Inventor · disambiguated record
Stefan Wurm
Also filed as: WURM STEFAN
22 granted patents·9 pending applications·142 citations·filing 1990–2021
94Inventor score
Files withINFINEON TECHNOLOGIES AG14SCHWARZL SIEGFRIED5WURM STEFAN5SEMATECH INC3Magna powertrain gmbh & co kg1
Top patents by PatentIndex Score
31 records- 0192US8501373B2Passivation of multi-layer mirror for extreme ultraviolet lithographySCHWARZL SIEGFRIED·Filed 2011·Granted Aug 6, 2013·9 cites·20 claims
- 0290US7250620B2EUV lithography filterSEMATECH INC·Filed 2005·Granted Jul 31, 2007·20 cites·38 claims
- 0384US7323821B2Device for generating and/or influencing electromagnetic radiation from a plasmaQIMONDA AG·Filed 2005·Granted Jan 29, 2008·7 cites·20 claims
- 0481US7859648B2Passivation of multi-layer mirror for extreme ultraviolet lithographyINFINEON TECHNOLOGIES AG·Filed 2009·Granted Dec 28, 2010·5 cites·21 claims
- 0577US7760341B2Systems and methods for in-situ reflectivity degradation monitoring of optical collectors used in extreme ultraviolet (EUV) lithography processesSEMATECH INC·Filed 2007·Granted Jul 20, 2010·5 cites·14 claims
- 0677US7709816B2Systems and methods for monitoring and controlling the operation of extreme ultraviolet (EUV) light sources used in semiconductor fabricationSEMATECH INC·Filed 2007·Granted May 4, 2010·5 cites·19 claims
- 0775US7078134B2Photolithographic mask having a structure region covered by a thin protective coating of only a few atomic layers and methods for the fabrication of the mask including ALCVD to form the thin protective coatingINFINEON TECHNOLOGIES AG·Filed 2003·Granted Jul 18, 2006·22 cites·19 claims
- 0874US7576005B2Dense seed layer and method of formationINFINEON TECHNOLOGIES AG·Filed 2007·Granted Aug 18, 2009·3 cites·24 claims
- 0967US8148821B2Dense seed layer and method of formationWURM STEFAN·Filed 2009·Granted Apr 3, 2012·2 cites·11 claims
- 1067US5034611AMethod for non-destructive identification for electronic inhomogeneities in semiconductor layersSIEMENS AG·Filed 1990·Granted Jul 23, 1991·33 cites·7 claims
- 1165US7407729B2EUV magnetic contrast lithography mask and manufacture thereofINFINEON TECHNOLOGIES AG·Filed 2004·Granted Aug 5, 2008·7 cites·26 claims
- 1265US7294851B2Dense seed layer and method of formationINFINEON TECHNOLOGIES AG·Filed 2004·Granted Nov 13, 2007·7 cites·11 claims
- 1362US7626682B2Reticle stages for lithography systems and lithography methodsINFINEON TECHNOLOGIES AG·Filed 2006·Granted Dec 1, 2009·1 cites·12 claims
- 1462US7029808B2Photosensitive coating material for a substrate and process for exposing the coated substrateINFINEON TECHNOLOGIES AG·Filed 2003·Granted Apr 18, 2006·6 cites·3 claims
- 1561US12391126B2Method for increasing the power during an acceleration process of an electrically operated motor vehicleMagna powertrain gmbh & co kg·Filed 2021·Granted Aug 19, 2025·0 cites·18 claims
- 1659US6864175B2Method for fabricating integrated circuit arrangements, and associated circuit arrangements, in particular tunnel contact elementsINFINEON TECHNOLOGIES AG·Filed 2001·Granted Mar 8, 2005·9 cites·13 claims
- 1754US2010035431A1Reticle Stages for Lithography Systems and Lithography MethodsWURM STEFAN·Filed 2009·Application pending·0 cites
- 1851US8766447B2Dense seed layer and method of formationWURM STEFAN·Filed 2012·Granted Jul 1, 2014·0 cites·20 claims
- 1951US2008204695A1EUV Lithography System and Chuck for Releasing Reticle in a Vacuum Isolated EnvironmentSCHWARZL SIEGFRIED·Filed 2008·Application pending·0 cites
- 2050US6849365B2Reflection mask for EUV-lithography and method for fabricating the reflection maskINFINEON TECHNOLOGIES AG·Filed 2002·Granted Feb 1, 2005·1 cites·13 claims
- 2147US2006091334A1Con-focal imaging system and method using destructive interference to enhance image contrast of light scattering objects on a sample surfaceURBACH JAN-PETER·Filed 2004·Application pending·0 cites
- 2246US8076055B2Passivation of multi-layer mirror for extreme ultraviolet lithographySCHWARZL SIEGFRIED·Filed 2010·Granted Dec 13, 2011·0 cites·9 claims
- 2342US2006024589A1Passivation of multi-layer mirror for extreme ultraviolet lithographySCHWARZL SIEGFRIED·Filed 2004·Application pending·0 cites
- 2442US2005223973A1EUV lithography system and chuck for releasing reticle in a vacuum isolated environmentINFINEON TECHNOLOGIES AG·Filed 2004·Application pending·0 cites
- 2540US7586059B2Lithography mask substrate labeling systemINFINEON TECHNOLOGIES AG·Filed 2004·Granted Sep 8, 2009·0 cites·15 claims
- 2640US7417736B2Method for determining a radiation power and an exposure apparatusINFINEON TECHNOLOGIES AG·Filed 2005·Granted Aug 26, 2008·0 cites·22 claims
- 2740US2008063982A1Fluids and methods of forming thereofWURM STEFAN·Filed 2006·Application pending·0 cites
- 2840US2008073572A1Systems and methods of measuring power in lithography systemsSCHWARZL SIEGFRIED·Filed 2006·Application pending·0 cites
- 2939US7547505B2Methods of forming capping layers on reflective materialsINFINEON TECHNOLOGIES AG·Filed 2005·Granted Jun 16, 2009·0 cites·25 claims
- 3033US2006147839A1Photosensitive coating material for a substrateINFINEON TECHNOLOGIES AG·Filed 2006·Application pending·0 cites
- 3129US2006275928A1Semiconductor memory device and operating method for a semiconductor memory deviceWURM STEFAN·Filed 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →