Inventor · disambiguated record
Takao Arase
Also filed as: ARASE TAKAO
22 granted patents·3 pending applications·314 citations·filing 2001–2020
94Inventor score
Top patents by PatentIndex Score
25 records- 0196US7364956B2Method for manufacturing semiconductor devicesHITACHI HIGH TECH CORP·Filed 2005·Granted Apr 29, 2008·163 cites·4 claims
- 0292USD871609SElectrode plate peripheral ring for a plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2018·Granted Dec 31, 2019·41 cites·1 claims
- 0390USD868993SElectrode plate for a plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2018·Granted Dec 3, 2019·36 cites·1 claims
- 0489USD870314SElectrode cover for a plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2018·Granted Dec 17, 2019·34 cites·1 claims
- 0588US8038896B2Plasma processing method and apparatusHITACHI HIGH TECH CORP·Filed 2006·Granted Oct 18, 2011·12 cites·1 claims
- 0678US9136095B2Method for controlling plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2014·Granted Sep 15, 2015·3 cites·5 claims
- 0776US10157750B2Plasma processing method and plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2017·Granted Dec 18, 2018·2 cites·7 claims
- 0874US11257678B2Plasma processing methodHITACHI HIGH TECH CORP·Filed 2019·Granted Feb 22, 2022·2 cites·8 claims
- 0969US10665448B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2013·Granted May 26, 2020·2 cites·17 claims
- 1068US10332760B2Method for controlling plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2015·Granted Jun 25, 2019·1 cites·6 claims
- 1167US9230782B2Plasma processing method and apparatusHITACHI HIGH TECH CORP·Filed 2014·Granted Jan 5, 2016·1 cites·2 claims
- 1266US8900401B2Plasma processing method and apparatusIKEGAMI EIJI·Filed 2010·Granted Dec 2, 2014·2 cites·2 claims
- 1364US6617255B2Plasma processing method for working the surface of semiconductor devicesHITACHI LTD·Filed 2001·Granted Sep 9, 2003·7 cites·3 claims
- 1457USD891636SRing for a plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Jul 28, 2020·6 cites·1 claims
- 1550US10056236B2Plasma processing methodHITACHI HIGH TECH CORP·Filed 2017·Granted Aug 21, 2018·0 cites·5 claims
- 1650US9887070B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2017·Granted Feb 6, 2018·0 cites·6 claims
- 1750US7098138B2Plasma processing method for working the surface of semiconductor devicesHITACHI LTD·Filed 2003·Granted Aug 29, 2006·2 cites·2 claims
- 1849US2006048892A1Plasma processing method for working the surface of semiconductor devicesARASE TAKAO·Filed 2005·Application pending·0 cites
- 1946US11961719B2Vacuum processing methodHITACHI HIGH TECH CORP·Filed 2020·Granted Apr 16, 2024·0 cites·5 claims
- 2046US11532484B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2018·Granted Dec 20, 2022·0 cites·4 claims
- 2145US9779919B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2015·Granted Oct 3, 2017·0 cites·6 claims
- 2243US9905431B2Dry etching methodHITACHI HIGH TECH CORP·Filed 2014·Granted Feb 27, 2018·0 cites·10 claims
- 2342US2021249233A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2019·Application pending·0 cites
- 2440US11355322B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2017·Granted Jun 7, 2022·0 cites·6 claims
- 2540US2019214235A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2018·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →