Inventor · disambiguated record
Sudharshanan Raghunathan
Also filed as: RAGHUNATHAN SUDHARSHANAN
13 granted patents·3 pending applications·103 citations·filing 2011–2025
90Inventor score
Top patents by PatentIndex Score
16 records- 0198US9362165B12D self-aligned via first process flowGLOBALFOUNDRIES INC·Filed 2015·Granted Jun 7, 2016·49 cites·15 claims
- 0295US9818651B2Methods, apparatus and system for a passthrough-based architectureGLOBALFOUNDRIES INC·Filed 2016·Granted Nov 14, 2017·15 cites·10 claims
- 0395US9425097B1Cut first alternative for 2D self-aligned viaGLOBALFOUNDRIES INC·Filed 2015·Granted Aug 23, 2016·12 cites·10 claims
- 0494US10527958B2Lithographic methodASML NETHERLANDS BV·Filed 2018·Granted Jan 7, 2020·7 cites·21 claims
- 0585US2025355366A1Method for calibrating simulation process based on defect-based process windowASML NETHERLANDS BV·Filed 2025·Application pending·0 cites
- 0684US8673165B2Sidewall image transfer process with multiple critical dimensionsRAGHUNATHAN SUDHARSHANAN·Filed 2011·Granted Mar 18, 2014·11 cites·20 claims
- 0779US10962887B2Lithographic methodASML NETHERLANDS BV·Filed 2019·Granted Mar 30, 2021·1 cites·20 claims
- 0879US10236350B2Method, apparatus and system for a high density middle of line flowGLOBALFOUNDRIES INC·Filed 2016·Granted Mar 19, 2019·3 cites·19 claims
- 0973US10559503B2Methods, apparatus and system for a passthrough-based architectureGLOBALFOUNDRIES INC·Filed 2017·Granted Feb 11, 2020·1 cites·9 claims
- 1071US9478506B2Multilayer pattern transfer for chemical guidesGLOBALFOUNDRIES INC·Filed 2013·Granted Oct 25, 2016·2 cites·13 claims
- 1169US8956789B2Methods for fabricating integrated circuits including multi-patterning of masks for extreme ultraviolet lithographyGLOBALFOUNDRIES INC·Filed 2013·Granted Feb 17, 2015·2 cites·20 claims
- 1267US12386268B2Method for calibrating simulation process based on defect-based process windowASML NETHERLANDS BV·Filed 2021·Granted Aug 12, 2025·0 cites·20 claims
- 1353US9852984B2Cut first alternative for 2D self-aligned viaGLOBALFOUNDRIES INC·Filed 2016·Granted Dec 26, 2017·0 cites·7 claims
- 1447US2016329278A12d self-aligned via first process flowGLOBALFOUNDRIES INC·Filed 2016·Application pending·0 cites
- 1546US2016033879A1Methods and controllers for controlling focus of ultraviolet light from a lithographic imaging system, and apparatuses for forming an integrated circuit employing the sameGLOBALFOUNDRIES INC·Filed 2014·Application pending·0 cites
- 1645US8911920B2Methods for fabricating EUV masks and methods for fabricating integrated circuits using such EUV masksGLOBALFOUNDRIES INC·Filed 2013·Granted Dec 16, 2014·0 cites·20 claims
Join the waitlist — get patent alerts
Get an alert when Sudharshanan Raghunathan files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →