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Electrode plate for a plasma processing apparatus

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Assignee: HITACHI HIGH TECH CORPPriority: Aug 31, 2017Filed: Jan 30, 2018Granted: Dec 3, 2019
Est. expiryAug 31, 2037(~11.1 yrs left)· nominal 20-yr term from priority
Inventors:Masakazu IsozakiMasahito MoriKenetsu YokogawaTakao AraseTakahisa Hashimoto
90
PatentIndex Score
36
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23
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1
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Claims

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CLAIM 
     
       The ornamental design for an electrode plate for a plasma processing apparatus, as shown and described.

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