Inventor · disambiguated record
Yasutaka Kamei
Also filed as: KAMEI YASUTAKA
4 granted patents·7 pending applications·3 citations·filing 2010–2022
61Inventor score
Top patents by PatentIndex Score
11 records- 0169US10304694B2Semiconductor treatment composition and treatment methodJSR CORP·Filed 2017·Granted May 28, 2019·1 cites·11 claims
- 0268US10319605B2Semiconductor treatment composition and treatment methodJSR CORP·Filed 2017·Granted Jun 11, 2019·1 cites·20 claims
- 0367US9920287B2Cleaning composition and cleaning methodJSR CORP·Filed 2015·Granted Mar 20, 2018·1 cites·17 claims
- 0453US12104087B2Composition for chemical-mechanical polishing and chemical-mechanical polishing methodJSR CORP·Filed 2020·Granted Oct 1, 2024·0 cites·20 claims
- 0551US2019122896A1Semiconductor treatment compositionJSR CORP·Filed 2018·Application pending·0 cites
- 0650US2024254365A1Chemical mechanical polishing composition and polishing methodJSR CORP·Filed 2022·Application pending·0 cites
- 0740US2015344739A1Aqueous dispersion for chemical mechanical polishing, and chemical mechanical polishing methodJSR CORP·Filed 2013·Application pending·0 cites
- 0840US2022389280A1Chemical mechanical polishing composition and chemical mechanical polishing methodJSR CORP·Filed 2020·Application pending·0 cites
- 0935US2017330762A1Semiconductor treatment composition and treatment methodJSR CORP·Filed 2017·Application pending·0 cites
- 1032US2012175550A1Aqueous dispersion for chemical mechanical polishing and chemical mechanical polishing method using sameBABA ATSUSHI·Filed 2010·Application pending·0 cites
- 1130US2018086943A1Treatment composition for chemical mechanical polishing, chemical mechanical polishing method, and cleaning methodJSR CORP·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →