryTOKYO ELECTRON LTD·Filed 2007·Granted Mar 2, 2010·26 cites·8 claims
- 0689US9454081B2Line pattern collapse mitigation through gap-fill material applicationTOKYO ELECTRON LTD·Filed 2014·Granted Sep 27, 2016·4 cites·20 claims
- 0789US8097402B2Using electric-field directed post-exposure bake for double-patterning (D-P)SCHEER STEVEN·Filed 2009·Granted Jan 17, 2012·20 cites·20 claims
- 0888US8129080B2Variable resist protecting groupsFONSECA CARLOS A·Filed 2009·Granted Mar 6, 2012·13 cites·19 claims
- 0987US8288174B1Electrostatic post exposure bake apparatus and methodRATHSACK BENJAMEN M·Filed 2011·Granted Oct 16, 2012·13 cites·18 claims
- 1085US7816069B2Graded spin-on organic antireflective coating for photolithographyIBM·Filed 2006·Granted Oct 19, 2010·7 cites·8 claims
- 1183US7483804B2Method of real time dynamic CD controlTOKYO ELECTRON LTD·Filed 2006·Granted Jan 27, 2009·7 cites·21 claims
- 1281US8197996B2Dual tone development processesFONSECA CARLOS A·Filed 2009·Granted Jun 12, 2012·6 cites·27 claims
- 1378US9085045B2Method and system for controlling a spike anneal processTOKYO ELECTRON LTD·Filed 2012·Granted Jul 21, 2015·4 cites·19 claims
- 1478US8283111B2Method for creating gray-scale features for dual tone development processesFONSECA CARLOS A·Filed 2008·Granted Oct 9, 2012·5 cites·11 claims
- 1571US8449293B2Substrate treatment to reduce pattern roughnessRATHSACK BENJAMIN M·Filed 2010·Granted May 28, 2013·3 cites·20 claims
- 1667US8574810B2Dual tone development with a photo-activated acid enhancement component in lithographic applicationsFONSECA CARLOS A·Filed 2009·Granted Nov 5, 2013·2 cites·20 claims
- 1766US7473461B2Film stack having under layer for preventing pinhole defectsIBM·Filed 2007·Granted Jan 6, 2009·0 cites·7 claims
- 1863US7132316B2After deposition method of thinning film to reduce pinhole defectsIBM·Filed 2005·Granted Nov 7, 2006·1 cites·11 claims
- 1957US8257911B2Method of process optimization for dual tone developmentGRONHEID ROEL·Filed 2008·Granted Sep 4, 2012·2 cites·20 claims
- 2055US8568964B2Flood exposure process for dual tone development in lithographic applicationsFONSECA CARLOS A·Filed 2009·Granted Oct 29, 2013·0 cites·14 claims
- 2155US2016363868A1Line pattern collapse mitigation through gap-fill material applicationTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 2254US12165870B2Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resistsTOKYO ELECTRON LTD·Filed 2018·Granted Dec 10, 2024·0 cites·22 claims
- 2353US7267863B2Film stack having under layer for preventing pinhole defectsIBM·Filed 2004·Granted Sep 11, 2007·3 cites·6 claims
- 2450US7541065B2Method of forming film stack having under layer for preventing pinhole defectsIBM·Filed 2007·Granted Jun 2, 2009·0 cites·2 claims
- 2549US2007037325A1After deposition method of thinning film to reduce pinhole defectsLI WAI-KIN·Filed 2006·Application pending·0 cites
- 2646US9383138B2Methods and heat treatment apparatus for uniformly heating a substrate during a bake processSCHEER STEVEN·Filed 2007·Granted Jul 5, 2016·0 cites·16 claims
- 2743US2010055624A1Method of patterning a substrate using dual tone developmentTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 2842US2008241400A1Vacuum assist method and system for reducing intermixing of lithography layersTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 2941US7632631B2Method of preventing pinhole defects through co-polymerizationIBM·Filed 2005·Granted Dec 15, 2009·0 cites·13 claims
- 3039US2007178404A1Methods of preventing defects in antireflective coatingsIBM·Filed 2006·Application pending·0 cites
- 3136US2012045721A1Method for forming a self-aligned double patternPRINTZ WALLACE P·Filed 2010·Application pending·0 cites
- 3236US2012045722A1Technique to form a self-aligned double patternPRINTZ WALLACE P·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →