Inventor · disambiguated record
Takahiro Hayama
Also filed as: HAYAMA TAKAHIRO
9 granted patents·5 pending applications·15 citations·filing 2007–2018
81Inventor score
Top patents by PatentIndex Score
14 records- 0174US9268225B2Composition, resist pattern-forming method, compound, method for production of compound, and polymerJSR CORP·Filed 2014·Granted Feb 23, 2016·2 cites·19 claims
- 0271US8038127B2Method for manufacturing a hydrogen-added water and a device for the sameHIROSHIMA KASEI LTD·Filed 2007·Granted Oct 18, 2011·9 cites·12 claims
- 0369US10304694B2Semiconductor treatment composition and treatment methodJSR CORP·Filed 2017·Granted May 28, 2019·1 cites·11 claims
- 0468US10319605B2Semiconductor treatment composition and treatment methodJSR CORP·Filed 2017·Granted Jun 11, 2019·1 cites·20 claims
- 0567US9920287B2Cleaning composition and cleaning methodJSR CORP·Filed 2015·Granted Mar 20, 2018·1 cites·17 claims
- 0663US9926462B2Composition for forming liquid immersion upper layer film, and polymerJSR CORP·Filed 2016·Granted Mar 27, 2018·0 cites·15 claims
- 0762US9261789B2Liquid immersion lithography upper-layer film-forming composition and photoresist pattern-forming methodHAYAMA TAKAHIRO·Filed 2011·Granted Feb 16, 2016·1 cites·13 claims
- 0854US9540535B2Composition for forming liquid immersion upper layer film, and polymerJSR CORP·Filed 2013·Granted Jan 10, 2017·0 cites·17 claims
- 0951US2019122896A1Semiconductor treatment compositionJSR CORP·Filed 2018·Application pending·0 cites
- 1049US2017160637A9Upper layer-forming composition and resist patterning methodJSR CORP·Filed 2015·Application pending·0 cites
- 1139US2013084524A1Composition for forming liquid immersion upper layer film and method for forming resist patternJSR CORP·Filed 2012·Application pending·0 cites
- 1235US2017330762A1Semiconductor treatment composition and treatment methodJSR CORP·Filed 2017·Application pending·0 cites
- 1331US8501389B2Upper layer-forming composition and resist patterning methodKUSABIRAKI KAZUNORI·Filed 2011·Granted Aug 6, 2013·0 cites·8 claims
- 1430US2018086943A1Treatment composition for chemical mechanical polishing, chemical mechanical polishing method, and cleaning methodJSR CORP·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →