Inventor · disambiguated record
Takeyoshi Mimura
Also filed as: MIMURA TAKEYOSHI
7 granted patents·4 pending applications·21 citations·filing 2002–2010
78Inventor score
Top patents by PatentIndex Score
11 records- 0179US8278022B2Positive resist composition and method of forming resist patternMIMURA TAKEYOSHI·Filed 2009·Granted Oct 2, 2012·7 cites·5 claims
- 0270US8298748B2Positive resist composition, method of forming resist pattern, and polymeric compoundSESHIMO TAKEHIRO·Filed 2010·Granted Oct 30, 2012·2 cites·6 claims
- 0351US6921621B2Positive resist composition of chemical amplification type, resist coated material, method of forming resist pattern, and process for producing semiconductor deviceTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Jul 26, 2005·9 cites·17 claims
- 0450US7150956B2Chemical amplification type positive resist composition, resist laminated material, resist pattern forming method and method of manufacturing semiconductor deviceTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Dec 19, 2006·3 cites·15 claims
- 0546US8232040B2Positive resist composition and method of forming resist patternIWASHITA JUN·Filed 2009·Granted Jul 31, 2012·0 cites·15 claims
- 0644US2008311515A1Positive resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2008·Application pending·0 cites
- 0744US2009253075A1Positive resist composition, and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2007·Application pending·0 cites
- 0843US8574809B2Positive resist composition and method of forming resist patternMIMURA TAKEYOSHI·Filed 2009·Granted Nov 5, 2013·0 cites·12 claims
- 0943US7914968B2Positive resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2007·Granted Mar 29, 2011·0 cites·6 claims
- 1042US2007196764A1Resist composition for supercritical developmentTOKYO OHKA KOGYO CO LTD·Filed 2007·Application pending·0 cites
- 1140US2009269706A1Method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →