Inventor · disambiguated record
Takeshi Sasami
Also filed as: SASAMI TAKESHI
15 granted patents·4 pending applications·47 citations·filing 2007–2025
90Inventor score
Top patents by PatentIndex Score
19 records- 0195US10474030B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2017·Granted Nov 12, 2019·8 cites·13 claims
- 0294US11163232B2Resist composition, patterning process, and barium saltSHINETSU CHEMICAL CO·Filed 2018·Granted Nov 2, 2021·6 cites·14 claims
- 0392US10078264B2Resist composition, patterning process, and barium, cesium and cerium saltsSHINETSU CHEMICAL CO·Filed 2016·Granted Sep 18, 2018·4 cites·12 claims
- 0490US11609497B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2019·Granted Mar 21, 2023·2 cites·15 claims
- 0588US11156916B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2019·Granted Oct 26, 2021·3 cites·10 claims
- 0686US8420292B2Polymer, resist composition, and patterning processHARADA YUJI·Filed 2011·Granted Apr 16, 2013·6 cites·24 claims
- 0785US8916331B2Resist composition and patterning processHASEGAWA KOJI·Filed 2011·Granted Dec 23, 2014·5 cites·16 claims
- 0884US8697903B2Fluorinated ester monomer, making method, fluorinated ester polymer, and difluorohydroxycarboxylic acidKINSHO TAKESHI·Filed 2011·Granted Apr 15, 2014·3 cites·1 claims
- 0983US8815492B2Chemically amplified positive resist composition for ArF immersion lithography and pattern forming processOHSAWA YOUICHI·Filed 2012·Granted Aug 26, 2014·4 cites·6 claims
- 1079US9115074B2Fluorinated monomer, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2013·Granted Aug 25, 2015·2 cites·1 claims
- 1176US2025370342A1Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 1275US7851157B1Oligonucleotide derivative, probe for detection of gene, and DNA chipTOKYO INST TECH·Filed 2007·Granted Dec 14, 2010·3 cites·9 claims
- 1372US10520809B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2017·Granted Dec 31, 2019·1 cites·13 claims
- 1466US2023305398A1Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
- 1558US9261783B2Fluorinated ester monomer, making method, fluorinated ester polymer, and difluorohydroxycarboxylic acidSHINETSU CHEMICAL CO·Filed 2013·Granted Feb 16, 2016·0 cites·4 claims
- 1656US8647808B2Fluorinated monomer, polymer, resist composition, and patterning processSAGEHASHI MASAYOSHI·Filed 2011·Granted Feb 11, 2014·0 cites·15 claims
- 1745US11327400B2Patterning processSHINETSU CHEMICAL CO·Filed 2018·Granted May 10, 2022·0 cites·14 claims
- 1842US2013034813A1CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION LITHOGRAPHY AND PATTERN FORMING PROCESSSHINETSU CHEMICAL CO·Filed 2012·Application pending·0 cites
- 1933US2015268555A1Positive resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →