Inventor · disambiguated record
Tatsuya Ogi
Also filed as: OGI TATSUYA
11 granted patents·1 pending application·75 citations·filing 1998–2017
87Inventor score
Top patents by PatentIndex Score
12 records- 0179US8078311B2Substrate processing apparatus and substrate transfer method adopted in substrate processing apparatusOGI TATSUYA·Filed 2005·Granted Dec 13, 2011·7 cites·8 claims
- 0273US6711454B2System and method for scheduling the movement of wafers in a wafer-processing toolTOKYO ELECTRON LTD·Filed 2003·Granted Mar 23, 2004·20 cites·31 claims
- 0370US6535784B2System and method for scheduling the movement of wafers in a wafer-processing toolTOKYO ELECTRON LTD·Filed 2001·Granted Mar 18, 2003·17 cites·60 claims
- 0468US8423176B2Substrate processing apparatus and substrate transfer method adopted in substrate processing apparatusOGI TATSUYA·Filed 2011·Granted Apr 16, 2013·2 cites·6 claims
- 0568US8140181B2Substrate transfer method, control program, and storage medium storing sameOGI TATSUYA·Filed 2009·Granted Mar 20, 2012·3 cites·6 claims
- 0660US6162010AMethod for recovering object to be treated after interruptionTOKYO ELECTRON LTD·Filed 1998·Granted Dec 19, 2000·26 cites·8 claims
- 0751US9299540B2Plasma processing apparatus, plasma processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2014·Granted Mar 29, 2016·0 cites·4 claims
- 0846US10418289B2Anomaly detection method and semiconductor manufacturing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Sep 17, 2019·0 cites·9 claims
- 0945US8864934B2Plasma processing apparatus, plasma processing method, and storage mediumOGI TATSUYA·Filed 2012·Granted Oct 21, 2014·0 cites·5 claims
- 1039US2012101758A1Method of analyzing cause of abnormality and program analyzing abnormalityOGI TATSUYA·Filed 2011·Application pending·0 cites
- 1133US8663489B2Substrate replacing method and substrate processing apparatusISHIZAWA SHIGERU·Filed 2010·Granted Mar 4, 2014·0 cites·7 claims
- 1225US9002494B2Substrate transfer method and storage mediumENDO EIKI·Filed 2011·Granted Apr 7, 2015·0 cites·4 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →