Inventor · disambiguated record
Taiichi Furukawa
Also filed as: FURUKAWA TAIICHI
20 granted patents·10 pending applications·19 citations·filing 2006–2024
91Inventor score
Top patents by PatentIndex Score
30 records- 0184US8815493B2Resist pattern-forming method, and radiation-sensitive resin compositionJSR CORP·Filed 2013·Granted Aug 26, 2014·4 cites·5 claims
- 0283US8993223B2Resist pattern-forming methodJSR CORP·Filed 2014·Granted Mar 31, 2015·2 cites·13 claims
- 0379US8980539B2DeveloperJSR CORP·Filed 2014·Granted Mar 17, 2015·2 cites·9 claims
- 0478US8669042B2Resist pattern-forming methodANNO YUSUKE·Filed 2012·Granted Mar 11, 2014·2 cites·9 claims
- 0577US9170488B2Resist pattern-forming method, and radiation-sensitive resin compositionJSR CORP·Filed 2014·Granted Oct 27, 2015·2 cites·10 claims
- 0675US9335630B2Pattern-forming method, and radiation-sensitive compositionJSR CORP·Filed 2015·Granted May 10, 2016·1 cites·18 claims
- 0770US8703401B2Method for forming pattern and developerFURUKAWA TAIICHI·Filed 2011·Granted Apr 22, 2014·2 cites·9 claims
- 0869US8795954B2Resist pattern-forming method, and radiation-sensitive resin compositionJSR CORP·Filed 2013·Granted Aug 5, 2014·1 cites·6 claims
- 0967US8530146B2Method for forming resist patternSAKAKIBARA HIROKAZU·Filed 2012·Granted Sep 10, 2013·1 cites·6 claims
- 1067US2024393687A1Radiation-sensitive resin composition and pattern formation methodJSR CORP·Filed 2024·Application pending·0 cites
- 1165US8168109B2Stabilizers for vinyl ether resist formulations for imprint lithographyHOULE FRANCES A·Filed 2009·Granted May 1, 2012·2 cites·24 claims
- 1263US2024393688A1Radiation-sensitive resin composition and pattern formation methodJSR CORP·Filed 2024·Application pending·0 cites
- 1362US10025188B2Resist pattern-forming methodJSR CORP·Filed 2017·Granted Jul 17, 2018·0 cites·17 claims
- 1460US2016320705A1Resist pattern-forming methodJSR CORP·Filed 2016·Application pending·0 cites
- 1558US2016097978A1Resist pattern-forming methodJSR CORP·Filed 2015·Application pending·0 cites
- 1657US12386260B2Radiation-sensitive resin composition, method of forming resist pattern, polymer, and compoundJSR CORP·Filed 2022·Granted Aug 12, 2025·0 cites·20 claims
- 1757US9034559B2Pattern-forming method, and radiation-sensitive compositionJSR CORP·Filed 2013·Granted May 19, 2015·0 cites·16 claims
- 1856US9229323B2Pattern-forming methodJSR CORP·Filed 2014·Granted Jan 5, 2016·0 cites·16 claims
- 1956US2015160556A1Resist pattern-forming methodJSR CORP·Filed 2015·Application pending·0 cites
- 2055US11687003B2Negative resist pattern-forming method, and composition for upper layer film formationJSR CORP·Filed 2018·Granted Jun 27, 2023·0 cites·20 claims
- 2155US8822140B2Resist pattern-forming methodJSR CORP·Filed 2013·Granted Sep 2, 2014·0 cites·12 claims
- 2254US2013316287A1Photoresist compositionJSR CORP·Filed 2013·Application pending·0 cites
- 2353US8168691B2Vinyl ether resist formulations for imprint lithography and processes of useHOULE FRANCES A·Filed 2009·Granted May 1, 2012·0 cites·13 claims
- 2449US10073344B2Negative resist pattern-forming method, and composition for upper layer film formationJSR CORP·Filed 2016·Granted Sep 11, 2018·0 cites·16 claims
- 2545US9223207B2Resist pattern-forming method, and radiation-sensitive resin compositionJSR CORP·Filed 2013·Granted Dec 29, 2015·0 cites·22 claims
- 2643US9164387B2Pattern-forming method, and radiation-sensitive resin compositionJSR CORP·Filed 2013·Granted Oct 20, 2015·0 cites·12 claims
- 2743US2013337385A1Negative pattern-forming method and photoresist compositionJSR CORP·Filed 2013·Application pending·0 cites
- 2838US2007156003A1Method for producing saturated hydrocarbon compoundFURUKAWA TAIICHI·Filed 2006·Application pending·0 cites
- 2936US2008129970A1Immersion Exposure System, and Recycle Method and Supply Method of Liquid for Immersion ExposureFURUKAWA TAIICHI·Filed 2006·Application pending·0 cites
- 3033US2016252818A9Production method of semiconductor element, and ion implantation methodJSR CORP·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →