Inventor · disambiguated record
Tatsuya Miyahara
Also filed as: Miyahara Tatsuya
8 granted patents·8 pending applications·2 citations·filing 2019–2025
73Inventor score
Files withTOKYO ELECTRON LTD16
Top patents by PatentIndex Score
16 records- 0182US11260433B2Cleaning method of substrate processing apparatus and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Mar 1, 2022·2 cites·7 claims
- 0265US11600490B2Silicon film forming method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Mar 7, 2023·0 cites·8 claims
- 0365US2025313933A1Method for operating film forming device and film forming deviceTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0462US12351904B2Film deposition method and method for forming polycrystalline silicon filmTOKYO ELECTRON LTD·Filed 2022·Granted Jul 8, 2025·0 cites·8 claims
- 0560US2025079171A1Substrate-processing method and substrate-processing deviceTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0659US12080552B2Method of depositing silicon film and film deposition apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Sep 3, 2024·0 cites·4 claims
- 0758US10892162B2Silicon film forming method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Jan 12, 2021·0 cites·8 claims
- 0857US12252786B2Cleaning method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Mar 18, 2025·0 cites·12 claims
- 0956US12438055B2Abnormality detection method and processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Oct 7, 2025·0 cites·9 claims
- 1056US12112947B2Method of crystallizing amorphous silicon film and deposition apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Oct 8, 2024·0 cites·11 claims
- 1156US2025313932A1Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1256US2024128081A1Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1353US2025316477A1Film forming methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1450US2025270689A1Film-forming method and film-forming apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1541US2019309420A1Substrate Processing Apparatus and Substrate Processing MethodTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 1638US2019284687A1Cleaning Method and Operating Method of Film-Forming Apparatus, and Film-Forming ApparatusTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →