Inventor · disambiguated record
Stephan Six
Also filed as: SIX STEPHAN
10 granted patents·8 pending applications·66 citations·filing 2007–2025
85Inventor score
Top patents by PatentIndex Score
18 records- 0193US7738187B2Optical element, projection lens and associated projection exposure apparatusZEISS CARL SMT AG·Filed 2008·Granted Jun 15, 2010·48 cites·31 claims
- 0282US8279402B2Optical arrangement for immersion lithography with a hydrophobic coating, as well as projection exposure apparatus comprising the sameSIX STEPHAN·Filed 2009·Granted Oct 2, 2012·11 cites·27 claims
- 0377US8564925B2Wafer chuck for EUV lithographySIX STEPHAN·Filed 2011·Granted Oct 22, 2013·3 cites·28 claims
- 0474US9645513B2Optical imaging with reduced immersion liquid evaporation effectsZEISS CARL SMT GMBH·Filed 2014·Granted May 9, 2017·1 cites·31 claims
- 0572US2025389927A1Optical modules for the ultraviolet wavelength rangeZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 0670US8934079B2Optical imaging with reduced immersion liquid evaporation effectsSIX STEPHAN·Filed 2011·Granted Jan 13, 2015·2 cites·23 claims
- 0766US2025164890A1Lens element for a microlithographic projection exposure apparatus designed for operation in the duv, and method and arrangement for forming an antireflection layerZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 0865US2024167145A1Method for depositing a layer optical element, and optical assembly for the duv wavelength rangeZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 0965US2024201597A1Duv lithography systemZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 1062US2019146122A1Optical imaging with reduced immersion liquid evaporation effectsZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
- 1160US10107943B2Optical imaging with reduced immersion liquid evaporation effectsZEISS CARL SMT GMBH·Filed 2017·Granted Oct 23, 2018·0 cites·21 claims
- 1257US8007711B2Method for operating a converterSMSDEMAG AG·Filed 2007·Granted Aug 30, 2011·1 cites·4 claims
- 1355US2017322343A1Microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2017·Application pending·0 cites
- 1455US2014320955A1Microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Application pending·0 cites
- 1553US2008297754A1Microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 1646US11162778B2Method for determining material removal and device for the beam machining of a workpieceZEISS CARL SMT GMBH·Filed 2019·Granted Nov 2, 2021·0 cites·16 claims
- 1745US9733395B2Microlithographic projection exposure apparatusKAMENOV VLADIMIR·Filed 2011·Granted Aug 15, 2017·0 cites·29 claims
- 1842US11328831B2Method for treating a reflective optical element for the EUV wavelength range, method for producing same, and treating apparatusZEISS CARL SMT GMBH·Filed 2018·Granted May 10, 2022·0 cites·16 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →