Inventor · disambiguated record
Satoshi Kamo
Also filed as: KAMO SATOSHI
5 granted patents·14 pending applications·19 citations·filing 2004–2018
75Inventor score
Top patents by PatentIndex Score
19 records- 0185US7493000B2Curable liquid resin optical fiber upjacket compositionDSM IP ASSETS BV·Filed 2005·Granted Feb 17, 2009·9 cites·16 claims
- 0275US8242202B2Curable liquid resin compositionYAMAGUCHI HIROSHI·Filed 2005·Granted Aug 14, 2012·3 cites·9 claims
- 0369US10304694B2Semiconductor treatment composition and treatment methodJSR CORP·Filed 2017·Granted May 28, 2019·1 cites·11 claims
- 0468US10319605B2Semiconductor treatment composition and treatment methodJSR CORP·Filed 2017·Granted Jun 11, 2019·1 cites·20 claims
- 0561US7906566B2Curable liquid resin compositionDSM IP ASSETS BV·Filed 2004·Granted Mar 15, 2011·5 cites·17 claims
- 0653US2012205135A1Radiation curable resin composition for wire coatingYAMAGUCHI HIROSHI·Filed 2010·Application pending·0 cites
- 0752US2012145432A1Radiation curable resin composition for wire coatingYAMAGUCHI HIROSHI·Filed 2010·Application pending·0 cites
- 0851US2010071928A1Radiation curable resin compositions for electric wire coatingsYAMAGUCHI HIROSHI·Filed 2008·Application pending·0 cites
- 0951US2019122896A1Semiconductor treatment compositionJSR CORP·Filed 2018·Application pending·0 cites
- 1046US2013331004A1Semiconductor device manufacturing method and chemical mechanical polishing methodJSR CORP·Filed 2013·Application pending·0 cites
- 1143US2008045623A1Radiation-Curable Liquid Resin Optical Fiber Upjacket CompositionYAMAGUCHI HIROSHI·Filed 2005·Application pending·0 cites
- 1242US2007246687A1Curable Liquid Resin Optical Fiber Up Jacket CompositionYAMAGUCHI HIROSHI·Filed 2005·Application pending·0 cites
- 1340US2008125546A1Curable Liquid Resin Optical Fiber Up Jacket CompositionYAMAGUCHI HIROSHI·Filed 2005·Application pending·0 cites
- 1437US2005282938A1Curable liquid resin compositionJAPAN SYNTHETIC RUBBER CORP·Filed 2005·Application pending·0 cites
- 1537US2019194493A1Composition for semiconductor treatment and treatment methodJSR CORP·Filed 2018·Application pending·0 cites
- 1635US2017330762A1Semiconductor treatment composition and treatment methodJSR CORP·Filed 2017·Application pending·0 cites
- 1734US2013316621A1Chemical mechanical polishing pad and chemical mechanical polishing method using sameMAEKAWA AYAKO·Filed 2011·Application pending·0 cites
- 1830US2018086943A1Treatment composition for chemical mechanical polishing, chemical mechanical polishing method, and cleaning methodJSR CORP·Filed 2016·Application pending·0 cites
- 1929US2012322348A1Pad for chemical mechanical polishing and method of chemical mechanical polishing using sameYOKOI KATSUTAKA·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →