Inventor · disambiguated record
Takeru Watanabe
Also filed as: WATANABE TAKERU
189 granted patents·28 pending applications·1,981 citations·filing 1999–2025
99Inventor score
Files withSHINETSU CHEMICAL CO162HATAKEYAMA JUN9WATANABE TAKERU9OGIHARA TSUTOMU5DAINIPPON PRINTING CO LTD3
Top patents by PatentIndex Score
217 records- 0199US6448420B1Acid-decomposable ester compound suitable for use in resist materialSHINETSU CHEMICAL CO·Filed 2000·Granted Sep 10, 2002·160 cites·5 claims
- 0299US6312867B1Ester compounds, polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 1999·Granted Nov 6, 2001·209 cites·17 claims
- 0398US7569326B2Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Aug 4, 2009·129 cites·11 claims
- 0498US7511169B2Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning processSHINETSU CHEMICAL CO·Filed 2006·Granted Mar 31, 2009·45 cites·4 claims
- 0597US7084303B2Tertiary amine compounds having an ester structure and processes for preparing sameSHINETSU CHEMICAL CO·Filed 2002·Granted Aug 1, 2006·79 cites·8 claims
- 0697US6147249AEster compounds, polymers, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 1999·Granted Nov 14, 2000·81 cites·20 claims
- 0796US8114571B2Photoacid generator, resist composition, and patterning processOHASHI MASAKI·Filed 2009·Granted Feb 14, 2012·29 cites·17 claims
- 0896US7981589B2Fluorinated monomer, fluorinated polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2008·Granted Jul 19, 2011·22 cites·5 claims
- 0996US7919226B2Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning processSHINETSU CHEMICAL CO·Filed 2008·Granted Apr 5, 2011·19 cites·10 claims
- 1096US7759047B2Resist protective film composition and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Jul 20, 2010·33 cites·15 claims
- 1196US7514202B2Thermal acid generator, resist undercoat material and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Apr 7, 2009·37 cites·9 claims
- 1296US6284429B1Ester compounds, polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2000·Granted Sep 4, 2001·50 cites·19 claims
- 1395US11661390B2Acetal compounds and processes for preparing thereof, and processes for preparing aldehyde compounds from the acetal compoundsSHINETSU CHEMICAL CO·Filed 2022·Granted May 30, 2023·2 cites·14 claims
- 1495US7670751B2Photoacid generator, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2008·Granted Mar 2, 2010·26 cites·18 claims
- 1595US7622242B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2008·Granted Nov 24, 2009·25 cites·12 claims
- 1695US7531289B2Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning processSHINETSU CHEMICAL CO·Filed 2005·Granted May 12, 2009·16 cites·13 claims
- 1795US6749988B2Amine compounds, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Jun 15, 2004·43 cites·20 claims
- 1895US6746818B2(Meth)acrylates having lactone structure, polymers, photoresist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Jun 8, 2004·48 cites·20 claims
- 1994US8846846B2Naphthalene derivative, resist bottom layer material, and patterning processKINSHO TAKESHI·Filed 2011·Granted Sep 30, 2014·8 cites·2 claims
- 2094US8835697B2Biphenyl derivative, resist bottom layer material, bottom layer forming method, and patterning processKORI DAISUKE·Filed 2012·Granted Sep 16, 2014·9 cites·5 claims
- 2194US8114570B2Photoacid generator, resist composition, and patterning processOHSAWA YOUICHI·Filed 2009·Granted Feb 14, 2012·15 cites·16 claims
- 2294US7531290B2Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning processSHINETSU CHEMICAL CO·Filed 2006·Granted May 12, 2009·17 cites·16 claims
- 2394US6517994B2Lactone ring-containing (meth)acrylate and polymer thereof for photoresist compositionSHINETSU CHEMICAL CO·Filed 2002·Granted Feb 11, 2003·57 cites·15 claims
- 2493US10444628B2Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning processSHINETSU CHEMICAL CO·Filed 2016·Granted Oct 15, 2019·8 cites·17 claims
- 2593US8921026B2Basic compound, chemically amplified resist composition, and patterning processHATAKEYAMA JUN·Filed 2011·Granted Dec 30, 2014·9 cites·9 claims
- 2693US8168367B2Resist composition and patterning processWATANABE SATOSHI·Filed 2009·Granted May 1, 2012·13 cites·6 claims
- 2793US7629108B2Nitrogen-containing organic compound, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Dec 8, 2009·16 cites·10 claims
- 2893US6673511B1Resist compositionSHINETSU CHEMICAL CO·Filed 2000·Granted Jan 6, 2004·48 cites·9 claims
- 2992US8349533B2Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning processSHINETSU CHEMICAL CO·Filed 2009·Granted Jan 8, 2013·14 cites·8 claims
- 3092US8323872B2Resist protective coating material and patterning processHATAKEYAMA JUN·Filed 2006·Granted Dec 4, 2012·15 cites·7 claims
- 3191US9805943B2Polymer for resist under layer film composition, resist under layer film composition, and patterning processSHINETSU CHEMICAL CO·Filed 2016·Granted Oct 31, 2017·7 cites·32 claims
- 3291US7527912B2Photoacid generators, resist compositions, and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted May 5, 2009·38 cites·15 claims
- 3391US6916593B2Resist compositionSHINETSU CHEMICAL CO·Filed 2003·Granted Jul 12, 2005·33 cites·11 claims
- 3490US8663898B2Resist underlayer film composition and patterning process using the sameOGIHARA TSUTOMU·Filed 2011·Granted Mar 4, 2014·7 cites·28 claims
- 3590US8431323B2Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning processWATANABE TAKERU·Filed 2009·Granted Apr 30, 2013·7 cites·28 claims
- 3690US7632624B2Photoresist undercoat-forming material and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Dec 15, 2009·17 cites·7 claims
- 3789US9522979B2Fluorine-containing silicon compound, method for producing same, and method for producing fluorine-containing silicon resinSHINETSU CHEMICAL CO·Filed 2015·Granted Dec 20, 2016·2 cites·8 claims
- 3889US8609889B2Photoacid generator, resist composition, and patterning processOHASHI MASAKI·Filed 2010·Granted Dec 17, 2013·6 cites·15 claims
- 3989US8329384B2Resist-modifying composition and pattern forming processWATANABE TAKERU·Filed 2010·Granted Dec 11, 2012·10 cites·10 claims
- 4089US8062828B2Positive resist composition and patterning processOHSAWA YOUICHI·Filed 2009·Granted Nov 22, 2011·11 cites·7 claims
- 4188US9372404B2Organic film composition, method for forming organic film and patterning process using this, and heat-decomposable polymerSHINETSU CHEMICAL CO·Filed 2013·Granted Jun 21, 2016·8 cites·27 claims
- 4288US7868199B2Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning processEUDYNA DEVICES INC·Filed 2007·Granted Jan 11, 2011·7 cites·9 claims
- 4388US7556909B2Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning processSHINETSU CHEMICAL CO·Filed 2006·Granted Jul 7, 2009·9 cites·16 claims
- 4487US10550136B2Method for producing polyalkylene glycol derivative having amino group at endSHINETSU CHEMICAL CO·Filed 2019·Granted Feb 4, 2020·1 cites·1 claims
- 4587US8853031B2Resist underlayer film composition and patterning process using the sameOGIHARA TSUTOMU·Filed 2011·Granted Oct 7, 2014·5 cites·28 claims
- 4687US8105760B2Patterning process and pattern surface coating compositionHATAKEYAMA JUN·Filed 2008·Granted Jan 31, 2012·11 cites·7 claims
- 4787US7261995B2Nitrogen-containing organic compound, chemically amplified resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2005·Granted Aug 28, 2007·9 cites·4 claims
- 4887US6444396B1Ester compounds, polymers, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2000·Granted Sep 3, 2002·24 cites·19 claims
- 4987US6413695B1Resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2000·Granted Jul 2, 2002·18 cites·15 claims
- 5086US10416563B2Resist underlayer film composition, patterning process, and method for forming resist underlayer filmSHINETSU CHEMICAL CO·Filed 2018·Granted Sep 17, 2019·4 cites·21 claims
Showing the top 50 of 217 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →