Semiconductor treatment composition

Abstract

A semiconductor treatment composition includes potassium, sodium, and a compound A represented by the formula (1), and has a potassium content M K (ppm) and a sodium content M Na (ppm) that satisfy M K /M Na =1×10 −1 to 1×10 4 .

What is claimed is: 
     
         1 . A concentrated semiconductor treatment composition, comprising:
 potassium;   sodium;   a water-soluble polymer having a weight average molecular weight of 1,000 to 1,500,000; and   a compound A represented by the following general formula (1),   wherein the concentrated semiconductor treatment composition has a potassium content M K  (ppm) and a sodium content M Na  (ppm) that satisfy M K /M Na =1×10 −1  to 1×10 4 :   
       
         
           
           
               
               
           
         
         wherein each of R 1  to R 4  is a hydrogen atom or an organic group, independently, and M − is an anion. 
       
     
     
         2 . The concentrated semiconductor treatment composition according to  claim 1 , the concentrated semiconductor treatment composition being used in a 30 to 300-fold diluted state. 
     
     
         3 . The concentrated semiconductor treatment composition according to  claim 1 , wherein the concentrated semiconductor treatment composition has a viscosity of less than 5 mPa·s at 25° C. 
     
     
         4 . The concentrated semiconductor treatment composition according to  claim 1 , further comprising an amino acid. 
     
     
         5 . The concentrated semiconductor treatment composition according to  claim 1 , wherein the water-soluble polymer has a weight average molecular weight of 3,000 to 1,200,000. 
     
     
         6 . A semiconductor treatment composition, comprising:
 potassium;   sodium;   a water-soluble polymer having a weight average molecular weight of 1,000 to 1,500,000; and   a compound A represented by the following general formula (1),   wherein the semiconductor treatment composition is suitable for being used without being diluted, and   the semiconductor treatment composition has a potassium content M K  (ppm) and a sodium content  MNa  (ppm) that satisfy M K /M Na =1×10 −1  to 1×10 4 :   
       
         
           
           
               
               
           
         
         wherein each of R 1  to R 4  is a hydrogen atom or an organic group, independently, and M −  is an anion. 
       
     
     
         7 . The semiconductor treatment composition according to  claim 6 , wherein the semiconductor treatment composition has a viscosity of less than 5 mPa·s at 25° C. 
     
     
         8 . The semiconductor treatment composition according to  claim 6 , further comprising an amino acid. 
     
     
         9 . The semiconductor treatment composition according to  claim 6 , wherein the water-soluble polymer has a weight average molecular weight of 3,000 to 1,200,000. 
     
     
         10 . The concentrated semiconductor treatment composition according to  claim 1 , wherein the potassium content M K  (ppm) is 1×10 −4  to 5×10 3  ppm, and the sodium content M Na  (ppm) is 1×10 −6  to 1×10 2  ppm. 
     
     
         11 . The semiconductor treatment composition according to  claim 6 , wherein the potassium content M K  (ppm) is 1×10 −6  to 5×10 3  ppm, and the sodium content M Na  (ppm) is 1×10 −8  to 1×10 2  ppm.