Inventor · disambiguated record
Takehiro Seshimo
Also filed as: SESHIMO TAKEHIRO
45 granted patents·15 pending applications·195 citations·filing 2006–2025
97Inventor score
Top patents by PatentIndex Score
60 records- 0198US7713679B2Resist composition, method of forming resist pattern, novel compound, and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted May 11, 2010·57 cites·11 claims
- 0297US7682772B2Resist composition, method of forming resist pattern, novel compound, and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Mar 23, 2010·20 cites·16 claims
- 0393US8415082B2Resist composition, method of forming resist pattern, compound and method of producing the same, acid generatorUTSUMI YOSHIYUKI·Filed 2010·Granted Apr 9, 2013·8 cites·7 claims
- 0492US7776510B2Resist composition, method of forming resist pattern, compound and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Aug 17, 2010·14 cites·12 claims
- 0591US9169421B2Method of producing structure containing phase-separated structure, method of forming pattern, and top coat materialTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Oct 27, 2015·7 cites·12 claims
- 0690US7927780B2Resist composition, method of forming resist pattern, novel compound and method of producing the same, and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Apr 19, 2011·9 cites·11 claims
- 0789US8338076B2Resist composition, method of forming resist pattern, novel compound, and acid generatorKAWAUE AKIYA·Filed 2009·Granted Dec 25, 2012·7 cites·24 claims
- 0887US9442371B2Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine patternTOKYO OHKA KOGYO CO LTD·Filed 2015·Granted Sep 13, 2016·2 cites·17 claims
- 0987US8415085B2Resist composition, method of forming resist pattern, novel compound, and acid generatorHADA HIDEO·Filed 2012·Granted Apr 9, 2013·3 cites·9 claims
- 1087US8206891B2Positive resist composition and method of forming resist patternSESHIMO TAKEHIRO·Filed 2009·Granted Jun 26, 2012·10 cites·6 claims
- 1186US11542397B2Liquid composition, quantum dot-containing film, optical film, light-emitting display element panel, and light-emitting display deviceTOKYO OHKA KOGYO CO LTD·Filed 2019·Granted Jan 3, 2023·2 cites·12 claims
- 1286US8765352B2Resist composition, method of forming resist pattern, novel compound, and acid generatorUTSUMI YOSHIYUKI·Filed 2011·Granted Jul 1, 2014·4 cites·9 claims
- 1385US7745097B2Compound, manufacturing method thereof, acid generator, resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Jun 29, 2010·4 cites·19 claims
- 1483US10366888B2Pattern forming methodTOKYO ELECTRON LTD·Filed 2018·Granted Jul 30, 2019·3 cites·17 claims
- 1583US9567477B2Undercoat agent and method of producing structure containing phase-separated structureTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Feb 14, 2017·4 cites·4 claims
- 1683US7488568B2Resist composition, method of forming resist pattern, compound and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Feb 10, 2009·7 cites·15 claims
- 1782US7955777B2Compound, acid generator, resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Jun 7, 2011·4 cites·14 claims
- 1881US8124313B2Resist composition, method of forming resist pattern, novel compound, and acid generatorSESHIMO TAKEHIRO·Filed 2010·Granted Feb 28, 2012·11 cites·19 claims
- 1980US9644110B2Method of producing structure containing phase-separated structure and method of forming top coat filmTOKYO OHKA KOGYO CO LTD·Filed 2015·Granted May 9, 2017·2 cites·20 claims
- 2079US9206307B2Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine patternTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Dec 8, 2015·2 cites·17 claims
- 2176US2025215206A1Resin composition for forming phase-separated structure and method for producing structure having phase-separated structureTOKYO OHKA KOGYO CO LTD·Filed 2024·Application pending·0 cites
- 2274US9314819B2Anhydride copolymer top coats for orientation control of thin film block copolymersUNIV TEXAS·Filed 2013·Granted Apr 19, 2016·1 cites·46 claims
- 2372US2024158547A1Composition and polymerTOKYO OHKA KOGYO CO LTD·Filed 2023·Application pending·0 cites
- 2472US2024360267A1Resin composition for forming etching mask pattern, and method for manufacturing etching mask patternTOKYO OHKA KOGYO CO LTD·Filed 2024·Application pending·0 cites
- 2572US2024361686A1Method for manufacturing etching mask pattern, and resin composition for forming etching mask patternTOKYO OHKA KOGYO CO LTD·Filed 2024·Application pending·0 cites
- 2672US2024368393A1Resin composition for forming etching mask pattern, and method for manufacturing etching mask patternTOKYO OHKA KOGYO CO LTD·Filed 2024·Application pending·0 cites
- 2771US8932795B2Resist composition, method of forming resist pattern, novel compound, and acid generatorSESHIMO TAKEHIRO·Filed 2011·Granted Jan 13, 2015·2 cites·6 claims
- 2870US8298748B2Positive resist composition, method of forming resist pattern, and polymeric compoundSESHIMO TAKEHIRO·Filed 2010·Granted Oct 30, 2012·2 cites·6 claims
- 2970US2025197550A1Resin composition for forming phase-separated structure, method for producing structure having phase-separated structure, and block copolymerTOKYO OHKA KOGYO CO LTD·Filed 2024·Application pending·0 cites
- 3069US9188869B2Method of producing structure containing phase-separation structure, method of forming pattern, and method of forming fine patternTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Nov 17, 2015·1 cites·11 claims
- 3169US8367299B2Resist composition, method of forming resist pattern, compound and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2011·Granted Feb 5, 2013·1 cites·15 claims
- 3269US8206890B2Resist composition, method of forming resist pattern, compound and acid generatorKAWAUE AKIYA·Filed 2009·Granted Jun 26, 2012·2 cites·10 claims
- 3369US2025271751A1Photosensitive composition, photosensitive film, lower layer film, method for producing structure having phase-separated structure, and compoundTOKYO OHKA KOGYO CO LTD·Filed 2025·Application pending·0 cites
- 3469US2025197551A1Resin composition for forming phase-separated structure, method for producing structure having phase-separated structure, and block copolymerTOKYO OHKA KOGYO CO LTD·Filed 2024·Application pending·0 cites
- 3567US12024579B2Curable liquid composition, particulate filler, and compoundTOKYO OHKA KOGYO CO LTD·Filed 2021·Granted Jul 2, 2024·0 cites·11 claims
- 3667US9157008B2Anhydride copolymer top coats for orientation control of thin film block copolymersUNIV TEXAS·Filed 2013·Granted Oct 13, 2015·1 cites·17 claims
- 3767US9012129B2Resist composition, method of forming resist pattern, novel compound, and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Apr 21, 2015·0 cites·9 claims
- 3865US11912889B2Silicon-containing polymer, film-forming composition, method for forming silicon-containing polymer coating, method for forming silica coating, and production method for silicon-containing polymerTOKYO OHKA KOGYO CO LTD·Filed 2020·Granted Feb 27, 2024·0 cites·12 claims
- 3965US8808959B2Resist composition, method of forming resist pattern, novel compound, and acid generatorHADA HIDEO·Filed 2009·Granted Aug 19, 2014·0 cites·9 claims
- 4059US8007981B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Aug 30, 2011·5 cites·6 claims
- 4158US2020407545A1Curable resin composition and cured productTOKYO OHKA KOGYO CO LTD·Filed 2020·Application pending·0 cites
- 4257US2022213348A1Silicon-containing polymer, film-forming composition, method for supporting metal compound on surface of object to be treated, article having metal compound-supporting coating film, and method for producing silicon-containing polymerTOKYO OHKA KOGYO CO LTD·Filed 2020·Application pending·0 cites
- 4356US9914847B2Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structureTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Mar 13, 2018·0 cites·7 claims
- 4455US11377522B2Silicon-containing polymer, film-forming composition, method for forming silicon-containing polymer coating, method for forming silica-based coating, and production method for silicon-containing polymerTOKYO OHKA KOGYO CO LTD·Filed 2020·Granted Jul 5, 2022·0 cites·11 claims
- 4554US10167410B2Using chemical vapor deposited films to control domain orientation in block copolymer thin filmsUNIV TEXAS·Filed 2015·Granted Jan 1, 2019·0 cites·20 claims
- 4654US9040121B2Using chemical vapor deposited films to control domain orientation in block copolymer thin filmsUNIV TEXAS·Filed 2013·Granted May 26, 2015·0 cites·14 claims
- 4750US2022073815A1Method for producing quantum dot dispersion and quantum dot dispersionTOKYO OHKA KOGYO CO LTD·Filed 2019·Application pending·0 cites
- 4850US2022389308A1Wavelength conversion film, wavelength conversion film forming composition, and cluster-containing quantum dot production methodTOKYO OHKA KOGYO CO LTD·Filed 2020·Application pending·0 cites
- 4949US10941253B2Block copolymer, and method of producing structure containing phase-separated structureTOKYO OHKA KOGYO CO LTD·Filed 2018·Granted Mar 9, 2021·0 cites·12 claims
- 5049US8609320B2Resist composition, method of forming resist pattern, polymeric compound and compoundUTSUMI YOSHIYUKI·Filed 2011·Granted Dec 17, 2013·0 cites·14 claims
Showing the top 50 of 60 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →