USD870314SActiveUtility

Electrode cover for a plasma processing apparatus

89
Assignee: HITACHI HIGH TECH CORPPriority: Aug 31, 2017Filed: Jan 30, 2018Granted: Dec 17, 2019
Est. expiryAug 31, 2037(~11.1 yrs left)· nominal 20-yr term from priority
Inventors:Masakazu IsozakiMasahito MoriKenetsu YokogawaTakao AraseYousuke Sakai
89
PatentIndex Score
34
Cited by
22
References
1
Claims

Claims

exact text as granted — not AI-modified
CLAIM 
     
       The ornamental design for an electrode cover for a plasma processing apparatus, as shown and described.

Cited by (0)

No later patents cite this yet.

References (0)

No backward citations on record.