USD557226SExpiredUtility

Electrode cover for a plasma processing apparatus

Assignee: HITACHI HIGH TECH CORPPriority: Aug 25, 2005Filed: Aug 25, 2005Granted: Dec 11, 2007

Est. expiryAug 25, 2025(expired)· nominal 20-yr term from priority

PatentIndex Score

619

Cited by

References

Claims

exact text as granted — not AI-modified

CLAIM 
     
       The ornamental design for electrode cover for a plasma processing apparatus, as shown.

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