Inventor · disambiguated record
Takeshi Nishioka
Also filed as: NISHIOKA TAKESHI
24 granted patents·7 pending applications·407 citations·filing 1982–2019
96Inventor score
Top patents by PatentIndex Score
31 records- 0191US8641480B2Polishing apparatus and polishing methodNAKANISHI MASAYUKI·Filed 2011·Granted Feb 4, 2014·10 cites·12 claims
- 0290US4542164AFlame-retardant polyolefin foamTORAY INDUSTRIES·Filed 1983·Granted Sep 17, 1985·47 cites·11 claims
- 0388US10328465B2Substrate processing apparatus and substrate processing methodEBARA CORP·Filed 2013·Granted Jun 25, 2019·6 cites·27 claims
- 0487US7339256B2Semiconductor deviceTOSHIBA KK·Filed 2004·Granted Mar 4, 2008·47 cites·30 claims
- 0587US5664989APolishing pad, polishing apparatus and polishing methodTOSHIBA KK·Filed 1996·Granted Sep 9, 1997·74 cites·30 claims
- 0686US7996813B2Method for generating pattern, method for manufacturing semiconductor device, semiconductor device, and computer programTOSHIBA KK·Filed 2010·Granted Aug 9, 2011·9 cites·16 claims
- 0785US4497865APolyethylene terephthalate film, process for the production thereof and magnetic recording medium therefromTORAY INDUSTRIES·Filed 1982·Granted Feb 5, 1985·37 cites·9 claims
- 0883US5150398ABearing and rotary anode X-ray tube employing the bearingTOSHIBA KK·Filed 1989·Granted Sep 22, 1992·42 cites·42 claims
- 0979US6468911B1Method of chemical/mechanical polishing of the surface of semiconductor deviceTOSHIBA KK·Filed 2000·Granted Oct 22, 2002·19 cites·20 claims
- 1076US7416942B2Method for manufacturing semiconductor deviceTOSHIBA KK·Filed 2007·Granted Aug 26, 2008·5 cites·20 claims
- 1174US8492276B2Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing methodABE TAICHI·Filed 2009·Granted Jul 23, 2013·8 cites·9 claims
- 1271US7521803B2Semiconductor device having first and second dummy wirings varying in sizes/coverage ratios around a plug connecting partTOSHIBA KK·Filed 2006·Granted Apr 21, 2009·5 cites·7 claims
- 1370US10586694B2Method for fabricating semiconductor deviceTOSHIBA MEMORY CORP·Filed 2016·Granted Mar 10, 2020·1 cites·11 claims
- 1470US8119517B2Chemical mechanical polishing method and method of manufacturing semiconductor deviceSHIDA HIROTAKA·Filed 2009·Granted Feb 21, 2012·3 cites·15 claims
- 1569US7667332B2Method for generating pattern, method for manufacturing semiconductor device, semiconductor device, and computer program productTOSHIBA KK·Filed 2005·Granted Feb 23, 2010·4 cites·10 claims
- 1669US4587071AProduction of polyethylene terephthalate film for magnetic recordingTORAY INDUSTRIES·Filed 1985·Granted May 6, 1986·22 cites·25 claims
- 1764US10799917B2Substrate processing apparatus and substrate processing methodEBARA CORP·Filed 2019·Granted Oct 13, 2020·0 cites·20 claims
- 1861US4546030APolyethylene terephthalate film, process for the production thereof and magnetic recording medium therefromTORAY INDUSTRIES·Filed 1984·Granted Oct 8, 1985·11 cites·8 claims
- 1959US6867138B2Method of chemical/mechanical polishing of the surface of semiconductor deviceTOSHIBA KK·Filed 2002·Granted Mar 15, 2005·5 cites·10 claims
- 2052US5402485ATwo-wire termination impedance generation circuit of subscriber circuitFUJITSU LTD·Filed 1994·Granted Mar 28, 1995·24 cites·12 claims
- 2149US4663362AExpandable polyvinyl chloride resin composition and foamed sheet prepared from the sameTORAY INDUSTRIES·Filed 1986·Granted May 5, 1987·11 cites·8 claims
- 2249US2007128874A1Chemical mechanical polishing method and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2006·Application pending·0 cites
- 2347US7985685B2Method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2008·Granted Jul 26, 2011·0 cites·20 claims
- 2447US2013217228A1Method for fabricating semiconductor deviceKODERA MASAKO·Filed 2012·Application pending·0 cites
- 2546US2009156000A1Method of manufacturing semiconductor deviceMATSUI YUKITERU·Filed 2008·Application pending·0 cites
- 2645US5208843ARotary X-ray tube and method of manufacturing connecting rod consisting of pulverized sintered materialTOSHIBA KK·Filed 1991·Granted May 4, 1993·11 cites·26 claims
- 2744US2008227297A1Chemical mechanical polishing method and method for manufacturing semiconductor deviceMATSUI YUKITERU·Filed 2008·Application pending·0 cites
- 2841US2007111433A1Methods for manufacturing semiconductor devicesHIRASAWA SHINICHI·Filed 2006·Application pending·0 cites
- 2941US2011081832A1Polishing device and polishing methodNAKAMURA KENRO·Filed 2010·Application pending·0 cites
- 3039US4701472AExpandable polyvinyl chloride resin composition and foamed sheet prepared from the sameTORAY INDUSTRIES·Filed 1987·Granted Oct 20, 1987·6 cites·9 claims
- 3137US2014346126A1Method and system using melting filter for separating mixtureLOCAL INDEPENDENT ADMINISTRATIVE AGENCY·Filed 2014·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →