Inventor · disambiguated record
Tadashi Shimazu
Also filed as: SHIMAZU TADASHI
8 granted patents·5 pending applications·15 citations·filing 2002–2013
81Inventor score
Top patents by PatentIndex Score
13 records- 0172US9011634B2Plasma processing apparatus and plasma processing methodMITSUBISHI HEAVY IND LTD·Filed 2012·Granted Apr 21, 2015·2 cites·5 claims
- 0269US8662010B2Plasma processing apparatus, plasma processing method, plasma film deposition apparatus, and plasma film deposition methodMATSUDA RYUICHI·Filed 2007·Granted Mar 4, 2014·2 cites·6 claims
- 0369US8480912B2Plasma processing apparatus and plasma processing methodMATSUDA RYUICHI·Filed 2007·Granted Jul 9, 2013·2 cites·3 claims
- 0466US8337960B2Seasoning method for film-forming apparatusSHIMAZU TADASHI·Filed 2007·Granted Dec 25, 2012·3 cites·2 claims
- 0566US8288294B2Insulating film for semiconductor device, process and apparatus for producing insulating film for semiconductor device, semiconductor device, and process for producing the semiconductor deviceKAFUKU HIDETAKA·Filed 2009·Granted Oct 16, 2012·4 cites·14 claims
- 0661US7972946B2Plasma treatment method and plasma treatment deviceMITSUBISHI HEAVY IND LTD·Filed 2007·Granted Jul 5, 2011·1 cites·10 claims
- 0751US7314525B2Plasma CVD apparatusMITSUBISHI HEAVY IND LTD·Filed 2002·Granted Jan 1, 2008·1 cites·4 claims
- 0851US2010310791A1Plasma processing method and plasma processing systemMITSUBISHI HEAVY IND LTD·Filed 2009·Application pending·0 cites
- 0949US2014057459A1Plasma processing method and plasma processing systemMITSUBISHI HEAVY IND LTD·Filed 2013·Application pending·0 cites
- 1046US2005202183A1Plasma processing system, plasma processing method, plasma film deposition system, and plasma film deposition methodMITSUBISHI HEAVY IND LTD·Filed 2003·Application pending·0 cites
- 1145US2010236482A1Plasma film forming apparatusMITSUBISHI HEAVY IND LTD·Filed 2008·Application pending·0 cites
- 1239US2007107843A1Plasma processing apparatusMITSUBISHI HEAVY IND LTD·Filed 2004·Application pending·0 cites
- 1337US8889568B2Method and apparatus for producing silicon nitride filmNISHIKAWA SEIJI·Filed 2011·Granted Nov 18, 2014·0 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →