Inventor · disambiguated record
Takako Hirosaki
Also filed as: HIROSAKI TAKAKO
15 granted patents·6 pending applications·110 citations·filing 2000–2009
90Inventor score
Top patents by PatentIndex Score
21 records- 0190US6406829B1Negative-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Jun 18, 2002·44 cites·7 claims
- 0288US6284428B1Undercoating composition for photolithographic resistTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Sep 4, 2001·29 cites·13 claims
- 0375US6544717B2Undercoating composition for photolithographic resistTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Apr 8, 2003·14 cites·9 claims
- 0473US6455228B1Multilayered body for photolithographic patterningTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Sep 24, 2002·13 cites·6 claims
- 0560US8158328B2Composition for formation of anti-reflection film, and method for formation of resist pattern using the sameSAWANO ATSUSHI·Filed 2008·Granted Apr 17, 2012·2 cites·13 claims
- 0660US6297174B2Method for the formation of a planarizing coating film on substrate surfaceTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Oct 2, 2001·7 cites·6 claims
- 0746US8216775B2Anti-reflection film forming material, and method for forming resist pattern using the sameSHIRAI YURIKO·Filed 2009·Granted Jul 10, 2012·0 cites·7 claims
- 0844US7033731B2Multilayered body for photolithographic patterningTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Apr 25, 2006·0 cites·7 claims
- 0942US8455182B2Composition for antireflection film formation and method for resist pattern formation using the compositionSAWANO ATSUSHI·Filed 2008·Granted Jun 4, 2013·0 cites·7 claims
- 1042US7981588B2Negative resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Jul 19, 2011·0 cites·3 claims
- 1142US2007196764A1Resist composition for supercritical developmentTOKYO OHKA KOGYO CO LTD·Filed 2007·Application pending·0 cites
- 1240US8062825B2Positive resist composition and resist pattern forming methodANDO TOMOYUKI·Filed 2005·Granted Nov 22, 2011·0 cites·9 claims
- 1340US2002146645A1Multilayered body for photolithographic patterningFiled 2002·Application pending·0 cites
- 1439US2001049072A1Undercoating composition for photolithographic resistFiled 2000·Application pending·0 cites
- 1538US8389197B2Compound, positive resist composition and resist pattern forming methodHIROSAKI TAKAKO·Filed 2006·Granted Mar 5, 2013·0 cites·8 claims
- 1637US8206887B2Positive resist composition and resist pattern forming methodHIROSAKI TAKAKO·Filed 2006·Granted Jun 26, 2012·0 cites·10 claims
- 1737US2007190447A1Photoresist composition and method of forming resist patternTOKYO OHKAKOGYO CO LTD·Filed 2005·Application pending·0 cites
- 1835US2004023133A1Photoresist pattern and forming method thereofTOKYO OHKA KOGYO CO LTD·Filed 2003·Application pending·0 cites
- 1933US6864036B2Negative-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Mar 8, 2005·1 cites·25 claims
- 2030US7871753B2Positive resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Jan 18, 2011·0 cites·9 claims
- 2130US2006281023A1Negative photoresist compositionHIROSAKI TAKAKO·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →