Inventor · disambiguated record
Stan Stokowski
Also filed as: STOKOWSKI STAN
11 granted patents·528 citations·filing 2002–2008
93Inventor score
Top patents by PatentIndex Score
11 records- 0196US7738093B2Methods for detecting and classifying defects on a reticleKLA TENCOR CORP·Filed 2008·Granted Jun 15, 2010·42 cites·21 claims
- 0296US7123356B1Methods and systems for inspecting reticles using aerial imaging and die-to-database detectionKLA TENCOR TECH CORP·Filed 2003·Granted Oct 17, 2006·126 cites·22 claims
- 0396US7027143B1Methods and systems for inspecting reticles using aerial imaging at off-stepper wavelengthsKLA TENCOR TECH CORP·Filed 2003·Granted Apr 11, 2006·107 cites·20 claims
- 0495US7379175B1Methods and systems for reticle inspection and defect review using aerial imagingKLA TENCOR TECH CORP·Filed 2003·Granted May 27, 2008·99 cites·20 claims
- 0589US8194240B1Enhanced focusing capability on a sample using a spot matrixVAEZ-IRAVANI MEHDI·Filed 2008·Granted Jun 5, 2012·11 cites·8 claims
- 0688US6844927B2Apparatus and methods for removing optical abberations during an optical inspectionKLA TENCOR TECH CORP·Filed 2003·Granted Jan 18, 2005·35 cites·33 claims
- 0786US6922236B2Systems and methods for simultaneous or sequential multi-perspective specimen defect inspectionKLA TENCOR TECH CORP·Filed 2002·Granted Jul 26, 2005·36 cites·26 claims
- 0885US6727512B2Method and system for detecting phase defects in lithographic masks and semiconductor wafersKLA TENCOR TECH CORP·Filed 2002·Granted Apr 27, 2004·27 cites·43 claims
- 0984US7133119B1Systems for simulating high NA and polarization effects in aerial imagesKLA TENCOR TECH CORP·Filed 2003·Granted Nov 7, 2006·28 cites·21 claims
- 1079US7738092B1System and method for reducing speckle noise in die-to-die inspection systemsKLA TENCOR CORP·Filed 2008·Granted Jun 15, 2010·6 cites·20 claims
- 1171US6646281B1Differential detector coupled with defocus for improved phase defect sensitivityKLA TENCOR CORP·Filed 2002·Granted Nov 11, 2003·11 cites·39 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →