Inventor · disambiguated record
Masakazu Isozaki
Also filed as: ISOZAKI MASAKAZU
14 granted patents·13 pending applications·775 citations·filing 1992–2022
92Inventor score
Files withHITACHI HIGH TECH CORP13FUJI PHOTO FILM CO LTD3ISOZAKI MASAKAZU2SHIMOMURA TAKAHIRO2KANNO SEIICHIRO1
Top patents by PatentIndex Score
27 records- 0198USD557226SElectrode cover for a plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2005·Granted Dec 11, 2007·619 cites·1 claims
- 0292USD871609SElectrode plate peripheral ring for a plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2018·Granted Dec 31, 2019·41 cites·1 claims
- 0390USD868993SElectrode plate for a plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2018·Granted Dec 3, 2019·36 cites·1 claims
- 0489USD870314SElectrode cover for a plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2018·Granted Dec 17, 2019·34 cites·1 claims
- 0589US10121686B2Vacuum processing apparatusHITACHI HIGH TECH CORP·Filed 2015·Granted Nov 6, 2018·7 cites·8 claims
- 0684US10600617B1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Mar 24, 2020·4 cites·5 claims
- 0779US10825657B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2017·Granted Nov 3, 2020·2 cites·9 claims
- 0874US5452524APhotosensitive material drying method and apparatusFUJI PHOTO FILM CO LTD·Filed 1993·Granted Sep 26, 1995·9 cites·22 claims
- 0958US5337499ADrier apparatus for drying sheets of photosensitive materialFUJI PHOTO FILM CO LTD·Filed 1992·Granted Aug 16, 1994·4 cites·20 claims
- 1057USD891636SRing for a plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Jul 28, 2020·6 cites·1 claims
- 1152US12476127B2Vacuum processing apparatusHITACHI HIGH TECH CORP·Filed 2022·Granted Nov 18, 2025·0 cites·14 claims
- 1251US5463444AHeat development processor wherein steam is discharged from a heat sensitive materialFUJI PHOTO FILM CO LTD·Filed 1993·Granted Oct 31, 1995·13 cites·9 claims
- 1348US2010163185A1Vacuum processing apparatusKOBAYASHI MICHIAKI·Filed 2009·Application pending·0 cites
- 1447US2010186672A1Plasma processing apparatusOKUDA KOJI·Filed 2009·Application pending·0 cites
- 1546US12444581B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Oct 14, 2025·0 cites·9 claims
- 1640US2019189396A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2018·Application pending·0 cites
- 1740US2009165952A1Vacuum processing apparatusTAUCHI SUSUMU·Filed 2008·Application pending·0 cites
- 1840US2019214235A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2018·Application pending·0 cites
- 1940US2014044502A1Vacuum processing apparatus and method of operating the sameUEMURA TAKASHI·Filed 2012·Application pending·0 cites
- 2038US2006291132A1Electrostatic chuck, wafer processing apparatus and plasma processing methodKANNO SEIICHIRO·Filed 2006·Application pending·0 cites
- 2136US2007267145A1Sample table and plasma processing apparatus provided with the sameKITADA HIROHO·Filed 2006·Application pending·0 cites
- 2235US8100620B2Vacuum processing apparatusISOZAKI MASAKAZU·Filed 2008·Granted Jan 24, 2012·0 cites·4 claims
- 2334US2015243486A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2015·Application pending·0 cites
- 2433US2007044916A1Vacuum processing systemISOZAKI MASAKAZU·Filed 2005·Application pending·0 cites
- 2533US2012093617A1Vacuum processing apparatus and vacuum processing methodKUDOU YUTAKA·Filed 2011·Application pending·0 cites
- 2631US2012067522A1Vacuum processing apparatusSHIMOMURA TAKAHIRO·Filed 2011·Application pending·0 cites
- 2730US2012067521A1Vacuum processing systemSHIMOMURA TAKAHIRO·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →