Inventor · disambiguated record
Takamichi Kikuchi
Also filed as: KIKUCHI TAKAMICHI
12 granted patents·10 pending applications·334 citations·filing 2007–2023
86Inventor score
Top patents by PatentIndex Score
22 records- 0195US10361366B2Resistive random accress memory containing a conformal titanium aluminum carbide film and method of makingTOKYO ELECTRON LTD·Filed 2018·Granted Jul 23, 2019·324 cites·20 claims
- 0277US11450512B2Plasma processing methodTOKYO ELECTRON LTD·Filed 2018·Granted Sep 20, 2022·2 cites·2 claims
- 0374US9659756B2Plasma etching apparatus and plasma cleaning methodTOKYO ELECTRON LTD·Filed 2013·Granted May 23, 2017·3 cites·19 claims
- 0473US7736942B2Substrate processing apparatus, substrate processing method and storage mediumTOKYO ELECTRON LTD·Filed 2008·Granted Jun 15, 2010·4 cites·20 claims
- 0569US9984892B2Oxide film removing method, oxide film removing apparatus, contact forming method, and contact forming systemTOKYO ELECTRON LTD·Filed 2017·Granted May 29, 2018·1 cites·14 claims
- 0665US12027344B2Film forming apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Jul 2, 2024·0 cites·9 claims
- 0764US12428727B2Cyclic film deposition using reductant gasTOKYO ELECTRON LTD·Filed 2023·Granted Sep 30, 2025·0 cites·20 claims
- 0856US10665431B2Processing methodTOKYO ELECTRON LTD·Filed 2018·Granted May 26, 2020·0 cites·19 claims
- 0956US2020208260A1Method of Forming RuSi Film and Film and Film-Forming ApparatusTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 1053US2010140221A1Plasma etching apparatus and plasma cleaning methodTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 1152US2019385815A1Film forming apparatusTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 1251US12456605B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2021·Granted Oct 28, 2025·0 cites·16 claims
- 1350US10872764B2Film forming methodTOKYO ELECTRON LTD·Filed 2018·Granted Dec 22, 2020·0 cites·8 claims
- 1450US2025006471A1Nitride film forming method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1550US2007175393A1Substrate processing apparatus, substrate processing method, and storage medium storing program for implementing the methodTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 1649US2023250530A1Film forming apparatus and film forming methodTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 1748US2008216957A1Plasma processing apparatus, cleaning method thereof, control program and computer storage mediumTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 1846US10546753B2Method of removing silicon oxide filmTOKYO ELECTRON LTD·Filed 2018·Granted Jan 28, 2020·0 cites·9 claims
- 1945US2011033636A1Substrate processing apparatus, substrate processing method, and storage medium storing program for implementing the methodTOKYO ELECTRON LTD·Filed 2010·Application pending·0 cites
- 2044US2012132367A1Processing apparatusTEZUKA KAZUYUKI·Filed 2011·Application pending·0 cites
- 2141US2007184657A1Etching methodTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 2238US10738374B2Method of performing a surface treatment on a mounting table, the mounting table and a plasma processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Aug 11, 2020·0 cites·3 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →